Treatment liquid, kit, and method for washing substrate

Patent metadata

Field	Value
Publication number	US-11072767-B2
Application number	US-202016774220-A
Country	US
Kind code	B2
Filing date	Jan 28, 2020
Priority date	Aug 31, 2017
Publication date	Jul 27, 2021
Grant date	Jul 27, 2021

Abstract

A treatment liquid for a semiconductor device is a treatment liquid including water, an organic solvent, and two or more nitrogen-containing aromatic heterocyclic compounds.

First claim

What is claimed is:

1. A treatment liquid for a semiconductor device, comprising:
water;
an organic solvent;
two or more nitrogen-containing aromatic heterocyclic compounds; and
at least one selected from the group consisting of hydroxylamine, a hydroxylamine derivative, and a salt thereof.

2. The treatment liquid according to claim 1 ,
wherein a nitrogen-containing aromatic heterocyclic compound (A) and a nitrogen-containing aromatic heterocyclic compound (B) are included as the nitrogen-containing aromatic heterocyclic compounds,
the nitrogen-containing aromatic heterocyclic compound (A) is a compound represented by General Formula (I) or a compound represented by General Formula (IV), and
the nitrogen-containing aromatic heterocyclic compound (B) is at least one selected from the group consisting of a compound represented by General Formula (II), a compound represented by General Formula (III), and a compound represented by General Formula (V),

in General Formula (I), R 11 and R 12 each independently represent a hydrogen atom, or a substituted or unsubstituted hydrocarbon group, and R 11 and R 12 may be bonded to each other to form a ring,

in General Formula (II), R 21 and R 22 each independently represent a hydrogen atom, a hydroxyl group, or a substituted or unsubstituted hydrocarbon group,
provided that in a case where R 21 is the hydrogen atom, R 22 represents a substituted or unsubstituted hydrocarbon group, and in a case where R 21 is the hydrogen atom, R 22 represents the substituted or unsubstituted hydrocarbon group, R 11 and R 12 in General Formula (I) are bonded to each other to form a benzene ring, and the benzene ring has a substituent, R 22 and the substituent represent different groups,

in General Formula (III), R 31 and R 32 each independently represent a hydrogen atom, or a substituted or unsubstituted hydrocarbon group,
provided that in a case where R 31 is the hydrogen atom, R 32 represents a substituted or unsubstituted hydrocarbon group, and in a case where R 31 is the hydrogen atom, R 32 represents the substituted or unsubstituted hydrocarbon group, R 11 and R 12 in General Formula (I) are bonded to each other to form a benzene ring, and the benzene ring has a substituent, R 32 and the substituent represent different groups,

in General Formula (IV), R 41 represents a hydrogen atom, and R 42 represents a hydrogen atom, a hydroxyl group, a mercapto group, or an amino group,

in General Formula (V), R 51 and R 52 each independently represent a hydrogen atom, or a substituted or unsubstituted hydrocarbon group, provided that at least one of R 51 or R 52 represents a substituted or unsubstituted hydrocarbon group.

3. The treatment liquid according to claim 2 ,
wherein the nitrogen-containing aromatic heterocyclic compound (A) is the compound represented by General Formula (I), in which R 11 and R 12 is bonded to each other to form a ring, and
the nitrogen-containing aromatic heterocyclic compound (B) is the compound represented by General Formula (III).

4. The treatment liquid according to claim 2 ,
wherein a mass content ratio of the nitrogen-containing aromatic heterocyclic compound (A) to the nitrogen-containing aromatic heterocyclic compound (B) is 2 to 30,000.

5. The treatment liquid according to claim 2 ,
wherein a mass content ratio of the nitrogen-containing aromatic heterocyclic compound (A) to the nitrogen-containing aromatic heterocyclic compound (B) is 100 to 15,000.

6. The treatment liquid according to claim 2 ,
wherein the nitrogen-containing aromatic heterocyclic compound (B) includes two compounds selected from the group consisting of the compound represented by General Formula (II), the compound represented by General Formula (III), and the compound represented by General Formula (V), and
a mass ratio of the two compounds is 1 to 10,000.

7. The treatment liquid according to claim 2 ,
wherein a content of the nitrogen-containing aromatic heterocyclic compound (B) is 0.01 to 10,000 ppm by mass with respect to a total mass of the treatment liquid.

8. The treatment liquid according to claim 2 ,
wherein a content of the nitrogen-containing aromatic heterocyclic compound (B) is 0.5 to 80 ppm by mass with respect to a total mass of the treatment liquid.

9. The treatment liquid according to claim 1 , further comprising a cobalt ion.

10. The treatment liquid according to claim 9 ,
wherein the cobalt ion is a cobalt ion derived from at least one cobalt ion source selected from the group consisting of cobalt fluoride, cobalt chloride, cobalt hydroxide, cobalt oxide, and cobalt sulfate.

11. The treatment liquid according to claim 9 ,
wherein a mass content ratio of the nitrogen-containing aromatic heterocyclic compound (B) to the cobalt ion is 1.0×10 2 to 1.0×10 6 .

12. The treatment liquid according to claim 1 , further comprising one or more fluorine-containing compounds selected from the group consisting of hydrofluoric acid, ammonium fluoride, tetramethylammonium fluoride, and tetrabutylammonium fluoride.

13. The treatment liquid according to claim 12 , further comprising a cobalt ion.

14. The treatment liquid according to claim 13 ,
wherein the cobalt ion is a cobalt ion derived from at least one cobalt ion source selected from the group consisting of cobalt fluoride, cobalt chloride, cobalt hydroxide, cobalt oxide, and cobalt sulfate.

15. The treatment liquid according to claim 13 ,
wherein a mass content ratio of the fluorine-containing compound to the cobalt ion is 1.0×10 5 to 1.0×10 8 .

16. The treatment liquid according to claim 1 , further comprising a basic compound.

17. The treatment liquid according to claim 16 ,
wherein the basic compound includes a nitrogen-containing alicyclic compound.

18. The treatment liquid according to claim 16 ,
wherein the basic compound includes a secondary amine.

19. The treatment liquid according to claim 18 ,
wherein a content of the secondary amine is 300 ppb by mass to 3,000 ppm by mass with respect to a total mass of the treatment liquid.

20. The treatment liquid according to claim 18 ,
wherein a nitrogen-containing aromatic heterocyclic compound (A) and a nitrogen-containing aromatic heterocyclic compound (B) are included as the nitrogen-containing aromatic heterocyclic compounds,
the nitrogen-containing aromatic heterocyclic compound (A) is a compound represented by General Formula (I) or a compound represented by General Formula (IV), and
the nitrogen-containing aromatic heterocyclic compound (B) is at least one selected from the group consisting of a compound represented by General Formula (II), a compound represented by General Formula (III), and a compound represented by General Formula (V),

in General Formula (I), R 11 and R 12 each independently represent a hydrogen atom, or a substit

Assignees

• Fujifilm Corp

Inventors

• Takahashi Tomonori
• Kamimura Tetsuya

Classifications

• H10P70/15

  by wet cleaning only (H10P70/52 takes precedence) · CPC title

• H10P70/234 Primary

  the processing being the formation of vias or contact holes · CPC title

• C11D3/28 Primary

  Heterocyclic compounds containing nitrogen in the ring · CPC title

• C11D7/28

  containing halogen · CPC title

• C11D3/43

  Solvents · CPC title