Liquid dispensing nozzle and substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-11148150-B2
Application number	US-201916659355-A
Country	US
Kind code	B2
Filing date	Oct 21, 2019
Priority date	Oct 19, 2018
Publication date	Oct 19, 2021
Grant date	Oct 19, 2021

Abstract

The inventive concept relates to a liquid dispensing nozzle and an apparatus for treating a substrate. The liquid dispensing nozzle includes a first fluid channel that is formed in the nozzle and through which a processing liquid flows and a second fluid channel in communication with the first fluid channel, the second fluid channel being connected to a dispensing end of the nozzle. The second fluid channel has a larger width than the first fluid channel, and a central axis of the first fluid channel and a central axis of the second fluid channel are connected with each other in a straight line.

First claim

What is claimed is:

1. An apparatus for treating a substrate, the apparatus comprising:
a support unit including a support plate having a seating surface on which the substrate is supported; and
a liquid dispensing unit configured to dispense a first processing liquid onto the substrate,
wherein the liquid dispensing unit includes:
a first nozzle configured to dispense the first processing liquid,
wherein the first nozzle includes:
a first fluid channel that is formed in the first nozzle and through which the first processing liquid flows; and
a second fluid channel that is formed in the first nozzle and is in communication with the first fluid channel, the second fluid channel being connected to a dispensing end of the first nozzle,

wherein the second fluid channel has a larger width than the first fluid channel, and
wherein a central axis of the first fluid channel along a direction in which the first processing liquid flows and a central axis of the second fluid channel along the direction in which the first processing liquid flows are connected with each other in a straight line.

2. The apparatus of claim 1 , wherein the first fluid channel has a circular cross-section that is perpendicular to a lengthwise direction of the first fluid channel, and
wherein the second fluid channel has a slit-shaped cross-section that is perpendicular to a direction in which the first processing liquid flows.

3. The apparatus of claim 2 , wherein the width of the second fluid channel is gradually increased in a direction from the first fluid channel to the dispensing end.

4. The apparatus of claim 3 , wherein the first fluid channel includes:
an upper fluid channel, wherein an area of a cross-section perpendicular to a lengthwise direction of the upper fluid channel is constant; and
a lower fluid channel extending from the upper fluid channel, wherein an area of a cross-section perpendicular to a lengthwise direction of the lower fluid channel is gradually decreased, and
wherein a lower end of the lower fluid channel is disposed downstream of an upper end of the second fluid channel.

5. The apparatus of claim 4 , wherein the upper end of the second fluid channel is in agreement with an upper end of the lower fluid channel.

6. The apparatus of claim 5 , wherein the lower fluid channel has an funnel shape, and
wherein a central axis of the lower fluid channel is in agreement with the central axis of the first fluid channel and the central axis of the second fluid channel.

7. The apparatus of claim 6 , wherein an angle formed by a portion where the lower fluid channel and the second fluid channel adjoin each other is an acute angle, when a vertical section of the lower fluid channel is viewed.

8. The apparatus of claim 6 , wherein the second fluid channel has an arc shape, and
wherein the center of the arc is on the central axis of the first fluid channel.

9. The apparatus of claim 8 , wherein a central angle of the arc is an acute angle.

10. The apparatus of claim 1 , wherein the dispensing end has a rounded shape that is convex toward a direction in which the first processing liquid is dispensed.

11. The apparatus of claim 10 , wherein the liquid dispensing unit further includes:
a second nozzle configured to dispense a second processing liquid different from the first processing liquid; and
a third nozzle configured to dispense the first processing liquid that is the same as the first processing liquid dispensed by the first nozzle,
wherein the second nozzle and the third nozzle dispense the second processing liquid and the first processing liquid in a manner of a stream, respectively,
wherein the first processing liquid is a chemical, and
wherein the second processing liquid is deionized water.

12. The apparatus of claim 11 , wherein the first nozzle dispenses the first processing liquid onto a top side of the substrate, which is supported on the support unit, in an oblique direction.

Assignees

• Semes Co Ltd

Inventors

• Choi Byoungdoo
• Ryu Yangyeol
• Oh Dong Sub
• Baek Hye Bin

Classifications

• G03F7/3021

  from a wafer supported on a rotating chuck · CPC title

• G03F7/063

  Additives or means to improve the lithographic properties; Processing solutions characterised by such additives; Treatment after development or transfer, e.g. finishing, washing; Correction or deletion fluids · CPC title

• B05C5/002

  the work consisting of separate articles (B05C5/0208 takes precedence) · CPC title

• B05B1/3402

  to avoid or reduce turbulence, e.g. with fluid flow straightening means · CPC title

• B05B15/652

  whereby the jet can be oriented · CPC title