Method for processing dc marks for repairing lithography masks
US-2024411223-A1 · Dec 12, 2024 · US
Repair or correction of mask defects
Repair or correction of mask defects · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F1/72 |
| Official title | Repair or correction of mask defects |
| Display label | Repair or correction of mask defects |
| Total patents | 469 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 38 |
| 2016 | 40 |
| 2017 | 43 |
| 2018 | 44 |
| 2019 | 41 |
| 2020 | 42 |
| 2021 | 42 |
| 2022 | 37 |
| 2023 | 40 |
| 2024 | 48 |
| 2025 | 47 |
| 2026 | 7 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
US-2016377973-A1 · Dec 29, 2016 · US
Photomask and methods for manufacturing and correcting photomask
US-9519211-B2 · Dec 13, 2016 · US
Method and apparatus for correcting errors on a wafer processed by a photolithographic mask
US-2016342080-A1 · Nov 24, 2016 · US
Manufacturing method of pattern transfer mask
US-2016306274-A1 · Oct 20, 2016 · US
Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device
US-9465286-B2 · Oct 11, 2016 · US
Guiding Patterns Optimization For Directed Self-Assembly
US-2016292309-A1 · Oct 6, 2016 · US
Pattern formation method, control device, and semiconductor device manufacture method
US-2016259240-A1 · Sep 8, 2016 · US
Durable metal film deposition for mask repair
US-2016238928-A1 · Aug 18, 2016 · US
Lithographic apparatus, device manufacturing method, and method of correcting a mask
US-9417519-B2 · Aug 16, 2016 · US
Method of repairing a mask
US-9400424-B2 · Jul 26, 2016 · US
Method for repairing a mask
US-2016202605-A1 · Jul 14, 2016 · US
Metrology Method and Apparatus, Lithographic System and Device Manufacturing Method
US-2016161864-A1 · Jun 9, 2016 · US
Pattern verifying method
US-2016147140-A1 · May 26, 2016 · US
Methods of reducing registration errors of photomasks and photomasks formed using the methods
US-9323142-B2 · Apr 26, 2016 · US
Method of calculating a shift vale of a cell contact
US-2016070163-A1 · Mar 10, 2016 · US
Method for repairing mask for EUV exposure and mask for EUV exposure
US-9280043-B2 · Mar 8, 2016 · US
Method for forming photo-mask and OPC method
US-9274416-B2 · Mar 1, 2016 · US
Method for lithography patterning
US-9274417-B2 · Mar 1, 2016 · US
Reflective mask blank for EUV lithography, method of manufacturing thereof, reflective mask for EUV lithography and method of manufacturing thereof
US-9268207-B2 · Feb 23, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F1/72?
- CPC G03F1/72 is the Cooperative Patent Classification code for “Repair or correction of mask defects.”
- How many patents are filed under CPC G03F1/72 (Repair or correction of mask defects)?
- Our database includes 469 publications tagged with this CPC code.
- Is patent activity under CPC G03F1/72 growing?
- Publication counts under this code: 48 in 2024 vs 47 in 2025 (latest complete years).