Photomask, method of correcting error thereof, integrated circuit device manufactured by using the photomask, and method of manufacturing the integrated circuit device

Patent metadata

Field	Value
Publication number	US-9465286-B2
Application number	US-201414565087-A
Country	US
Kind code	B2
Filing date	Dec 9, 2014
Priority date	Dec 9, 2013
Publication date	Oct 11, 2016
Grant date	Oct 11, 2016

Abstract

Provided are a photomask and a method of correcting errors thereof. The photomask includes a multilayer reflection film covering one side surface of a substrate and an energy receiving layer covering the other side surface of the substrate. The method includes determining a local correction position on a frontside surface of the photomask according to a detected error of the photomask, and locally applying an energy beam to a backside surface region of the photomask aligned with the local correction position in a thickness direction of the photomask. The invention may be applicable to structures other than photomasks that benefit from modification of surface heights or selectively applied stress.

First claim

What is claimed is:

1. A method of manufacture comprising:
providing a photolithographic mask including
a substrate having a first surface and a second surface on an opposite side of the substrate from the first surface,
a reflection film on the first surface of the substrate,
a light absorbing layer on the reflection film, and
a stress inducing layer on the second surface of the substrate;

detecting a deviation of the photolithographic mask; and
in response to the detected deviation, altering a state of one or more selected portions of the stress inducing layer to alter stress applied to the substrate by the stress inducing layer and thereby alter a shape of the photolithographic mask.

2. The method of claim 1 , wherein detecting a deviation of the photolithographic mask detects a deviation of a surface of the photolithographic mask from a target location.

3. The method of claim 2 , wherein altering the state of one or more selected portions comprises converting an amorphous state of a material of the stress inducing layer to a crystalline state.

4. The method of claim 3 , wherein the altering the state of one or more selected portions comprises providing an energy beam to the one or more selected portions of the stress inducing layer.

5. The method of claim 4 , wherein the energy beam is one of an electron beam, a focused ion beam, a laser beam and an electromagnetic beam.

6. The method of claim 1 , wherein the stress inducing layer comprises a plurality of layers of a first material and a plurality of layers of a second material each interposed between corresponding ones of the plurality of layers of the first material.

7. The method of claim 6 , wherein altering the state of one or more selected portions comprises converting an amorphous state of at least some of the plurality of layers of the first material and at least some of the plurality of layers of the second material to a crystalline state.

8. The method of claim 7 , wherein the first material comprises at least one of Al, Si and K.

9. The method of claim 8 , wherein the second material comprises at least one of Nb, Mo, Ru and Pb.

10. The method of claim 1 , wherein altering the state of one or more selected portions comprises creating an indentation of the stress inducing layer at the one or more selected portions.

11. The method of claim 1 , wherein the shape of the photolithographic mask is altered to reduce a warpage of the photolithographic mask.

12. The method of claim 1 , wherein the shape of the photolithographic mask is altered to increase a flatness of the photolithographic mask.

13. The method of claim 1 , further comprising creating a semiconductor device including exposing a wafer with light reflected from the photolithographic mask.

14. The method of claim 1 , wherein detecting a deviation of the photolithographic mask comprises obtaining a registration map of the photolithographic mask.

15. The method of claim 14 , wherein the registration map includes a plurality of measurements of a shift amount and a shift direction of a corresponding plurality of pattern elements of the photolithographic mask.

16. The method of claim 15 , wherein the shape of the photolithographic mask is altered to reduce the effect of the shift amount of one or more pattern elements.

17. The method of claim 16 , wherein the shape of the photolithographic mask is altered to align shift directions of neighboring pattern elements.

18. The photolithographic mask of claim 1 , wherein the light absorbing layer is patterned to include openings to allow light to impinge on and reflect off of the reflection film.

19. A method of manufacture, comprising:
altering the shape of a photomask by selectively altering portions of a stress inducing layer provided on a backside of a substrate of the photomask;
providing a wafer with a feature layer;
forming a photoresist layer on the feature layer;
patterning the photoresist layer including exposing the photoresist layer to light reflected from the photomask and developing the exposed photoresist layer; and
etching the feature layer using the patterned photoresist layer.

20. The method of claim 15 , further comprising detecting one or more deviations of the photomask and altering the shape of the photomask in response to the detected one or more deviations.

21. The method of claim 16 , wherein detecting one or more deviations of the photomask comprises detecting a deviation in the patterned photoresist layer.

22. The method of claim 16 , wherein detecting one or more deviations of the photomask comprises detecting a deviation in another patterned photoresist layer formed by exposing the another patterned photoresist layer to light reflected from the photomask.

23. The method of claim 16 , wherein exposing the photoresist layer to light comprises exposing the photoresist layer to extreme ultraviolet light.

24. The method of claim 19 , wherein altering portions of the stress inducing layer comprises converting an amorphous state of a material of the stress inducing layer to a crystalline state.

25. The method of claim 24 , wherein the altering portions of the stress inducing layer comprises providing an energy beam to the portions of the stress inducing layer.

26. The method of claim 25 , wherein the energy beam is one of an electron beam, a focused ion beam, a laser beam and an electromagnetic beam.

27. The method of claim 19 , wherein the stress inducing layer comprises a plurality of layers of a first material and a plurality of layers of a second material each interposed between corresponding ones of the plurality of layers of the first material.

28. The method of claim 27 , wherein altering portions of the stress inducing layer comprises converting an amorphous state of at least some of the plurality of layers of the first material and at least some of the plurality of layers of the second material to a crystalline state.

29. The method of claim 28 , wherein the first material comprises at least one of Al, Si and K.

30. The method of claim 29 , wherein the second material comprises at least one of Nb, Mo, Ru and Pb.

31. The method of claim 19 , wherein altering portions of the stress inducing layer comprises creating an indentation of the stress inducing layer at the portions.

Assignees

• Samsung Electronics Co Ltd

Inventors

• Kim Sang-Hyun
• Kim Seong-Sue
• Lee Dong-Gun

Classifications

• H10P76/00 Primary

  Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography · CPC title

• G03F1/74

  by charged particle beam [CPB], e.g. focused ion beam · CPC title

• G03F1/72

  Repair or correction of mask defects · CPC title

• G03F1/24 Primary

  Reflection masks; Preparation thereof · CPC title

• G03F1/38

  Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof · CPC title