Method for repairing mask for EUV exposure and mask for EUV exposure

Patent metadata

Field	Value
Publication number	US-9280043-B2
Application number	US-201313970380-A
Country	US
Kind code	B2
Filing date	Aug 19, 2013
Priority date	Mar 31, 2011
Publication date	Mar 8, 2016
Grant date	Mar 8, 2016

Abstract

A mask for EUV exposure and a method for repairing a mask for EUV exposure. The mask includes: a Mo/Si multi-layer film including a molybdenum layer and a silicon layer and being deposited on a substrate; a protection film formed on the Mo/Si multi-layer film; an absorption film formed on the protection film; and a reflectivity enhancing portion having a plurality of holes in the protection film. The method includes: specifying a position of a defect of the Mo/Si multi-layer film in an area of the protection film; and irradiating light beam, of which a diameter is narrowed down to be at or less than a wavelength of EUV exposure light, onto an area covering the position of the defect in a plan view of the mask for EUV exposure to form the reflectivity enhanced portion. The maximum width of the holes is equal to or less than the wavelength.

First claim

What is claimed is:

1. A method for repairing a mask for EUV exposure comprising: a Mo/Si multi-layer film which includes a molybdenum layer and a silicon layer and is deposited on a substrate; a protection film which is formed on the Mo/Si multi-layer film; and an absorption film which is formed on the protection film, the method comprising:
specifying a position of a defect of the Mo/Si multi-layer film in an area of the protection film where the protection film is not covered by the absorption film; and
irradiating energy beam, of which a diameter is narrowed down to be at or less than a wavelength of EUV exposure light, onto an area covering the position of the defect in a plan view of the mask for EUV exposure to form a reflectivity enhanced portion having plurality of holes on a top surface of the mask for EUV exposure, the plurality of holes being in the protection film and extending to the Mo/Si multi-layer film, and the maximum width of the holes being equal to or less than the wavelength.

2. The method for repairing a mask for EUV exposure according to claim 1 , wherein the holes are formed so as to be aligned in a lattice at a predetermined interval with a pitch less than twice the wavelength in a plan view of the mask for EUV exposure.

3. The method for repairing a mask for EUV exposure according to claim 1 , wherein the holes are formed such that the silicon layer of the Mo/Si multi-layer film is exposed at a bottom surface of the holes.

4. The method for repairing a mask for EUV exposure according to claim 1 , wherein a shape of the defect is specified at the same time as the position of the defect of the Mo/Si multi-layer film in the exposed area of the protection film specified.

5. The method for repairing a mask for EUV exposure according to claim 4 , wherein the area covering the position of the defect as well as a shape, the maximum width and the pitch of the holes in a plan view is determined based on the specified position and shape of the defect.

6. A mask for EUV exposure comprising:
a Mo/Si multi-layer film which includes a molybdenum layer and a silicon layer and is deposited on a substrate;
a protection film which is formed on the Mo/Si multi-layer film;
an absorption film which is formed on the protection film; and
a reflectivity enhanced portion in an area of the protection film where the protection film is not covered by the absorption film, the reflectivity enhanced portion having a plurality of holes formed in the protection film, the holes extending to the Mo/Si multi-layer film, and a maximum width of the holes being equal to or less than a wavelength of EUV exposure light.

7. The mask for EUV exposure according to claim 6 wherein, in the reflectivity enhanced portion, the holes are aligned in a lattice at a predetermined interval with a pitch less than twice the wavelength.

Assignees

• Toppan Printing Co Ltd

Inventors

• LAMANTIA Matthew Joseph

Classifications

• G03F1/22 Primary

  Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof · CPC title

• G03F1/72 Primary

  Repair or correction of mask defects · CPC title

• B82Y40/00

  Manufacture or treatment of nanostructures · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title

• G03F1/24 Primary

  Reflection masks; Preparation thereof · CPC title