Cleaning liquid composition
US-11905490-B2 · Feb 20, 2024 · US
Acids
Acids · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D7/08 |
| Official title | Acids |
| Display label | Acids |
| Total patents | 314 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 29 |
| 2016 | 34 |
| 2017 | 23 |
| 2018 | 26 |
| 2019 | 30 |
| 2020 | 27 |
| 2021 | 29 |
| 2022 | 27 |
| 2023 | 25 |
| 2024 | 33 |
| 2025 | 24 |
| 2026 | 7 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Substrate cleaning liquid and substrate cleaning method
US-9528079-B2 · Dec 27, 2016 · US
Method for manufacturing liquid ejection head
US-2016339704-A1 · Nov 24, 2016 · US
Use of nitrogen compounds in the pickling of stainless steel
US-9487741-B2 · Nov 8, 2016 · US
Compositions and methods for cleaning, disinfecting, and sanitizing that are effluent neutral
US-9476017-B2 · Oct 25, 2016 · US
Selectively Removing Titanium Nitride Hard Mask and Etch Residue Removal
US-2016293479-A1 · Oct 6, 2016 · US
Enhanced cleaning process of chamber used plasma spray coating without damaging coating
US-9447365-B2 · Sep 20, 2016 · US
Method for removing cobalt deposits in a high-pressure olefin hydroformylation reactor
US-2016265084-A1 · Sep 15, 2016 · US
Method for cleaning wafer
US-2016254140-A1 · Sep 1, 2016 · US
Method of treating a metal substrate
US-2016251602-A1 · Sep 1, 2016 · US
Cleaning composition
US-2016237384-A1 · Aug 18, 2016 · US
Non-amine post-cmp composition and method of use
US-2016237385-A1 · Aug 18, 2016 · US
Cleaning composition and method of manufacturing metal wiring using the same
US-2016230289-A1 · Aug 11, 2016 · US
Substrate treatment method and substrate treatment equipment
US-2016233082-A1 · Aug 11, 2016 · US
Method of making an interconnect device
US-9406556-B2 · Aug 2, 2016 · US
Cleaner composition for process of manufacturing semiconductor and display
US-2016215241-A1 · Jul 28, 2016 · US
Aqua regia and hydrogen peroxide HCL combination to remove Ni and NiPt residues
US-9399753-B2 · Jul 26, 2016 · US
Cleaning liquid for lithography and method for forming wiring
US-2016208201-A1 · Jul 21, 2016 · US
Cleaning solution composition and method of cleaning semiconductor device using the same
US-9394509-B2 · Jul 19, 2016 · US
Method for treatment of recessed structures in dielectric materials for smear removal
US-2016205783-A1 · Jul 14, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D7/08?
- CPC C11D7/08 is the Cooperative Patent Classification code for “Acids.”
- How many patents are filed under CPC C11D7/08 (Acids)?
- Our database includes 314 publications tagged with this CPC code.
- Is patent activity under CPC C11D7/08 growing?
- Publication counts under this code: 33 in 2024 vs 24 in 2025 (latest complete years).