Carrier-Attached Copper Foil, Laminate, Method For Manufacturing Printed-Wiring Board And Method For Manufacturing Electronic Device
US-2017032978-A1 · Feb 2, 2017 · US
US11337315B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11337315-B2 |
| Application number | US-201916498032-A |
| Country | US |
| Kind code | B2 |
| Filing date | Apr 22, 2019 |
| Priority date | Apr 27, 2018 |
| Publication date | May 17, 2022 |
| Grant date | May 17, 2022 |
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A surface treated copper foil 1 includes a copper foil 2, and a first surface treatment layer 3 formed on one surface of the copper foil 2. The first surface treatment layer 3 of the surface treated copper foil 1 has L* of a CIE L*a*b* color space of 44.0 to 84.0. A copper clad laminate 10 includes the surface treated copper foil 1 and an insulating substrate 11 adhered to a surface of the surface treated copper foil 1 opposite to the first surface treatment layer 3.
Opening claim text (preview).
The invention claimed is: 1. A surface treated copper foil comprising a copper foil, a first surface treatment layer formed on one surface of the copper foil, wherein the first surface treatment layer comprises a Zn deposited amount of 200 to 600 μg/dm 2 , a Cr deposited amount of 10 μg/dm 2 or more, and a Ni deposited amount of 30 to 200 μg/dm 2 , and a second surface treatment layer to be adhered to an insulating substrate, formed on the other surface of the copper foil, wherein the first surface treatment layer comprises L* of a CIE L*a*b* color space of 44.0 to 84.0, and the second surface treatment layer comprises a surface roughness Sa of 0.05 to 0.40 μm. 2. The surface treated copper foil according to claim 1 , wherein the L* of the first surface treatment layer is from 74.0 to 84.0. 3. The surface treated copper foil according to claim 1 , wherein the first surface treatment layer comprises a Cr deposited amount of 10 μg/dm 2 or more. 4. The surface treated copper foil according to claim 1 , wherein the first surface treatment layer comprises a Ni deposited amount of 30 to 200 μg/dm 2 . 5. The surface treated copper foil according to claim 1 , wherein the second surface treatment layer comprises a Ni deposited amount of 20 to 200 μg/dm 2 . 6. The surface treated copper foil according to claim 1 , wherein the second surface treatment layer comprises a Zn deposited amount of 20 to 1,000 μg/dm 2 . 7. A copper clad laminate comprising the surface treated copper foil according to claim 1 , and an insulating substrate adhered to the second surface treatment layer of the surface treated copper foil. 8. A printed circuit board comprising a circuit pattern formed by etching the surface treated copper foil of the copper clad laminate according to claim 7 .
of paper or cardboard · CPC title
Chromatising · CPC title
PCBs, i.e. printed circuit boards · CPC title
two or more layers being of nickel or chromium, e.g. duplex or triplex layers · CPC title
Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites · CPC title
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