Balanced resonator source for plasma processing
US-12580153-B2 · Mar 17, 2026 · US
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Sridhar Shyam patents
Sridhar Shyam is listed as an inventor on 38 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Sridhar Shyam |
| Total patents | 38 |
| First publication | Jul 12, 2018 |
| Latest publication | Mar 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method of sustaining plasma for plasma processing
US-2026066226-A1 · Mar 5, 2026 · US
System and method to measure ion properties in a plasma system
US-12555756-B2 · Feb 17, 2026 · US
Grid-less ion energy detector
US-2025292994-A1 · Sep 18, 2025 · US
System and method of pulse scoring
US-2025293095-A1 · Sep 18, 2025 · US
Grid-less ion angle detector
US-2025291076-A1 · Sep 18, 2025 · US
Method of uniformity control
US-2025273439-A1 · Aug 28, 2025 · US
Plasma potential adjustment circuit
US-2025273429-A1 · Aug 28, 2025 · US
Profile simulation calibration with in-situ sensor data
US-2025266250-A1 · Aug 21, 2025 · US
Balanced RF resonant antenna system
US-12394600-B2 · Aug 19, 2025 · US
Recent patents
Latest publications not already listed above.
Selective deposition using differential surface charging
US-2025259824-A1 · Aug 14, 2025 · US
Balanced resonator source for plasma processing
US-2025232952-A1 · Jul 17, 2025 · US
Method and system for plasma process
US-2025226179-A1 · Jul 10, 2025 · US
Method and system for plasma process
US-2025226192-A1 · Jul 10, 2025 · US
Method of uniformity control
US-12300468-B2 · May 13, 2025 · US
System and method to measure ion properties in a plasma system
US-2025132138-A1 · Apr 24, 2025 · US
Processing substrates with plasma modulated by dc magnetic fields
US-2025079128-A1 · Mar 6, 2025 · US
Topographic selective deposition
US-12224160-B2 · Feb 11, 2025 · US
Plasma processing methods using multiphase multifrequency bias pulses
US-12217935-B2 · Feb 4, 2025 · US
Topographic Selective Deposition
US-2024395507-A1 · Nov 28, 2024 · US
Balanced RF Resonant Antenna System
US-2024363310-A1 · Oct 31, 2024 · US
Plasma processing systems with matching network and methods
US-2024339297-A1 · Oct 10, 2024 · US
Method for gate stack formation and etching
US-12009430-B2 · Jun 11, 2024 · US
Plasma Processing Methods Using Multiphase Multifrequency Bias Pulses
US-2023411116-A1 · Dec 21, 2023 · US
Plasma systems and processes with pulsed magnetic field
US-2023377853-A1 · Nov 23, 2023 · US
Plasma etching using multiphase multifrequency power pulses and variable duty cycling
US-2023377895-A1 · Nov 23, 2023 · US
Method of Uniformity Control
US-2023377849-A1 · Nov 23, 2023 · US
Methods for resistive RAM (ReRAM) performance stabilization via dry etch clean treatment
US-11637242-B2 · Apr 25, 2023 · US
Plasma etch processes
US-11398386-B2 · Jul 26, 2022 · US
METHODS FOR RESISTIVE RAM (ReRAM) PERFORMANCE STABILIZATION VIA DRY ETCH CLEAN TREATMENT
US-2022059765-A1 · Feb 24, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 38 |
| Suny Polytechnic Inst College Of Nanoscience And Engineering | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P50/242 | 15 |
| H01L21/3065 | 15 |
| H01J37/32146 | 12 |
| H10P50/283 | 12 |
| H10P50/268 | 12 |