Substrate processing method and substrate processing apparatus
US-2026079393-A1 · Mar 19, 2026 · US
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Shimura Satoru patents
Shimura Satoru is listed as an inventor on 25 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Shimura Satoru |
| Total patents | 25 |
| First publication | Dec 10, 2015 |
| Latest publication | Mar 19, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Substrate processing system, substrate processing method, and recording medium
US-2026016753-A1 · Jan 15, 2026 · US
Resist film forming method, resist film forming device, and recording medium
US-2026016754-A1 · Jan 15, 2026 · US
Method for observing surface
US-2025231116-A1 · Jul 17, 2025 · US
Substrate processing method and substrate processing system
US-2025092514-A1 · Mar 20, 2025 · US
Substrate treatment method and substrate treatment system
US-12197129-B2 · Jan 14, 2025 · US
Heat-treating method, heat-treating apparatus, and storage medium
US-2024347354-A1 · Oct 17, 2024 · US
Communication system, communication method, and server
US-12047861-B2 · Jul 23, 2024 · US
Substrate treatment method, substrate treatment apparatus, and computer storage medium
US-2024120217-A1 · Apr 11, 2024 · US
Substrate treatment method, and computer storage medium
US-2024036473-A1 · Feb 1, 2024 · US
Recent patents
Latest publications not already listed above.
Communication system, communication method, and server
US-2022248299-A1 · Aug 4, 2022 · US
Substrate treatment method and substrate treatment system
US-2021318618-A1 · Oct 14, 2021 · US
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
US-10998183-B2 · May 4, 2021 · US
Film forming system, film forming method, and computer storage medium
US-10964606-B2 · Mar 30, 2021 · US
Film forming system, film forming method, and computer storage medium
US-2019355573-A1 · Nov 21, 2019 · US
Exposure apparatus, resist pattern forming method, and storage medium
US-10101669-B2 · Oct 16, 2018 · US
Substrate treatment system
US-10025190-B2 · Jul 17, 2018 · US
Film forming method, computer storage medium, and film forming system
US-9741559-B2 · Aug 22, 2017 · US
Substrate treatment system
US-2017031245-A1 · Feb 2, 2017 · US
Exposure apparatus, resist pattern forming method, and storage medium
US-2016327869-A1 · Nov 10, 2016 · US
Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium
US-2016163534-A1 · Jun 9, 2016 · US
Substrate treatment method, non-transitory computer storage medium and substrate treatment system
US-9341952-B2 · May 17, 2016 · US
Film forming method, non-transitory computer storage medium and film forming apparatus
US-9329483-B2 · May 3, 2016 · US
Substrate treatment method, non-transitory computer storage medium and substrate treatment system
US-9280052-B2 · Mar 8, 2016 · US
Film forming method, computer storage medium, and film forming system
US-2015357188-A1 · Dec 10, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 23 |
| Univ Osaka | 2 |
| Nec Corp | 2 |
| Univ Kyoto | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0448 | 9 |
| H10P72/0458 | 8 |
| G03F7/168 | 7 |
| H10P72/0436 | 7 |
| H10P76/2041 | 7 |