Lithographic Patterning Process and Resists to Use Therein
US-2018004085-A1 · Jan 4, 2018 · US
Substrate treatment method and substrate treatment system
US12197129B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12197129-B2 |
| Application number | US-201917268362-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 21, 2019 |
| Priority date | Aug 23, 2018 |
| Publication date | Jan 14, 2025 |
| Grant date | Jan 14, 2025 |
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Abstract
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A substrate treatment method of treating a treatment object substrate includes before applying a resist solution for forming a resist film onto a base film formed on a substrate surface of the treatment object substrate, making a determination of which one of a first treatment and a second treatment to perform based on the treatment object substrate. In response to the determination determining to perform the first treatment, performing the first treatment of decreasing a polarity of the base film to bring it closer to a polarity of the resist solution. In response to the determination determining to perform the second treatment, performing a treatment of increasing the polarity of the base film to bring it closer to the polarity of the resist solution.
First claim
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What is claimed is: 1. A substrate treatment method of treating a plurality of treatment object substrates including a treatment object substrate, each of the treatment object substrates having a base film polarity which may be greater than or less than a resist solution polarity, the substrate treatment method comprising before applying a resist solution for forming a resist film onto a base film formed on a substrate surface of the treatment object substrate, making, by a substrate treatment apparatus, a determination which one of a first treatment and a second treatment to perform based on the treatment object substrate, wherein the substrate treatment apparatus is configured to be able to perform both the first treatment and the second treatment, wherein the first treatment is a treatment of decreasing a polarity of the base film to bring it closer to a polarity of the resist solution, and the second treatment is a treatment of increasing the polarity of the base film to bring it closer to the polarity of the resist solution, responsive to the determination determining to perform the first treatment, perform using the substrate treatment apparatus the first treatment of decreasing the polarity of the base film, and responsive to the determination determining to perform the second treatment, perform using the substrate treatment apparatus the second treatment of increasing the polarity of the base film. 2. The substrate treatment method according to claim 1 , wherein the treatment of decreasing the polarity of the base film is a treatment of supplying an HMDS gas to the base film. 3. The substrate treatment method according to claim 1 , wherein the treatment of decreasing the polarity of the base film is a treatment of supplying a TMAH solution to the base film. 4. The substrate treatment method according to claim 1 , wherein the treatment of increasing the polarity of the base film is a treatment of radiating UV light to the base film. 5. The substrate treatment method according to claim 1 , further comprising after the treatment of decreasing the polarity of the base film, removing a hydrophobic group on the surface of the base film decreased in polarity. 6. The substrate treatment method according to claim 5 , wherein the removing the hydrophobic group is a treatment of radiating UV light to the base film decreased in polarity. 7. The substrate treatment method according to claim 1 , wherein the treatment of decreasing the polarity of the base film and the treatment of increasing the polarity of the base film are treatments of covering the base film with a predetermined film composed of a polar polymer and a nonpolar polymer. 8. The substrate treatment method according to claim 7 , wherein the predetermined film is formed by applying a solution in which the polar polymer and the nonpolar polymer exist to the base film. 9. The substrate treatment method according to claim 7 , wherein the predetermined film is a self-assembled monolayer formed by supplying a mixed gas in which gas made by evaporating a solution containing the polar polymer and gas made by evaporating a solution containing the nonpolar polymer are mixed, to the base film. 10. The substrate treatment method according to claim 1 , further comprising performing a treatment of suppressing movement of a nonpolar component contained in the resist solution to a surface layer side in a coating film of the resist solution formed by being applied onto the base film. 11. The substrate treatment method according to claim 10 , further comprising applying the resist solution onto the base film, wherein the treatment of suppressing the movement of the nonpolar component to the surface layer side is a treatment of supplying gas made by evaporating a solvent for the resist solution, a halogen gas, or an inert gas into a treatment chamber of a resist coating apparatus configured to perform the application in the applying the resist solution onto the base film. 12. The substrate treatment method according to claim 10 , further comprising forming a resist film by heating the coating film of the resist solution formed on the base film, wherein the treatment of suppressing the movement of the nonpolar component to the surface layer side is a treatment of supplying gas made by evaporating a solvent for the resist solution, a halogen gas, or an inert gas into a treatment chamber of a thermal treatment apparatus configured to perform the heating in the forming the resist film. 13. The substrate treatment method according to claim 10 , wherein the treatment of suppressing the movement of the nonpolar component to the surface layer side is a treatment of forming another preetermined film on the coating film before heating the coating film of the resist solution formed on the base film.
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Classifications
of organic photoresist masks · CPC title
vertical arrangement · CPC title
Apparatus for applying a liquid, a resin, an ink or the like · CPC title
using an anti-reflective coating · CPC title
using a previously coated surface, e.g. by stamping or by transfer lamination · CPC title
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- What does patent US12197129B2 cover?
- A substrate treatment method of treating a treatment object substrate includes before applying a resist solution for forming a resist film onto a base film formed on a substrate surface of the treatment object substrate, making a determination of which one of a first treatment and a second treatment to perform based on the treatment object substrate. In response to the determination determining…
- Who is the assignee on this patent?
- Tokyo Electron Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F7/11. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Jan 14 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).