Illumination system of a microlithographic projection exposure apparatus with a birefringent element
US-10151982-B2 · Dec 11, 2018 · US
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Saenger Ingo patents
Saenger Ingo is listed as an inventor on 40 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Saenger Ingo |
| Total patents | 40 |
| First publication | Jan 15, 2015 |
| Latest publication | Dec 11, 2018 |
Notable patents
Publications ranked by popularity score, then publication date.
Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement
US-10041836-B2 · Aug 7, 2018 · US
EUV light source for generating a usable output beam for a projection exposure apparatus
US-9955563-B2 · Apr 24, 2018 · US
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
US-9946161-B2 · Apr 17, 2018 · US
Optical system of a microlithographic projection exposure apparatus
US-9817317-B2 · Nov 14, 2017 · US
Method and apparatus for compensating at least one defect of an optical system
US-9798249-B2 · Oct 24, 2017 · US
Mirror
US-9678439-B2 · Jun 13, 2017 · US
Optical assembly for increasing the etendue
US-9678432-B2 · Jun 13, 2017 · US
Mirror system comprising at least one mirror for use for guiding illumination and imaging light in EUV projection lithography
US-9665008-B2 · May 30, 2017 · US
Collector
US-9645503-B2 · May 9, 2017 · US
Recent patents
Latest publications not already listed above.
Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
US-9632413-B2 · Apr 25, 2017 · US
Optical system, in particular of a microlithographic projection exposure apparatus
US-9588433-B2 · Mar 7, 2017 · US
Method of lithographically transferring a pattern on a light sensitive surface and illumination system of a microlithographic projection exposure apparatus
US-9581910-B2 · Feb 28, 2017 · US
Illumination system for an EUV lithography device and facet mirror therefor
US-9551941-B2 · Jan 24, 2017 · US
Illumination optical unit for projection lithography
US-9507269-B2 · Nov 29, 2016 · US
Optical system of a microlithographic projection exposure apparatus, and microlithographic exposure
US-9500956-B2 · Nov 22, 2016 · US
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
US-9488918-B2 · Nov 8, 2016 · US
EUV light source for generating a used output beam for a projection exposure apparatus
US-9477025-B2 · Oct 25, 2016 · US
Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method
US-9442385-B2 · Sep 13, 2016 · US
Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus
US-9411245-B2 · Aug 9, 2016 · US
Optical system of a microlithographic projection exposure apparatus
US-9405202-B2 · Aug 2, 2016 · US
Illumination system of a microlithographic projection exposure apparatus with a birefringent element
US-2016195815-A1 · Jul 7, 2016 · US
Optical system of a microlithographic projection exposure apparatus
US-9323156-B2 · Apr 26, 2016 · US
Illumination system of a microlithographic projection exposure apparatus with a birefringent element
US-9316920-B2 · Apr 19, 2016 · US
Illumination system for an euv lithography device and facet mirror therefor
US-2016004164-A1 · Jan 7, 2016 · US
Optical assembly for increasing the etendue
US-2015355552-A1 · Dec 10, 2015 · US
Illumination optical unit for a projection exposure apparatus
US-9195057-B2 · Nov 24, 2015 · US
Polarization measuring device, lithography apparatus, measuring arrangement, and method for polarization measurement
US-2015323387-A1 · Nov 12, 2015 · US
Euv light source for generating a used output beam for a projection exposure apparatus
US-2015323874-A1 · Nov 12, 2015 · US
Optical system of a microlithographic projection exposure apparatus
US-9182677-B2 · Nov 10, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 40 |
| Fiolka Damian | 1 |
| Walldorf Daniel | 1 |
| Saenger Ingo | 1 |
| Zeiss Carl Sms Ltd | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70566 | 31 |
| G03F7/70191 | 26 |
| G03F7/70116 | 25 |
| G03F7/702 | 11 |
| G02B27/286 | 10 |