Collector

Patent metadata

Field	Value
Publication number	US-9645503-B2
Application number	US-201414210625-A
Country	US
Kind code	B2
Filing date	Mar 14, 2014
Priority date	Oct 11, 2011
Publication date	May 9, 2017
Grant date	May 9, 2017

Abstract

A collector for a projection exposure apparatus for microlithography comprises a plurality of reflective sections which are embodied and arranged in such a way that they can be impinged upon during the focusing of radiation from a first focus into a second focus with angles of impingement in a predefined angular spectrum.

First claim

The invention claimed is:

1. A collector, comprising:
a collector shell comprising a plurality of reflective sections,
wherein:
the collector shell has a first focus and a second focus different from the first focus;
for each of the plurality of reflective sections, the reflective section is configured so that during use of the collector:
radiation is reflected from the first focus into the second focus; and
radiation emerging from a radiation source arranged at the first focus impinges the reflective section at angles of impingement in a spectrum of angles within a range of at most 10° around a predefined angle of impingement; and
the predefined angle of impingement is the same for each of the plurality of reflective sections; and

the collector is a microlithography collector.

2. The collector of claim 1 , wherein the predefined angle of impingement deviates from the Brewster angle by at most 10°.

3. The collector of claim 1 , wherein the reflective section is configured so that, at the predefined angle of impingement, the reflective section has a reflectance of at least 50% for EUV radiation.

4. A system, comprising:
a radiation source; and
the collector of claim 1 ,
wherein the system is a microlithography illumination system.

5. An apparatus, comprising:
an illumination system comprising the collector of claim 1 ; and
a projection optical unit,
wherein the apparatus is a microlithography projection exposure apparatus.

6. A method of using a microlithography projection exposure apparatus comprising an illumination system and a projection optical unit, the method comprising:
using the illumination system to illuminate a reticle; and
using the projection optical unit to project at least a section of the reticle onto a light-sensitive material,
wherein the illumination system comprises the collector of claim 1 .

7. The collector of claim 1 , wherein the number of reflective sections is in the range of 20 to 50.

8. The collector of claim 1 , wherein each reflective section is rotationally symmetric with respect to an optical axis of the collector, and the plurality of reflective sections are continuous.

9. The collector of claim 1 , wherein the reflective sections are mechanically held by a holding device embodied as a supporting shell.

10. The collector of claim 9 , wherein the connecting pieces are made of the same material as a substrate of the reflective sections.

11. The collector of claim 1 , wherein the reflective sections are in each case mechanically connected to one another by connecting pieces.

12. The collector of claim 1 , wherein the plurality of reflective sections are a monolithic element.

13. The collector of claim 1 , wherein the collector comprises an additional collector shell, and wherein the additional collector shell comprises a spherical surface section around the first focus.

14. A system, comprising:
a radiation source configured to generate unpolarized radiation; and
a collector comprising a collector shell comprising a reflective section configured so that, during use of the system when the unpolarized radiation emerges from the radiation source and impinges on the reflective section, the unpolarized radiation is reflected into an intermediate focus so that the reflected radiation at the intermediate focus has a uniform polarization,
wherein the system is a microlithography illumination system.

15. An apparatus, comprising:
an illumination system according to claim 14 ; and
a projection optical unit,
wherein the apparatus is a microlithography projection exposure apparatus.

16. A method, comprising:
impinging radiation on each reflective section of a collector shell within an angular range of at most 10° around a predefined angle of impingement for each reflective section,
wherein each reflective section of the collector shell is configured so the radiation is reflected into a predefined focus, and the radiation at the predefined focus has a direction independent polarization state.

17. A collector, comprising:
a collector shell comprising a plurality of reflective sections,
wherein:
the collector shell has a first focus and a second focus different from the first focus;
for each reflective section, the reflective section is configured so that during use of the collector:
radiation is reflected from the first focus into the second focus;
a spectrum of angles of impingement on the reflective section is within a range of at most 10° around a predefined angle of impingement;

the collector is a microlithography collector;
the reflective section is configured so that during use of the collector radiation emerging from a radiation source arranged at the first focus impinges the reflective section at angles of impingement in a spectrum of angles within a range of at most 10° around a predefined angle of impingement; and
the predefined angle of impingement is the same for each of the plurality of reflective sections;
the additional collector shell comprises a spherical surface section around the first focus; and
the collector comprises an additional collector shell.

18. The collector of claim 17 , wherein the predefined angle of impingement deviates from the Brewster angle by at most 10°.

19. The collector of claim 17 , wherein the reflective section is configured so that, at the predefined angle of impingement, the reflective section has a reflectance of at least 50% for EUV radiation.

20. The collector of claim 17 , wherein the number of reflective sections is in the range of 20 to 50.

21. The collector of claim 17 , wherein the additional collector shell has an opening configured to allow radiation to pass therethrough during use of the collector.

22. The collector of claim 21 , wherein the opening is arranged off-axis with respect to an optical axis.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Saenger Ingo
• Zimmermann Joerg
• Kraehmer Daniel
• Ruoff Johannes
• Meier Martin
• Schlesener Frank
• Hennerkes Christoph
• Singer Wolfgang

Classifications

• G03F7/702 Primary

  Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems · CPC title

• G02B19/0095

  for use with ultraviolet radiation · CPC title

• G02B19/0023

  at least one surface having optical power · CPC title

• G02B27/286

  for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another (G02B5/3083 takes precedence; light guide coupling means utilising polarising elements G02B6/34) · CPC title

• B82Y10/00

  Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic · CPC title