Method and apparatus for compensating at least one defect of an optical system

Patent metadata

Field	Value
Publication number	US-9798249-B2
Application number	US-201414457712-A
Country	US
Kind code	B2
Filing date	Aug 12, 2014
Priority date	Feb 21, 2012
Publication date	Oct 24, 2017
Grant date	Oct 24, 2017

Abstract

The invention relates to a method for compensating at least one defect of an optical system which includes introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the at least one defect is at least partially compensated.

First claim

The invention claimed is:

1. A method, comprising:
at least partially compensating for a defect of an optical system by introducing an arrangement of modifications in an optical element of the optical system,
wherein:
the optical element does not have pattern elements on one of its optical surfaces;
the arrangement of modifications is configured to exist in the optical element after:
a) the optical element has been used in the optical system; and
b) after a), the optical system is not in use; and

the method further comprises compensating each optical element of the optical system.

2. The method of claim 1 , wherein the defect comprises a member selected from the group consisting of a local polarization variation of the optical element and a local intensity variation of the optical element.

3. The method of claim 1 , further comprising one of the following:
introducing the arrangement of modifications in an optically relevant area of the optical element;
introducing the arrangement of modifications outside an optically relevant area of the optical element; or
introducing the arrangement of modifications in an optically relevant area of the optical element and introducing an additional arrangement of modifications outside the optically relevant area of the optical element, the additional arrangement of modifications being configured to exist in the optical element after a) and b).

4. The method of claim 1 , further comprising selecting the arrangement of modifications so that a strain induced by the arrangement of modifications at least partially compensates a local polarization variation of the optical system.

5. The method of claim 1 , wherein the defect of the optical system comprises a member selected from the group consisting of a defect of the optical element and a defect of a further optical element of the optical system.

6. The method of claim 1 , further comprising determining the arrangement of modifications from a measurement selected from the group consisting of an intensity variation measurement of the optical element, a polarization measurement of the optical element, a birefringence measurement the optical element, an intensity variation measurement of the optical system, a polarization measurement of the optical system, and a birefringence measurement of the optical system.

7. The method of claim 1 , wherein the optical system comprises a plurality of optical elements, and the method further comprises selecting the optical element to compensate the defect to a maximum extent.

8. The method of claim 1 , wherein the optical system is an illumination system of a photolithographic projection exposure system, and one of the following holds:
the optical element is arranged next to a field plane of the illumination system; or
the optical element is arranged between a field plane of the illumination system and a pupil plane of the illumination system.

9. The method of claim 1 , further comprising inserting an additional optical element into the optical system, wherein the additional optical element comprises an arrangement of modifications positioned to compensate the defect to a maximum extent, and the arrangement of modifications in the additional optical element is configured to exist in the optical element after a) and b).

10. The method of claim 1 , wherein the system further comprises a retardation compensation component, and the method further comprises introducing an arrangement of modifications in the retardation compensation component.

11. The method of claim 1 , wherein the optical element comprises a neutral density filter used for a nonuniformity compensation of the optical system.

12. The method of claim 1 , wherein the arrangement of modifications is not rotationally symmetric in a plane perpendicular to a beam propagation direction within the optical system.

13. The method of claim 1 , wherein:
the optical element comprises a first defection compensation area comprising a first arrangement of modifications in a plane perpendicular to a beam propagation direction of the optical element;
the optical element comprises a second defection compensation area comprising a second arrangement of modifications in the plane perpendicular to a beam propagation direction of the optical element;
the second arrangement of modifications is different from the first arrangement of modifications;
the first arrangement of modifications being configured to exist in the optical element after a) and b; and
the second arrangement of modifications being configured to exist in the optical element after a) and b.

14. The method of claim 1 , wherein the optical system comprises an additional optical element, and the method further comprises shifting the additional optical element along a beam propagation direction in the optical system to compensate the defect to a maximum extent.

15. The method of claim 1 , further comprising introducing the arrangement of modifications in a constant depth relative to a surface contour of the optical element.

16. The method of claim 1 , further comprising introducing at least two different arrangements of modifications in various depths of the optical element, wherein each of the at least two arrangements of modifications in the additional optical element is configured to exist in the optical element after a) and b.

17. A method, comprising:
at least partially compensating for a defect of an optical system by introducing an arrangement of modifications in an optical element of the optical system,
wherein:
the optical element does not have pattern elements on one of its optical surfaces;
the arrangement of modifications is configured to exist in the optical element after:
a) the optical element has been used in the optical system; and
b) after a), the optical system is not in use;

the method further comprises inserting an additional optical element into the optical system;
the additional optical element comprises an arrangement of modifications positioned to compensate the defect to a maximum extent; and
the arrangement of modifications in the additional optical element is configured to exist in the optical element after a) and b).

18. A method, comprising:
at least partially compensating for a defect of an optical system by introducing an arrangement of modifications in an optical element of the optical system,
wherein:
the optical element does not have pattern elements on one of its optical surfaces;
the arrangement of modifications is configured to exist in the optical element after:
a) the optical element has been used in the optical system; and
b) after a), the optical system is not in use;

the system further comprises a retardation compensation component; and
the method further comprises introducing an arrangement of modifications in the retardation compensation component.

19. A method, comprising:
at least partially compensating for a defect of an optical system by introducing an arrangement of modifications in an optical element of the optical system,
wherein:
the optical element does not have pattern elements on one of its optical surfaces;
the arrangement of modifications is configured to exist in the optical element after:
a) the optical element has been used in the optical system; and
b) after a), the optical system is not in use; and

the optical element comprises a neutral density filter used for a nonuniformity compensation of the optical system.

20. A method, comprising:
at least partially compensating for a d

Assignees

• Zeiss Carl Sms Ltd
• Zeiss Carl Smt Gmbh

Inventors

• Dmitriev Vladimir
• Saenger Ingo
• Schlesener Frank
• Mengel Markus
• Ruoff Johannes

Classifications

• G03F7/70191

  Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like · CPC title

• G01M11/0242

  by measuring geometrical properties or aberrations · CPC title

• G03F7/70308

  Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift · CPC title

• G02B5/3091

  for use in the UV · CPC title

• G02B27/0043

  in projection exposure systems, e.g. microlithographic systems · CPC title