Bottom purge for semiconductor processing system
US-12588451-B2 · Mar 24, 2026 · US
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Pathak Nitin patents
Pathak Nitin is listed as an inventor on 34 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Pathak Nitin |
| Total patents | 34 |
| First publication | May 12, 2016 |
| Latest publication | Mar 24, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Uniform in situ cleaning and deposition
US-2026004996-A1 · Jan 1, 2026 · US
Uniform in situ cleaning and deposition
US-12347653-B2 · Jul 1, 2025 · US
Baffle implementation for improving bottom purge gas flow uniformity
US-2025201534-A1 · Jun 19, 2025 · US
Multiple process semiconductor processing system
US-12266550-B2 · Apr 1, 2025 · US
Methods to eliminate of deposition on wafer bevel and backside
US-12255054-B2 · Mar 18, 2025 · US
Baffle implementation for improving bottom purge gas flow uniformity
US-12183553-B2 · Dec 31, 2024 · US
Cleaning assemblies for substrate processing chambers
US-2024368756-A1 · Nov 7, 2024 · US
Semiconductor processing chambers and methods for cleaning the same
US-2024247371-A1 · Jul 25, 2024 · US
Cleaning assemblies for substrate processing chambers
US-12012653-B2 · Jun 18, 2024 · US
Recent patents
Latest publications not already listed above.
Semiconductor processing chambers and methods for cleaning the same
US-11952660-B2 · Apr 9, 2024 · US
Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater
US-11952663-B2 · Apr 9, 2024 · US
Uniform in situ cleaning and deposition
US-2023402261-A1 · Dec 14, 2023 · US
Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater
US-2023392259-A1 · Dec 7, 2023 · US
Isolator apparatus and methods for substrate processing chambers
US-11827980-B2 · Nov 28, 2023 · US
Uniform in situ cleaning and deposition
US-11742185-B2 · Aug 29, 2023 · US
Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater
US-11643725-B2 · May 9, 2023 · US
Isolator apparatus and methods for substrate processing chambers
US-2023047451-A1 · Feb 16, 2023 · US
Isolator apparatus and methods for substrate processing chambers
US-11492705-B2 · Nov 8, 2022 · US
Uniform in situ cleaning and deposition
US-2022310360-A1 · Sep 29, 2022 · US
Cleaning assemblies for substrate processing chambers
US-2022307129-A1 · Sep 29, 2022 · US
Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater
US-2022307135-A1 · Sep 29, 2022 · US
Methods to eliminate of deposition on wafer bevel and backside
US-2022199373-A1 · Jun 23, 2022 · US
Distribution components for semiconductor processing systems
US-2022028710-A1 · Jan 27, 2022 · US
Multiple process semiconductor processing system
US-2022020615-A1 · Jan 20, 2022 · US
Bottom purge for semiconductor processing system
US-2021320017-A1 · Oct 14, 2021 · US
Gas box for CVD chamber
US-11049699-B2 · Jun 29, 2021 · US
Semiconductor processing chambers and methods for cleaning the same
US-2021032747-A1 · Feb 4, 2021 · US
Isolator apparatus and methods for substrate processing chambers
US-2021002763-A1 · Jan 7, 2021 · US
Baffle implementation for improving bottom purge gas flow uniformity
US-2020388470-A1 · Dec 10, 2020 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 34 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| C23C16/45565 | 16 |
| C23C16/4585 | 16 |
| C23C16/4405 | 15 |
| C23C16/4412 | 14 |
| H01J37/32449 | 12 |