Semiconductor processing chambers and methods for cleaning the same

Patent metadata

Field	Value
Publication number	US-11952660-B2
Application number	US-202016936110-A
Country	US
Kind code	B2
Filing date	Jul 22, 2020
Priority date	Jul 29, 2019
Publication date	Apr 9, 2024
Grant date	Apr 9, 2024

Abstract

A processing chamber may include a gas distribution member, a substrate support, and a pumping liner. The gas distribution member and the substrate support may at least in part define a processing volume. The pumping liner may define an internal volume in fluid communication with the processing volume via a plurality of apertures of the pumping liner circumferentially disposed about the processing volume. The processing chamber may further include a flow control mechanism operable to direct fluid flow from the internal volume of the pumping liner into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

First claim

The invention claimed is:

1. A processing chamber, comprising:
a gas distribution member;
a substrate support positioned below the gas distribution member, wherein the gas distribution member and the substrate support at least in part define a processing volume, and wherein the gas distribution member provides fluid access into the processing volume;
a pumping liner disposed radially outward from the substrate support, wherein:
the pumping liner having an outer wall and defining a first laterally extending liner portion and a first toroidally shaped liner portion;
the pumping liner defines a plurality of apertures circumferentially disposed about the processing volume and an internal volume that is in fluid communication with the processing volume via the plurality of apertures, wherein the internal volume of the pumping liner includes a first laterally extending volume portion and a first toroidally shaped volume portion; and
the pumping liner further defines a gas inlet disposed radially outward from the plurality of apertures, wherein the gas inlet provides fluid access into the internal volume of the pumping liner; and

a flow control mechanism, wherein the flow control mechanism is operable to direct fluid flow into the internal volume via the gas inlet and then into the processing volume via a subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

2. The processing chamber of claim 1 , wherein the flow control mechanism comprises a first choke plate and a second choke plate disposed inside the pumping liner, wherein the first choke plate and the second choke plate divide the internal volume of the pumping liner into a first volume and a second volume, wherein the first volume is in fluid communication with the processing volume via one half of the plurality of apertures, wherein the second volume is in fluid communication with the processing chamber via the other half of the plurality of apertures, and wherein the flow control mechanism is operable to direct fluid flow from the first volume into the second volume via the processing volume.

3. The processing chamber of claim 1 , wherein the flow control mechanism comprises a valve disposed downstream of a gas outlet and upstream of an exhaust, wherein the valve is operable to close to prevent fluid flow from the processing chamber or the internal volume of the pumping liner to the exhaust via the gas outlet.

4. The processing chamber of claim 3 , wherein the gas outlet is a first gas outlet, wherein the valve is a first valve, wherein the flow control mechanism further comprises a second gas outlet and a second valve disposed downstream of the second gas outlet and upstream of the exhaust, wherein the gas inlet is a first gas inlet, wherein the pumping liner further defines a second gas inlet, and wherein the second valve is operable to close to direct fluid flow into the internal volume via the second gas inlet and then into the processing volume via another subset of the plurality of apertures during fluid distribution into the processing volume from the gas distribution member.

5. The processing chamber of claim 1 , wherein the flow control mechanism is operable to create a pressure differential between a pressure inside a first duct coupling a first gas outlet to an exhaust and a pressure inside a second duct coupling a second gas outlet to the exhaust.

6. The processing chamber of claim 1 , wherein the pumping liner comprises a first internal baffle and a second internal baffle diametrically opposed from each other.

7. The processing chamber of claim 6 , wherein the first baffle is disposed between the gas inlet and the plurality of apertures.

8. The processing chamber of claim 1 , wherein the pumping liner comprises:
the first laterally extending liner portion defining the first laterally extending volume portion of the internal volume of the pumping liner, wherein the gas inlet is disposed at an upper surface of the first laterally extending liner portion;
a second laterally extending liner portion defining a second laterally extending volume portion of the internal volume of the pumping liner, wherein the first laterally extending volume portion and the second laterally extending volume portion are diametrically opposed from each other;
a third portion defining the first toroidally shaped volume portion of the internal volume of the pumping liner, wherein the first toroidally shaped volume portion is disposed between the first laterally extending volume portion and the second laterally extending volume portion; and
a fourth portion defining a second toroidally shaped volume portion of the internal volume of the pumping liner, wherein the first toroidally shaped volume portion and the second toroidally shaped volume portion are diametrically opposed from each other.

9. The processing chamber of claim 8 , wherein the gas inlet is a first gas inlet, wherein the pumping liner further defines a second gas inlet disposed at an upper surface of the second laterally extending liner portion, and wherein the flow control mechanism is further operable to direct fluid flow into the internal volume of the pumping liner via the second gas inlet and then into the processing volume via another subset of the plurality of apertures of the pumping liner during fluid distribution into the processing volume from the gas distribution member.

10. The processing chamber of claim 1 , further comprises an annular gap around the substrate support to provide fluid access from a lower portion of the processing chamber to the processing volume and the internal volume of the pumping liner.

11. The processing chamber of claim 1 , wherein each aperture of the plurality of apertures is disposed at an equal distance from adjacent two apertures of the plurality of apertures.

Assignees

• Applied Materials Inc

Inventors

• Pathak Nitin
• Zhang Yuxing
• Nguyen Tuan A
• Ghosh Kalyanjit
• Bansal Amit
• Rocha-Alvarez Juan Carlos

Classifications

• C23C16/45502

  Flow conditions in reaction chamber · CPC title

• C23C16/4585

  Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds · CPC title

• C23C16/4405 Primary

  Cleaning of reactor or parts inside the reactor by using reactive gases · CPC title

• C23C16/4412

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• C23C16/52

  Controlling or regulating the coating process {(C23C16/45557, C23C16/279 take precedence)} · CPC title