Hardware to prevent bottom purge incursion in application volume and process gas diffusion below heater

Patent metadata

Field	Value
Publication number	US-11952663-B2
Application number	US-202318313736-A
Country	US
Kind code	B2
Filing date	May 8, 2023
Priority date	Mar 26, 2021
Publication date	Apr 9, 2024
Grant date	Apr 9, 2024

Abstract

Exemplary semiconductor processing chambers may include a substrate support including a top surface. A peripheral edge region of the top surface may be recessed relative to a medial region of the top surface. The chambers may include a pumping liner disposed about an exterior surface of the substrate support. The chambers may include a liner disposed between the substrate support and the pumping liner. The liner may be spaced apart from the exterior surface to define a purge lumen between the liner and the substrate support. The chambers may include an edge ring seated on the peripheral edge region. The edge ring may extend beyond a peripheral edge of the substrate support and above a portion of the liner. A gap may be formed between a bottom surface of the edge ring and a top surface of the liner. The gap and the purge lumen may be fluidly coupled.

First claim

What is claimed is:

1. A method of processing a semiconductor substrate, comprising flowing a precursor into a semiconductor processing chamber via a showerhead that is disposed above a substrate support on which the semiconductor substrate is positioned; simultaneously flowing a purge gas through a purge lumen defined by an exterior surface of the substrate support and a liner that is spaced apart from the substrate support; an inner surface of the liner comprises a protrusion that extends inward toward the exterior surface of the substrate support; a lateral distance between the exterior surface of the substrate support and the protrusion is between about 60 mils and 100 mils; and diverting the purge gas laterally outward using an edge ring that is positioned atop a peripheral edge of the substrate support and that extends laterally outward of a top end of the purge lumen such that the purge gas and the precursor diffuse with one another at a diffusion position that is radially outward of a bevel of the semiconductor substrate.

2. The method of processing a semiconductor substrate of claim 1 , further comprising:
choking the flow of the purge gas within one or both of the purge lumen and a gap formed between a bottom surface of the edge ring and a top surface of the liner.

3. The method of processing a semiconductor substrate of claim 1 , wherein:
a gap formed between a bottom surface of the edge ring and a top surface of the liner separates the bottom surface of the edge ring and the top surface of the liner by a vertical distance of between about 80 mils and 300 mils.

4. The method of processing a semiconductor substrate of claim 1 , further comprising:
venting the precursor and the purge gas out of the semiconductor processing chamber via a pumping liner that is disposed proximate the diffusion position.

5. The method of processing a semiconductor substrate of claim 1 , further comprising:
raising the substrate support to engage a bottom surface of the edge ring and to lift the edge ring off of the liner.

6. The method of processing a semiconductor substrate of claim 1 , wherein:
the diffusion position is located such that the purge gas is prevented from reaching the substrate support by the flow of the precursor from the showerhead and such that the precursor is prevented from reaching a lateral exterior surface of the substrate support by the flow of the purge gas.

7. The method of processing a semiconductor substrate of claim 1 , wherein:
one or both of a top inner edge and a top outer edge of the liner are rounded.

8. The method of processing a semiconductor substrate of claim 1 , wherein:
one or both of a top inner edge and a top outer edge of the liner are chamfered.

9. The method of processing a semiconductor substrate of claim 1 , wherein:
the substrate support comprises a medial portion and a peripheral edge region that is lower than the medial portion; and
the edge ring has a thickness that is at least substantially equal to a height difference between top surfaces of the medial portion and the peripheral edge region.

10. The method of processing a semiconductor substrate of claim 9 , wherein:
when the substrate support is in a processing position, the edge ring is seated atop the peripheral edge region.

11. The method of processing a semiconductor substrate of claim 1 , wherein:
an outer distal edge of the edge ring extends over at least 10% of a thickness of the liner.

12. The method of processing a semiconductor substrate of claim 1 , wherein:
a width of the purge lumen is between or about 20 mils and 600 mils.

13. The method of processing a semiconductor substrate of claim 1 , wherein:
a width of the purge lumen varies along a height of the purge lumen.

14. The method of processing a semiconductor substrate of claim 1 , wherein:
at least a portion of the liner slopes downward in a radially outward direction.

15. The method of processing a semiconductor substrate of claim 1 , wherein:
the liner comprises a ceramic material.

16. The method of processing a semiconductor substrate of claim 1 , wherein:
the edge ring is seated on a top surface of the liner when the substrate support is in a transfer position.

17. The method of processing a semiconductor substrate of claim 1 , further comprising:
lowering the substrate support to a transfer position.

18. The method of processing a semiconductor substrate of claim 17 , wherein:
in the transfer position, the edge ring is supported by a top surface of the liner and is spaced apart from the substrate support.

Assignees

• Applied Materials Inc

Inventors

• Pathak Nitin
• Nguyen Tuan A
• Bansal Amit
• Ramamurthi Badri N
• Rubio Thomas
• Rocha-Alvarez Juan Carlos

Classifications

• C23C16/45559 Primary

  Diffusion of reactive gas to substrate · CPC title

• C23C16/4412 Primary

  Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps · CPC title

• C23C16/4585

  Devices at or outside the perimeter of the substrate support, e.g. clamping rings, shrouds · CPC title

• C23C16/46

  characterised by the method used for heating the substrate (C23C16/48, C23C16/50 take precedence) · CPC title

• C23C16/4408

  by purging residual gases from the reaction chamber or gas lines · CPC title