Deep image delighting
US-12597100-B2 · Apr 7, 2026 · US
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Moore Robert B patents
Moore Robert B is listed as an inventor on 47 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Moore Robert B |
| Total patents | 47 |
| First publication | Mar 12, 2015 |
| Latest publication | Apr 7, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Graft polymers, methods of making graft polymers, and uses thereof
US-2025289920-A1 · Sep 18, 2025 · US
Plasma source with floating electrodes
US-12394604-B2 · Aug 19, 2025 · US
Crowd removal and automatic focus for images
US-2025259309-A1 · Aug 14, 2025 · US
Color space mapping
US-2025254279-A1 · Aug 7, 2025 · US
Image style transfer
US-2025245878-A1 · Jul 31, 2025 · US
Facial image swapping
US-2025245884-A1 · Jul 31, 2025 · US
Deep image delighting
US-2025238898-A1 · Jul 24, 2025 · US
Cross flow gas delivery for particle reduction
US-2025191897-A1 · Jun 12, 2025 · US
Semiconductor manufacturing susceptor pocket edge for process improvement
US-2024141492-A1 · May 2, 2024 · US
Recent patents
Latest publications not already listed above.
Method and apparatus for post exposure processing of photoresist wafers
US-11899366-B2 · Feb 13, 2024 · US
Blocky poly(ether ether ketone) copolymers and corresponding synthesis methods and articles
US-11840606-B2 · Dec 12, 2023 · US
Plasma source with ceramic electrode plate
US-11776793-B2 · Oct 3, 2023 · US
Plasma Source With Ceramic Electrode Plate
US-2022157569-A1 · May 19, 2022 · US
Blocky poly(ether ether ketone) copolymers and corresponding synthesis methods and articles
US-2022127419-A1 · Apr 28, 2022 · US
Plasma source with floating electrodes
US-2022084796-A1 · Mar 17, 2022 · US
Post exposure processing apparatus
US-11262662-B2 · Mar 1, 2022 · US
Method and apparatus for post exposure processing of photoresist wafers
US-2022004104-A1 · Jan 6, 2022 · US
Method and apparatus for post exposure processing of photoresist wafers
US-11112697-B2 · Sep 7, 2021 · US
Post exposure processing apparatus
US-2021026257-A1 · Jan 28, 2021 · US
Post exposure processing apparatus
US-10845715-B2 · Nov 24, 2020 · US
Microelectronic substrate electro processing system
US-10837119-B2 · Nov 17, 2020 · US
Reduction of aldehydes in amine catalysts
US-10766994-B2 · Sep 8, 2020 · US
Post exposure processing apparatus
US-2019377272-A1 · Dec 12, 2019 · US
Method and apparatus for post exposure processing of photoresist wafers
US-10474033-B2 · Nov 12, 2019 · US
Blocky poly(ether ether ketone) copolymers and corresponding synthesis methods and articles
US-2019315919-A1 · Oct 17, 2019 · US
Post exposure processing apparatus
US-10401742-B2 · Sep 3, 2019 · US
Method and apparatus for post exposure processing of photoresist wafers
US-2019187563-A1 · Jun 20, 2019 · US
Method and apparatus for post exposure processing of photoresist wafers
US-10203604-B2 · Feb 12, 2019 · US
Reduction Of Aldehydes In Amine Catalysts
US-2018355093-A1 · Dec 13, 2018 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 31 |
| Disney Entpr Inc | 6 |
| Huntsman Petrochemical Llc | 5 |
| Virginia Tech Intellectual Properties Inc | 4 |
| Solvay Specialty Polymers It | 3 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/20 | 15 |
| G03F7/38 | 15 |
| G03F7/70991 | 15 |
| H10P72/7618 | 13 |
| H01L21/68764 | 11 |