Method and apparatus for post exposure processing of photoresist wafers

Patent metadata

Field	Value
Publication number	US-10474033-B2
Application number	US-201715692087-A
Country	US
Kind code	B2
Filing date	Aug 31, 2017
Priority date	Nov 30, 2015
Publication date	Nov 12, 2019
Grant date	Nov 12, 2019

Abstract

Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.

First claim

What is claimed is:

1. A substrate processing method, comprising:
positioning a substrate on a first electrode within a process volume;
moving a second electrode to a process position adjacent the substrate;
introducing a process fluid to the process volume;
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid;
removing the process fluid from the process volume;
introducing a rinse fluid to the process volume;
rotating the substrate to remove the rinse fluid from the substrate; and
removing the rinse fluid from the process volume.

2. The method of claim 1 , wherein a purge gas is introduced to the process volume during the rotating the substrate.

3. The method of claim 1 , wherein a purge gas is introduced to the process volume during the removing the rinse fluid from the process volume.

4. The method of claim 1 , wherein the first electrode is preheated prior to the positioning a substrate on the first electrode.

5. The method of claim 1 , wherein the process fluid is preheated prior to the introducing a process fluid to the process volume.

6. The method of claim 1 , wherein the applying the electric field to the substrate is performed for an amount of time between about 60 seconds and about 90 seconds.

7. A substrate processing method, comprising:
positioning a substrate on a first electrode within a process volume;
moving a second electrode to a process position adjacent the substrate;
introducing a process fluid to the process volume, wherein the moving the second electrode to the process position is performed prior to, during, or after the introducing the process fluid to the process volume;
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid; and
removing the process fluid from the process volume.

8. A substrate processing method, comprising:
positioning a substrate on a first electrode within a process volume;
moving a second electrode to a process position adjacent the substrate;
introducing a process fluid to the process volume;
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid;
removing the process fluid from the process volume;
removing the substrate from the process volume; and
positioning the substrate on a cooling pedestal.

9. A substrate processing method, comprising:
positioning a substrate on a first electrode within a process volume;
moving the first electrode to a process position adjacent a second electrode disposed in the process volume;
introducing a process fluid to the process volume between the substrate and the second electrode;
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid;
removing the process fluid from the process volume;
introducing a rinse fluid to the process volume;
rotating the substrate to remove the rinse fluid from the substrate; and
removing the rinse fluid from the process volume.

10. The method of claim 9 , wherein a purge gas is introduced to the process volume during the rotating the substrate or during the removing the rinse fluid from the process volume.

11. The method of claim 9 , wherein the first electrode is preheated prior to the positioning a substrate on the first electrode or preheated prior to the introducing a process fluid to the process volume.

12. A substrate processing method, comprising:
positioning a substrate on a first electrode within a process volume;
moving the first electrode to a process position adjacent a second electrode disposed in the process volume;
introducing a process fluid to the process volume between the substrate and the second electrode, wherein the moving the first electrode to the process position is performed prior to, during, or after the introducing the process fluid to the process volume; and
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid.

13. A substrate processing method, comprising:
positioning a substrate on a first electrode coupled to a chamber door;
rotating the chamber door to a process position in which a major axis of the substrate is oriented vertically;
delivering a process fluid to a process volume, wherein the process volume is at least partially defined by chamber sidewalls and a second electrode; and
generating an electric field between the first electrode and the second electrode and applying the electric field to the substrate via the process fluid.

14. The method of claim 13 , wherein the positioning a substrate on a first electrode comprises vacuum chucking the substrate to the first electrode.

15. The method of claim 13 , wherein the process fluid is delivered to the process volume via a fluid inlet formed in the chamber sidewalls.

16. The method of claim 13 , further comprising:
removing the process fluid from the process volume;
introducing a rinse fluid to the process volume;
rotating the substrate to remove the rinse fluid from the substrate; and
removing the rinse fluid from the process volume.

17. The method of claim 16 , wherein a purge gas is introduced to the process volume during the rotating the substrate or during the removing the rinse fluid from the process volume.

18. The method of claim 13 , wherein the first electrode is preheated prior to the positioning a substrate on the first electrode or preheated prior to the delivering a process fluid to the process volume.

Assignees

• Applied Materials Inc

Inventors

• Babayan Viachslav
• Buchberger Jr Douglas A
• Liang Qiwei
• Godet Ludovic
• Nemani Srinivas D
• Woodruff Daniel J
• Harris Randy
• Moore Robert B

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0432 Primary

  mainly by conduction · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/26

  Processing photosensitive materials; Apparatus therefor (G03F7/12 - G03F7/24 take precedence) · CPC title