Post exposure processing apparatus

US10401742B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10401742-B2
Application numberUS-201815947409-A
CountryUS
Kind codeB2
Filing dateApr 6, 2018
Priority dateDec 20, 2016
Publication dateSep 3, 2019
Grant dateSep 3, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform in a stacked arrangement and utilize a shared plumbing module. In another implementation, a plurality of post exposure process chamber and cool down/development chambers are positioned on a process platform in a linear arrangement and each of the chambers utilize an individually dedicated plumbing module.

First claim

Opening claim text (preview).

What is claimed is: 1. A platform apparatus, comprising: a factory interface; a plumbing module; and a process module disposed between the factory interface and the plumbing module, wherein the process module comprises: a central region having a robot disposed therein; and a plurality of process stations disposed about the central region and sharing the plumbing module, wherein each process station includes a process chamber and a post process chamber in a stacked arrangement, the process chamber and the post process chamber having ingress/egress openings disposed adjacent to and facing the central region, the process chamber further comprising: a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally. 2. The apparatus of claim 1 , wherein the process chamber is disposed on top of the post process chamber in each of the process stations. 3. The apparatus of claim 1 , wherein the post process chamber is disposed on top of the process chamber in each of the process stations. 4. The apparatus of claim 1 , further comprising: a door coupled to the chamber body; and a first electrode coupled to the door. 5. The apparatus of claim 4 , further comprising: a second electrode coupled to the chamber body. 6. The apparatus of claim 5 , further comprising: a first plurality of fluid ports formed in a sidewall of the chamber body adjacent to the process volume. 7. The apparatus of claim 6 , further comprising: a second plurality of fluid ports formed in the sidewall of the chamber body adjacent to the process volume opposite the first plurality of fluid ports. 8. The apparatus of claim 4 , wherein a vacuum source is in fluid communication with the first electrode. 9. The apparatus of claim 1 , wherein the chamber body is formed from polytetrafluoroethylene. 10. The apparatus of claim 1 , wherein the post process chamber further comprises: a chamber body defining a process volume; a rotatable pedestal disposed within the process volume; a fluid delivery arm configured to deliver cleaning fluid to the process volume; and a shield capable of being raised and lowered by a motor, the shield having an inner diameter greater than a diameter of the rotatable pedestal, wherein the shield is disposed radially outward of the rotatable pedestal. 11. A platform apparatus, comprising: a factory interface; a plumbing module; and a process module disposed between the factory interface and the plumbing module, wherein the process module comprises: a central region having a robot disposed therein, the robot comprising a plurality of end effectors, the end effectors moveable in three axes; and a plurality of process stations disposed about the central region and sharing the plumbing module, wherein each process station includes a process chamber and a post process chamber in a stacked arrangement, the process chamber and the post process chamber having ingress/egress openings disposed adjacent to and facing the central region, the process chamber further comprising: a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally. 12. The apparatus of claim 11 , wherein the process chamber further comprises: a moveable door coupled to the chamber body; a first electrode coupled to the door, the first electrode configured to support a substrate thereon; a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume; a first plurality of fluid ports formed in a sidewall of the chamber body adjacent the process volume; and a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports. 13. The apparatus of claim 11 , wherein the post process chamber further comprises: a chamber body defining a process volume; a rotatable pedestal disposed within the process volume; a fluid delivery arm configured to deliver cleaning fluid to the process volume; and a shield capable of being raised and lowered by a motor, the shield having an inner diameter greater than a diameter of the rotatable pedestal, wherein the shield is disposed radially outward of the rotatable pedestal. 14. A platform apparatus, comprising: a factory interface; an intermediate module disposed adjacent the factory interface, wherein a buffer station is disposed in the intermediate module; a support module disposed adjacent the intermediate module, the support module having a plurality of cleaning stations disposed therein; a process module disposed adjacent to the support module, the process module comprising: a plurality of process stations, wherein each process station includes a process chamber and a post process chamber in a stacked arrangement, the process chamber and the post process chamber having ingress/egress openings disposed adjacent to and facing a central region, the process chamber further comprising: a chamber body defining a process volume, wherein a major axis of the process volume is oriented vertically and a minor axis of the process volume is oriented horizontally; and a plumbing module shared by the plurality of process stations. 15. The apparatus of claim 14 , wherein the process chamber further comprises: a moveable door coupled to the chamber body; a first electrode coupled to the door, the first electrode configured to support a substrate thereon; a second electrode coupled to the chamber body, the second electrode at least partially defining the process volume; a first plurality of fluid ports formed in a sidewall of the chamber body adjacent the process volume; and a second plurality of fluid ports formed in the sidewall of the chamber body adjacent the process volume opposite the first plurality of fluid ports. 16. The apparatus of claim 14 , wherein the post process chamber further comprises: a chamber body defining a process volume; a rotatable pedestal disposed within the process volume; a fluid delivery arm configured to deliver cleaning fluid to the process volume; and a shield capable of being raised and lowered by a motor, the shield having an inner diameter greater than a diameter of the rotatable pedestal, wherein the shield is disposed radially outward of the rotatable pedestal. 17. The apparatus of claim 14 , wherein each of the cleaning stations of the support module has a dedicated plumbing module.

Assignees

Inventors

Classifications

  • Temperature monitoring · CPC title

  • characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

  • vertical arrangement · CPC title

  • surrounding a central transfer chamber · CPC title

  • Apparatus for sealing, encapsulating, glassing, decapsulating or the like · CPC title

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What does patent US10401742B2 cover?
Implementations described herein relate to apparatus for post exposure processing. More specifically, implementations described herein relate to field-guided post exposure process chambers and cool down/development chambers used on process platforms. In one implementation, a plurality of post exposure process chamber and cool/down development chamber pairs are positioned on a process platform i…
Who is the assignee on this patent?
Applied Materials Inc
What technology area does this patent fall under?
Primary CPC classification G03F7/38. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Sep 03 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).