Method and apparatus for post exposure processing of photoresist wafers

Patent metadata

Field	Value
Publication number	US-11112697-B2
Application number	US-201916272962-A
Country	US
Kind code	B2
Filing date	Feb 11, 2019
Priority date	Nov 30, 2015
Publication date	Sep 7, 2021
Grant date	Sep 7, 2021

Abstract

Embodiments described herein relate to methods and apparatus for performing immersion field guided post exposure bake processes. Embodiments of apparatus described herein include a chamber body defining a processing volume. A pedestal may be disposed within the processing volume and a first electrode may be coupled to the pedestal. A moveable stem may extend through the chamber body opposite the pedestal and a second electrode may be coupled to the moveable stem. In certain embodiments, a fluid containment ring may be coupled to the pedestal and a dielectric containment ring may be coupled to the second electrode.

First claim

What is claimed is:

1. A substrate processing apparatus, comprising:
a chamber body defining a process volume;
a pedestal disposed in the process volume;
a first electrode coupled to the pedestal;
a stem moveably disposed opposite the pedestal and extending through the chamber body;
a second electrode coupled to the stem;
a containment ring coupled to the second electrode;
a first conduit disposed in the second electrode and the containment ring; and
a second conduit disposed in the second electrode and the containment ring.

2. The apparatus of claim 1 , wherein the containment ring is form ed from a dielectric material.

3. The apparatus of claim 2 , wherein the dielectric material is a polymer material or a ceramic material.

4. The apparatus of claim 1 , wherein the first conduit extends through the second electrode and the containment ring to a first fluid outlet.

5. The apparatus of claim 4 , wherein the second conduit extends through the second electrode and the containment ring to a second fluid outlet.

6. The apparatus of claim 5 , wherein the first fluid outlet is disposed opposite the second fluid outlet.

7. The apparatus of claim 6 , wherein the first fluid outlet and the second fluid outlet are in fluid communication with the process volume.

8. The apparatus of claim 1 , wherein each of the first conduit and the second conduit extend from the second electrode through the stem.

9. The apparatus of claim 1 , further comprising:
a sealing member coupled to the containment ring opposite the second electrode.

10. The apparatus of claim 9 , wherein the sealing member comprises an elastomeric O-ring configured to contact either the first electrode or the pedestal.

Assignees

• Applied Materials Inc

Inventors

• Babayan Viachslav
• Buchberger Jr Douglas A
• Liang Qiwei
• Godet Ludovic
• Nemani Srinivas D
• Woodruff Daniel J
• Harris Randy
• Moore Robert B

Classifications

• H10P72/7618

  characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel · CPC title

• H10P72/0432 Primary

  mainly by conduction · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• G03F7/40

  Treatment after imagewise removal, e.g. baking · CPC title

• G03F7/38

  Treatment before imagewise removal, e.g. prebaking {(G03F7/265 takes precedence)} · CPC title