Methods and apparatus for common excitation of frequency generators
US-11749504-B2 · Sep 5, 2023 · US
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Leray Gary patents
Leray Gary is listed as an inventor on 20 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Leray Gary |
| Total patents | 20 |
| First publication | Feb 10, 2015 |
| Latest publication | Sep 5, 2023 |
Notable patents
Publications ranked by popularity score, then publication date.
Dual-level pulse tuning
US-11177115-B2 · Nov 16, 2021 · US
Dual-level pulse tuning
US-2020381214-A1 · Dec 3, 2020 · US
Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability
US-10825708-B2 · Nov 3, 2020 · US
Methods and apparatus for frequency generator and match network communication
US-10553400-B2 · Feb 4, 2020 · US
Methods and apparatus for frequency generator and match network communication
US-2019304753-A1 · Oct 3, 2019 · US
Methods and apparatus for common excitation of frequency generators
US-2019267213-A1 · Aug 29, 2019 · US
Process kit components for use with an extended and independent rf powered cathode substrate for extreme edge tunability
US-2019221463-A1 · Jul 18, 2019 · US
Enhanced plasma source for a plasma reactor
US-10290469-B2 · May 14, 2019 · US
Dynamic control band for RF plasma current ratio control
US-9839109-B1 · Dec 5, 2017 · US
Recent patents
Latest publications not already listed above.
Dynamic control band for rf plasma current ratio control
US-2017347441-A1 · Nov 30, 2017 · US
Frequency tuning for dual level radio frequency (RF) pulsing
US-9595423-B2 · Mar 14, 2017 · US
Self-bias calculation on a substrate in a process chamber with bias power for single or multiple frequencies
US-9406540-B2 · Aug 2, 2016 · US
Frequency tuning for dual level radio frequency (rf) pulsing
US-2016196958-A1 · Jul 7, 2016 · US
Frequency tuning for dual level radio frequency (RF) pulsing
US-9318304-B2 · Apr 19, 2016 · US
Measurement of plural RF sensor devices in a pulsed RF plasma reactor
US-9190247-B2 · Nov 17, 2015 · US
Electron beam plasma source with arrayed plasma sources for uniform plasma generation
US-9129777-B2 · Sep 8, 2015 · US
Frequency tuning for dual level radio frequency (rf) pulsing
US-2015130354-A1 · May 14, 2015 · US
Extended and independent RF powered cathode substrate for extreme edge tunability
US-8988848-B2 · Mar 24, 2015 · US
Electron beam plasma source with segmented beam dump for uniform plasma generation
US-8951384-B2 · Feb 10, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 20 |
| Dorf Leonid | 2 |
| Rauf Shahid | 2 |
| Collins Kenneth S | 2 |
| Misra Nipun | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32183 | 10 |
| H01J37/32082 | 7 |
| H01J37/32155 | 6 |
| H01J37/32165 | 6 |
| H01J37/32146 | 5 |