Methods and apparatus for frequency generator and match network communication

Patent metadata

Field	Value
Publication number	US-10553400-B2
Application number	US-201815941151-A
Country	US
Kind code	B2
Filing date	Mar 30, 2018
Priority date	Mar 30, 2018
Publication date	Feb 4, 2020
Grant date	Feb 4, 2020

Abstract

Methods and apparatus for providing RF power to a semiconductor process chamber including generating an analog radio frequency (RF) power waveform with a frequency generator for transmission to a match network over a first connection, determining information associated with characteristics of the RF power waveform with the frequency generator and transmitting the information to the match network over a second connection, and adjusting the match network to the RF power waveform based, at least partially, on the information associated with characteristics of the RF power waveform from the second connection.

First claim

The invention claimed is:

1. A method for providing RF power to a semiconductor process chamber, comprising:
generating an analog radio frequency (RF) power waveform with a frequency generator for transmission to a match network over a first connection;
determining information associated with characteristics of the RF power waveform with the frequency generator and transmitting the information to the match network over a second connection; and
adjusting the match network to the RF power waveform based, at least partially, on the information associated with characteristics of the RF power waveform from the second connection.

2. The method of claim 1 , further comprising:
forming a synchronization waveform based, at least partially, on the RF power waveform with the frequency generator and transmitting the synchronization waveform to the match network;
determining at least one difference between the RF power waveform and the synchronization waveform with the frequency generator and transmitting the at least one difference to the match network; and
recreating at least a portion of the RF power waveform based, at least partially, on the at least one difference between the RF power waveform and the synchronization waveform within the match network.

3. The method of claim 2 , further comprising:
transmitting the at least one difference from the frequency generator to the match network over the second connection or transmitting the at least one difference from the frequency generator to the match network over a third connection.

4. The method of claim 2 , further comprising:
forming a synchronization waveform with a first sync level based on a first RF power level of the RF power waveform and a second sync level based on a second RF power level with the frequency generator and transmitting the synchronization waveform to the match network;
determining at least one characteristic of a third RF power level from the RF power waveform with the frequency generator and transmitting the at least one characteristic of the third RF power level from the frequency generator to the match network; and
recreating the third RF power level of the RF power waveform based, at least partially, on the at least one characteristic of a third RF power level and the synchronization waveform in the match network.

5. The method of claim 4 , further comprising:
transmitting the synchronization waveform from the frequency generator to the match network over a fourth connection; and
transmitting the at least one characteristic of the third RF power level from the frequency generator to the match network over the second connection or over a third connection.

6. A method for providing RF power to a semiconductor process chamber, comprising:
generating, by a frequency generator, an analog radio frequency (RF) power waveform for transmission to a match network over a first connection; and
determining, by the frequency generator, information associated with characteristics of the RF power waveform for transmitting to the match network over a second connection.

7. The method of claim 6 , further comprising:
forming, by a frequency generator, a synchronization waveform based, at least partially, on the RF power waveform; and
determining, by the frequency generator, at least one difference between the RF power waveform and the synchronization waveform for transmitting to the match network.

8. The method of claim 7 , further comprising:
transmitting, by the frequency generator, the at least one difference to the match network over the second connection or transmitting the at least one difference to the match network over a third connection.

9. The method of claim 7 , further comprising:
forming, by the frequency generator, a synchronization waveform with a first sync level based on a first RF power level of the RF power waveform and a second sync level based on a second RF power level; and
determining, by the frequency generator, at least one characteristic of a third RF power level from the RF power waveform for transmitting to the match network.

10. The method of claim 9 , further comprising:
transmitting, by the frequency generator, the synchronization waveform to the match network over a fourth connection; and
transmitting, by the frequency generator, the at least one characteristic of the third RF power level to the match network over the second connection or over a third connection.

11. The method of claim 7 , further comprising:
determining, by the frequency generator, a timing delay between arrival of the synchronization waveform and arrival of the RF power waveform for transmitting to the match network.

12. The method of claim 11 , wherein the timing delay includes, at least, a propagation delay of the RF power waveform from the frequency generator to the match network.

13. A method for providing RF power to a semiconductor process chamber, comprising:
receiving, by a match network, information associated with characteristics of an analog radio frequency (RF) power waveform over a first connection;
receiving, by the match network, the analog radio frequency (RF) power waveform transmitted by a frequency generator over a second connection; and
adjusting the match network to the RF power waveform based, at least partially, on the information associated with characteristics of the RF power waveform.

14. The method of claim 13 , further comprising:
adjusting the match network by tuning the impedance of the match network based, at least partially, on the information associated with characteristics of the RF power waveform.

15. The method of claim 13 , further comprising:
receiving, prior to the RF power waveform by the match network, a synchronization waveform based, at least partially, on the RF power waveform;
receiving, by the match network, at least one difference between the RF power waveform and the synchronization waveform; and
recreating, by the match network, at least a portion of the RF power waveform based, at least partially, on the at least one difference between the RF power waveform and the synchronization waveform.

16. The method of claim 15 , further comprising:
receiving, by the match network, the at least one difference from the frequency generator over the first connection or receiving the at least one difference from the frequency generator over a third connection.

17. The method of claim 15 , further comprising:
receiving, by the match network, a synchronization waveform with a first sync level based on a first RF power level of the RF power waveform and a second sync level based on a second RF power level;
receiving, by the match network, at least one characteristic of a third RF power level from the RF power waveform; and
adjusting the match network based on the at least one characteristic of the third RF power level to the match network.

18. The method of claim 17 , further comprising:
receiving, by the match network, the synchronization waveform from the frequency generator over a fourth connection; and
receiving, by the match network, the at least one characteristic of the third RF power level from the frequency generator over the second connection or over a third connection.

19. The method of claim 15 , further comprising:
receiving, by the match network, a timing delay between arrival of the synchronization waveform and arrival of the RF power waveform; and
adjusting the match network based on the timing delay.

20. The method of claim 19 , wherein the timing delay in

Assignees

• Applied Materials Inc

Inventors

• Leray Gary

Classifications

• H10P72/0421

  for drying etching · CPC title

• H01J37/32128 Primary

  using particular waveforms, e.g. polarised waves · CPC title

• H02J50/20

  using microwaves or radio frequency waves · CPC title

• H03K5/24

  the characteristic being amplitude · CPC title

• H01J2237/334

  Etching · CPC title