Extended and independent RF powered cathode substrate for extreme edge tunability

Patent metadata

Field	Value
Publication number	US-8988848-B2
Application number	US-201213651351-A
Country	US
Kind code	B2
Filing date	Oct 12, 2012
Priority date	Dec 15, 2011
Publication date	Mar 24, 2015
Grant date	Mar 24, 2015

Abstract

Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.

First claim

The invention claimed is:

1. A substrate support, comprising:
a first electrode disposed within the substrate support and having a peripheral edge and a first surface;
a substrate support surface disposed above the first surface of the first electrode; and
a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode, wherein the second electrode further comprises a base disposed on the first electrode, and a radially extending portion disposed atop the base and extending beyond the peripheral edge of the first electrode.

2. The substrate support of claim 1 , wherein the first and second electrodes are a single integrated electrode.

3. The substrate support of claim 1 , further comprising:
a dielectric layer disposed to between the first electrode and the second electrode.

4. The substrate support of claim 1 , further comprising one of:
a first power supply coupled to the first and second electrodes to provide RF energy to the first and second electrodes; or
a first power supply coupled to the first electrode to provide RF energy to the first electrode, and a second power supply coupled to the second electrode to provide RF energy to the second electrode.

5. The substrate support of claim 1 , further comprising:
an electrostatic chuck disposed above the first electrode, wherein an upper surface of the electrostatic chuck comprises the substrate support surface.

6. The substrate support of claim 1 , wherein the base and the radially extending portion are a single integrated electrode.

7. The substrate support of claim 1 , further comprising:
a first dielectric layer disposed about the peripheral edge of the first RF electrode; and
a grounding layer disposed about the first dielectric layer, wherein the radially extending portion of the second RF electrode is at least partially disposed above the first dielectric layer.

8. The substrate support of claim 7 , further comprising:
an edge ring disposed above and adjacent to the radially extending portion of the second electrode such that the edge ring is disposed between the extending portion of the second electrode and the RF grounding layer.

9. The substrate support of claim 1 , wherein the first electrode further comprises:
a body formed of a conductive material and having a plurality of channels disposed through the body.

10. The substrate support of claim 9 , further comprising:
a heat transfer medium source coupled to the plurality of channels to provide a heat transfer medium to the plurality of channels.

11. A substrate support, comprising:
a first electrode having a peripheral edge;
a substrate support surface disposed above the first electrode;
a second electrode disposed about the first electrode and extending radially beyond the peripheral edge of the first electrode;
a first dielectric layer disposed about the peripheral edge of the first electrode; and
a grounding layer disposed about the first dielectric layer, wherein the second electrode is at least partially disposed above the first dielectric layer.

12. The substrate support of claim 11 , further comprising:
an edge ring disposed above and adjacent to the second electrode such that the edge ring is disposed between the second electrode and the RF grounding layer.

13. The substrate support of claim 11 , wherein the first and second electrodes are a single integrated electrode.

14. The substrate support of claim 11 , further comprising:
a dielectric layer disposed between the first electrode and the second electrode.

15. The substrate support of claim 11 , further comprising one of:
a first power supply coupled to the first and second electrodes to provide RF energy to the first and second electrodes; or
a first power supply coupled to the first electrode to provide RF energy to the first electrode, and a second power supply coupled to the second electrode to provide RF energy to the second electrode.

16. The substrate support of claim 11 , further comprising:
an electrostatic chuck disposed above the first electrode, wherein an upper surface of the electrostatic chuck comprises the substrate support surface.

Assignees

• Applied Materials Inc

Inventors

• Todorow Valentin
• Banna Samer
• Yousif Imad
• Wang Albert
• Leray Gary

Classifications

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• Y10T279/23

  with magnetic or electrostatic means · CPC title

• H01J37/32715

  Workpiece holder · CPC title

• H01J37/32642 Primary

  Focus rings · CPC title