Process kit components for use with an extended and independent RF powered cathode substrate for extreme edge tunability

Patent metadata

Field	Value
Publication number	US-10825708-B2
Application number	US-201213651354-A
Country	US
Kind code	B2
Filing date	Oct 12, 2012
Priority date	Dec 15, 2011
Publication date	Nov 3, 2020
Grant date	Nov 3, 2020

Abstract

Process kit components for use with a substrate support of a process chamber are provided herein. In some embodiments, a process kit ring may include a ring shaped body having an outer edge, an inner edge, a top surface and a bottom, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a height of about 0.116 to about 0.118 inches; and a plurality of protrusions disposed on the top surface of the ring shaped body, each of the plurality of protrusions disposed symmetrically about the ring shaped body.

First claim

The invention claimed is:

1. A process kit ring for use with a substrate support of a process chamber, comprising:
a ring shaped body having an outer edge, an inner edge, a top surface and a bottom forming a rectangular cross section, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a thickness of about 0.116 to about 0.118 inches; and
a plurality of protrusions disposed on the top surface of the ring shaped body and configured to support an edge ring atop of the plurality of protrusions, each of the plurality of protrusions disposed symmetrically about the ring shaped body, wherein each of the plurality of protrusions has a height of about 0.049 inches to about 0.059 inches above the top surface of the ring shaped body.

2. The process kit ring of claim 1 , wherein the plurality of protrusions consist of three protrusions, and wherein the three protrusions are disposed about 120 degrees from one another about the ring shaped body.

3. The process kit ring of claim 1 , wherein each of the plurality of protrusions comprises a sloped side, wherein the sloped side is angled about 9 degrees to about 11 degrees from an axis that is perpendicular to the top surface of the ring shaped body.

4. The process kit ring of claim 1 , wherein the ring is fabricated from silicon carbide (SiC).

5. The process kit ring of claim 1 , wherein the inner edge comprises a flat portion extending from the top surface to the bottom and disposed proximate one of the plurality of protrusions, the flat portion having a length of about 1.310 inches to about 1.320 inches.

6. The process kit ring of claim 1 , wherein a distance between a center of the ring shaped body and an outer edge of each of the plurality of protrusions is about 6.995 inches to about 6.105 inches, and wherein a distance between the center of the ring shaped body and an inner edge of each of the plurality of protrusions is about 5.937 inches to about 5.947.

7. A process kit ring for use with a substrate support of a process chamber, comprising:
a ring shaped body having an outer edge, an inner edge, a top surface and a bottom forming a rectangular cross section, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a thickness of about 0.116 to about 0.118 inches; and
three protrusions disposed about 120 degrees from one another on the top surface of the ring shaped body and configured to support an edge ring atop of the three protrusions, each of the three protrusions disposed symmetrically about the ring shaped body, wherein each of the three protrusions has a height of about 0.049 inches to about 0.059 inches above the top surface of the ring shaped body.

8. The process kit ring of claim 7 , wherein each of the three protrusions comprises a sloped side, wherein the sloped side is angled about 9 degrees to about 11 degrees from an axis that is perpendicular to the top surface of the ring shaped body.

9. The process kit ring of claim 7 , wherein the ring is fabricated from silicon carbide (SiC).

10. The process kit ring of claim 7 , wherein the inner edge comprises a flat portion extending from the top surface to the bottom and disposed proximate one of the three protrusions, the flat portion having a length of about 1.310 inches to about 1.320 inches.

11. The process kit ring of claim 7 , wherein a distance between a center of the ring shaped body and an outer edge of each of the three protrusions is about 6.995 inches to about 6.105 inches, and wherein a distance between the center of the ring shaped body and an inner edge of each of the three protrusions is about 5.937 inches to about 5.947.

12. A process kit ring for use with a substrate support of a process chamber, comprising:
a ring shaped body having an outer edge, an inner edge, a top surface and a bottom forming a rectangular cross section, wherein the outer edge has a diameter of about 12.473 inches to about 12.479 inches and the inner edge has a diameter of about 11.726 inches to about 11.728 inches, and wherein the ring shaped body has a thickness of about 0.116 to about 0.118 inches; and
a plurality of protrusions disposed on the top surface of the ring shaped body and configured to support an edge ring atop of the plurality of protrusions, each of the plurality of protrusions disposed symmetrically about the ring shaped body, wherein each of the plurality of protrusions has a height of about 0.049 inches to about 0.059 inches above the top surface of the ring shaped body,
wherein a distance between a center of the ring shaped body and an outer edge of each of the plurality of protrusions is about 6.995 inches to about 6.105 inches, and wherein a distance between the center of the ring shaped body and an inner edge of each of the plurality of protrusions is about 5.937 inches to about 5.947.

13. The process kit ring of claim 12 , wherein the plurality of protrusions consist of three protrusions, and wherein the three protrusions are disposed about 120 degrees from one another about the ring shaped body.

14. The process kit ring of claim 12 , wherein each of the plurality of protrusions comprises a sloped side, wherein the sloped side is angled about 9 degrees to about 11 degrees from an axis that is perpendicular to the top surface of the ring shaped body.

15. The process kit ring of claim 12 , wherein the ring is fabricated from silicon carbide (SiC).

16. The process kit ring of claim 12 , wherein the inner edge comprises a flat portion extending from the top surface to the bottom and disposed proximate one of the plurality of protrusions, the flat portion having a length of about 1.310 inches to about 1.320 inches.

Assignees

• Applied Materials Inc

Inventors

• Todorow Valentin
• Banna Samer
• Yousif Imad
• Wang Albert
• Leray Gary

Classifications

• H10P72/72

  using electrostatic chucks · CPC title

• H10P72/722 Primary

  Details of electrostatic chucks · CPC title

• H01J37/32642 Primary

  Focus rings · CPC title

• H01J37/32715

  Workpiece holder · CPC title

• Y10T279/23

  with magnetic or electrostatic means · CPC title