Formation of trench silicide source or drain contacts without gate damage
US-12417944-B2 · Sep 16, 2025 · US
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Greene Andrew patents
Greene Andrew is listed as an inventor on 57 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Greene Andrew |
| Total patents | 57 |
| First publication | Jun 28, 2018 |
| Latest publication | Sep 16, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Wrap around contact process margin improvement with early contact cut
US-12100744-B2 · Sep 24, 2024 · US
Metal cut patterning and etching to minimize interlayer dielectric layer loss
US-11990342-B2 · May 21, 2024 · US
Systems and methods for data replication synchronization
US-2024095259-A1 · Mar 21, 2024 · US
Methods and systems for configuring automatic media playback settings
US-11914853-B2 · Feb 27, 2024 · US
Transistor having wrap-around source/drain contacts and under-contact spacers
US-11876136-B2 · Jan 16, 2024 · US
Systems and methods for data replication synchronization
US-11829383-B2 · Nov 28, 2023 · US
Source and drain contact cut last process to enable wrap-around-contact
US-11757012-B2 · Sep 12, 2023 · US
Protective bilayer inner spacer for nanosheet devices
US-11695057-B2 · Jul 4, 2023 · US
Formation of trench silicide source or drain contacts without gate damage
US-2022375788-A1 · Nov 24, 2022 · US
Recent patents
Latest publications not already listed above.
Formation of trench silicide source or drain contacts without gate damage
US-11443982-B2 · Sep 13, 2022 · US
Transistor having wrap-around source/drain contacts and under-contact spacers
US-2022157985-A1 · May 19, 2022 · US
Wrap around contact process margin improvement with early contact cut
US-2022123116-A1 · Apr 21, 2022 · US
Single metallization scheme for gate, source, and drain contact integration
US-11309221-B2 · Apr 19, 2022 · US
Transistor having wrap-around source/drain contacts and under-contact spacers
US-11296226-B2 · Apr 5, 2022 · US
Enhanced bottom dielectric isolation in gate-all-around devices
US-11282961-B2 · Mar 22, 2022 · US
Systems and methods for data replication synchronization
US-2022058209-A1 · Feb 24, 2022 · US
Wrap around contact process margin improvement with early contact cut
US-11227923-B2 · Jan 18, 2022 · US
Metal cut patterning and etching to minimize interlayer dielectric layer loss
US-2022005698-A1 · Jan 6, 2022 · US
Systems and methods for data replication synchronization
US-11163795-B2 · Nov 2, 2021 · US
Protective bilayer inner spacer for nanosheet devices
US-2021305410-A1 · Sep 30, 2021 · US
Enhanced bottom dielectric isolation in gate-all-around devices
US-2021305420-A1 · Sep 30, 2021 · US
Metal cut patterning and etching to minimize interlayer dielectric layer loss
US-11133189-B2 · Sep 28, 2021 · US
Wrap around contact process margin improvement with early contact cut
US-2021265470-A1 · Aug 26, 2021 · US
Protective bilayer inner spacer for nanosheet devices
US-11081568-B2 · Aug 3, 2021 · US
Methods and systems for configuring automatic media playback settings
US-2021216198-A1 · Jul 15, 2021 · US
Contact interlayer dielectric replacement with improved SAC cap retention
US-11024536-B2 · Jun 1, 2021 · US
Method and structure of metal cut
US-11011417-B2 · May 18, 2021 · US
Transistor having wrap-around source/drain contacts and under-contact spacers
US-2021119031-A1 · Apr 22, 2021 · US
Single metallization scheme for gate, source, and drain contact integration
US-10985076-B2 · Apr 20, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| IBM | 46 |
| Palantir Technologies Inc | 7 |
| Spotify Ab | 3 |
| Chase Adam | 1 |
| Greene Andrew | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10D64/017 | 35 |
| H10D84/038 | 31 |
| H10D30/024 | 22 |
| H10W20/069 | 21 |
| H10D30/62 | 20 |