Pyrochlore component for plasma processing chamber
US-2026088260-A1 · Mar 26, 2026 · US
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Daugherty John patents
Daugherty John is listed as an inventor on 78 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Daugherty John |
| Total patents | 78 |
| First publication | Feb 3, 2015 |
| Latest publication | Mar 26, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Conditioning chamber component
US-12544809-B2 · Feb 10, 2026 · US
Refractory components for a semiconductor processing chamber
US-2025372351-A1 · Dec 4, 2025 · US
Chucking system with silane coupling agent
US-2025357171-A1 · Nov 20, 2025 · US
Method and apparatus for measuring particles
US-2025208022-A1 · Jun 26, 2025 · US
Spark plasma sintered component for cryo-plasma processing
US-2025191893-A1 · Jun 12, 2025 · US
Yttria coating for plasma processing chamber components
US-2025140528-A1 · May 1, 2025 · US
Method and apparatus for measuring particles
US-12270748-B2 · Apr 8, 2025 · US
Single crystal metal oxide plasma chamber component
US-12249490-B2 · Mar 11, 2025 · US
Laminated aerosol deposition coating for aluminum components for plasma processing chambers
US-12198902-B2 · Jan 14, 2025 · US
Recent patents
Latest publications not already listed above.
Conditioning chamber component
US-2024383017-A1 · Nov 21, 2024 · US
Method for conditioning semiconductor processing chamber components
US-12129569-B2 · Oct 29, 2024 · US
Chamber component cleanliness measurement system
US-12072318-B2 · Aug 27, 2024 · US
Conditioning chamber component
US-12064795-B2 · Aug 20, 2024 · US
Wafer transport assembly with integrated buffers
US-11764086-B2 · Sep 19, 2023 · US
Sealing surfaces of components used in plasma etching tools using atomic layer deposition
US-2023215703-A1 · Jul 6, 2023 · US
Yttrium aluminum coating for plasma processing chamber components
US-2023088848-A1 · Mar 23, 2023 · US
Method for conditioning semiconductor processing chamber components
US-2023092570-A1 · Mar 23, 2023 · US
Low temperature sintered coatings for plasma chambers
US-2023020387-A1 · Jan 19, 2023 · US
Single crystal metal oxide plasma chamber component
US-2022392753-A1 · Dec 8, 2022 · US
Wafer transport assembly with integrated buffers
US-2022344183-A1 · Oct 27, 2022 · US
Chamber component cleanliness measurement system
US-2022252548-A1 · Aug 11, 2022 · US
Sealant coating for plasma processing chamber components
US-2022246404-A1 · Aug 4, 2022 · US
Surface coating treatment
US-2022186354-A1 · Jun 16, 2022 · US
Laminated aerosol deposition coating for aluminum components for plasma processing chambers
US-2022115214-A1 · Apr 14, 2022 · US
Method and apparatus for measuring particles
US-2021341377-A1 · Nov 4, 2021 · US
Method to selectively pattern a surface for plasma resistant coat applications
US-11124659-B2 · Sep 21, 2021 · US
Systems for removing and replacing consumable parts from a semiconductor process module in situ
US-11112773-B2 · Sep 7, 2021 · US
Conditioning chamber component
US-2021205858-A1 · Jul 8, 2021 · US
Conditioning chamber component
US-10967407-B2 · Apr 6, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 76 |
| Shih Hong | 4 |
| Daugherty John | 4 |
| Avoyan Armen | 3 |
| Google Llc | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32477 | 20 |
| H10P72/0462 | 17 |
| H01J37/32495 | 16 |
| H01J37/3244 | 16 |
| H10P72/0402 | 15 |