Gas nozzle, manufacturing method of gas nozzle, and plasma treatment device
US-2022020563-A1 · Jan 20, 2022 · US
Single crystal metal oxide plasma chamber component
US12249490B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12249490-B2 |
| Application number | US-202017770147-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 21, 2020 |
| Priority date | Nov 5, 2019 |
| Publication date | Mar 11, 2025 |
| Grant date | Mar 11, 2025 |
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Abstract
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A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a plasma processing chamber.
First claim
Opening claim text (preview).
What is claimed is: 1. A component of a plasma processing chamber, wherein at least one plasma facing surface of the component comprises single crystal metal oxide material, wherein the single crystal metal oxide material is single crystal spinel. 2. The component of claim 1 , wherein the at the least one plasma facing surface of the component is machined from a single crystal metal oxide ingot. 3. The component of claim 1 , wherein the at least one plasma facing surface comprises a layer of the single crystal metal oxide material bonded to a body of the component. 4. The component of claim 1 , wherein the component is a gas injector, wherein the nose of the gas injector comprises the single crystal metal oxide material, wherein the nose is a portion of the gas injector that is exposed to plasma in the plasma processing chamber. 5. A component of a plasma processing chamber, wherein at least one plasma facing surface of the component comprises single crystal metal oxide material, wherein the component is a gas injector, wherein the nose of the gas injector comprises the single crystal metal oxide material, wherein the nose is a portion of the gas injector that is exposed to plasma in the plasma processing chamber, and wherein the nose is diffusion bonded to a body of the component, wherein the body is formed of a material that is different from the single crystal metal oxide material. 6. The component of claim 5 , wherein the body is formed of a polycrystalline material. 7. A gas injector of a plasma processing chamber, comprising: a body; and at least one plasma facing surface comprising a single crystal metal oxide material, wherein the single crystal metal oxide material is single crystal spinel. 8. The gas injector of claim 7 , wherein the gas injector is machined from a single crystal metal oxide ingot. 9. A gas injector of a plasma processing chamber, comprising: a body; and at least one plasma facing surface comprising a single crystal metal oxide material, wherein the gas injector is machined from a single crystal metal oxide ingot and wherein the single crystal metal oxide ingot is annealed before being machined. 10. The gas injector of claim 9 , wherein the single crystal metal oxide material is single crystal YAG. 11. The gas injector of claim 9 , further comprising a central passage machined through the body and a plurality of smaller passages machined through the body, wherein the plurality of smaller passages surround the central passage and wherein each of the plurality of smaller passages feeds into a side gas injector hole and each of the plurality of smaller passages has a portion that is oriented at an angle within the gas injector to feed into the side gas injector hole.
Assignees
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Classifications
- H01J37/3244Primary
Gas supply means · CPC title
- H01J37/32467Primary
Material · CPC title
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Frequently asked questions
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- What does patent US12249490B2 cover?
- A component of a plasma processing chamber having at least one plasma facing surface of the component comprises single crystal metal oxide material. The component can be machined from a single crystal metal oxide ingot. Suitable single crystal metal oxides include spinel, yttrium oxide, and yttrium aluminum garnet (YAG). A single crystal metal oxide can be machined to form a gas injector of a p…
- Who is the assignee on this patent?
- Lam Res Corp
- What technology area does this patent fall under?
- Primary CPC classification H01J37/3244. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Mar 11 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 7 related publications on this page (citations in our corpus or others sharing the same primary CPC).