Multi-layer plasma erosion protection for chamber components
US-2018330923-A1 · Nov 15, 2018 · US
Laminated aerosol deposition coating for aluminum components for plasma processing chambers
US12198902B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-12198902-B2 |
| Application number | US-202017432003-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 3, 2020 |
| Priority date | Mar 5, 2019 |
| Publication date | Jan 14, 2025 |
| Grant date | Jan 14, 2025 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
An apparatus adapted for use in a plasma processing chamber is provided. An aluminum body with at least one surface is provided. An aluminum oxide containing aerosol deposition coating is disposed over the at least one surface of the aluminum body. An yttrium containing aerosol deposition coating is disposed over the aluminum oxide containing aerosol deposition coating.
First claim
Opening claim text (preview).
What is claimed is: 1. An apparatus adapted for use in a plasma processing chamber, the apparatus comprising: an aluminum body with at least one surface; an Al 2 O 3 aerosol deposition coating disposed over the at least one surface of the aluminum body to form an aluminum oxide coating; and an yttrium containing aerosol deposition coating comprising yttrium aluminum oxide disposed over the Al 2 O 3 aerosol deposition coating. 2. The apparatus, as recited in claim 1 , wherein the yttrium containing aerosol deposition coating has a thickness in a range of 1 to 20 microns. 3. The apparatus, as recited in claim 2 , wherein the Al 2 O 3 aerosol deposition coating has a thickness in a range of 1 to 20 microns. 4. The apparatus, as recited in claim 1 , wherein the apparatus is at least one of a confinement ring, an edge ring, a pinnacle, an electrostatic chuck, an electrode, a ground ring, a chamber liner, and a door liner. 5. The apparatus, as recited in claim 1 , wherein the at least one surface of the aluminum body has a surface roughness of no more than 16 Ra (microinches). 6. The apparatus, as recited in claim 1 , wherein the aluminum body is at least 95% pure aluminum by weight. 7. The apparatus, as recited in claim 1 , wherein the Al 2 O 3 aerosol deposition coating functions as an anchoring layer to provide adhesion for the yttrium containing aerosol deposition coating. 8. The apparatus, as recited in claim 1 , wherein the Al 2 O 3 aerosol deposition coating functions as a diffusion barrier protecting against wet chemistries.
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Classifications
characterised by a coating, a hardness or a material · CPC title
Protection means, e.g. coatings · CPC title
Impact or kinetic deposition of particles · CPC title
including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides · CPC title
only coatings of inorganic non-metallic material · CPC title
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- What does patent US12198902B2 cover?
- An apparatus adapted for use in a plasma processing chamber is provided. An aluminum body with at least one surface is provided. An aluminum oxide containing aerosol deposition coating is disposed over the at least one surface of the aluminum body. An yttrium containing aerosol deposition coating is disposed over the aluminum oxide containing aerosol deposition coating.
- Who is the assignee on this patent?
- Lam Res Corp
- What technology area does this patent fall under?
- Primary CPC classification H01J37/32495. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 14 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).