Method and apparatus for measuring particles

Patent metadata

Field	Value
Publication number	US-12270748-B2
Application number	US-201917273264-A
Country	US
Kind code	B2
Filing date	Sep 5, 2019
Priority date	Sep 12, 2018
Publication date	Apr 8, 2025
Grant date	Apr 8, 2025

Abstract

An apparatus for measuring contamination on a critical surface of a part is provided. A vessel for mounting the part is provided. An inert gas source is in fluid connection with the vessel and adapted to provide an inert gas to the vessel. At least one diffuser receives the inert gas from the vessel, wherein the critical surface of the part is exposed to the inert gas when the part is mounted in the vessel. At least one analyzer is adapted to receive inert gas from the at least one diffuser and measures contaminants in the inert gas.

First claim

What is claimed is:

1. An apparatus for measuring contamination on critical surfaces of a part for use in a processing chamber, wherein the part has critical surfaces, wherein the critical surfaces of the part are surfaces exposed to a plasma or process gas in the processing chamber, wherein the part is a gas injector, wherein the gas injector has a plurality of gas injection passages, comprising:
a vessel for mounting the part, wherein when the part is mounted in the vessel, the vessel only contacts the part outside of the critical surfaces, wherein the vessel is adapted to flow the inert gas past 90% to 100% of the critical surfaces of the part at one time, wherein the inert gas is flowed past all surfaces of the plurality of gas injection passages, wherein the inert gas is flowed past all surfaces of the plurality of gas injection passages at one time;
an inert gas source in fluid connection with the vessel and adapted to provide an inert gas to the vessel, wherein the critical surfaces of the part are exposed to the inert gas when the part is mounted in the vessel;
at least one seal to create a seal around the critical surfaces, wherein none of the at least one seal contacts the critical surfaces, wherein the critical surfaces of the part are surfaces exposed to a plasma or process gas in the processing chamber;
at least one diffuser for receiving the inert gas from the vessel; and
at least one analyzer adapted to receive the inert gas from the at least one diffuser and measure contaminants in the inert gas.

2. The apparatus, as recited in claim 1 , further comprising a gas conditioning system in fluid connection between the inert gas source and the vessel, wherein the gas conditioning system filters the inert gas from the inert gas source.

3. The apparatus, as recited in claim 2 , wherein the gas conditioning system comprises:
a flow controller that controls at least one of a flow rate and a pressure of the inert gas;
a plurality of valves; and
a plurality of filters, wherein each of the plurality of valves is adjacent to and upstream from a corresponding one of the plurality of filters.

4. The apparatus, as recited in claim 3 , wherein the gas conditioning system is adapted to provide a flow rate of at least 10 standard liters per minute.

5. The apparatus, as recited in claim 1 , wherein there are no valves located between the vessel and the at least one analyzer.

6. The apparatus, as recited in claim 1 , further comprising a three-way ball valve adapted to allow a flow of the inert gas past all surfaces of the plurality of gas injection passages to simulate a gas flow through the plurality of gas injection passages during operational use.

7. The apparatus, as recited in claim 1 , wherein the vessel is adapted to flow the inert gas through the plurality of gas injection passages, so that a ratio of flow velocity of the inert gas between any two gas injection passages of the plurality of gas injection passages is between 3:2 and 2:3.

8. The apparatus, as recited in claim 1 , wherein the part is a gas weldment, gas showerhead, electrostatic chuck, or manifold.

9. The apparatus, as recited in claim 1 , wherein the at least one diffuser comprises a plurality of diffusers coupled sequentially.

10. The apparatus, as recited in claim 1 , wherein the at least one diffuser comprises a plurality of diffusers coupled in parallel, wherein at least one diffuser of the plurality of diffusers vents at least some inert gas.

11. The apparatus, as recited in claim 1 , wherein the at least one seal comprises at least one O-ring, wherein none of the at least one O-ring contacts the critical surfaces.

12. The apparatus, as recited in claim 1 , wherein the diffuser vents most of the gas directly to the exhaust.

13. An apparatus for measuring contamination on critical surfaces of a part for use in a processing chamber, wherein the part has critical surfaces, wherein the critical surfaces of the part are surfaces exposed to a plasma or process gas in the processing chamber, wherein the part is a gas injector, wherein the gas injector has a plurality of gas injection passages, comprising:
a vessel for mounting the part, wherein when the part is mounted in the vessel, the vessel only contacts the part outside of the critical surfaces, wherein the vessel is adapted to flow the inert gas past 90% to 100% of the critical surfaces of the part at one time, wherein the inert gas is flowed past all surfaces of the plurality of gas injection passages, wherein the vessel comprises cap and body;
an inert gas source in fluid connection with the vessel and adapted to provide an inert gas to the vessel, wherein the critical surfaces of the part are exposed to the inert gas when the part is mounted in the vessel;
at least one seal to create a seal around the critical surfaces, wherein none of the at least one seal contacts the critical surfaces, wherein the critical surfaces of the part are surfaces exposed to a plasma or process gas in the processing chamber wherein the at least one seal comprises at least a first O-ring that separates the cap from the gas injector and seals the gas injection passages and at least a second O-ring that separates the body from the gas injector and seals the gas injection passages and wherein the first O-ring and the second O-ring do not contact critical surfaces;
at least one diffuser for receiving the inert gas from the vessel; and
at least one analyzer adapted to receive the inert gas from the at least one diffuser and measure contaminants in the inert gas.

Assignees

• Lam Res Corp

Inventors

• Yasseri Amir A
• Hundi Girish M
• Kerns John Michael
• Outka Duane
• Daugherty John
• La Croix Cliff

Classifications

• G01N2015/1486

  Counting the particles · CPC title

• G01N1/2205

  with filters · CPC title

• G01N15/075

  by optical means · CPC title

• G01N1/02

  Devices for withdrawing samples {(sampling of foundation soil E02D1/04; collecting or conveying radioactive samples G01T7/00, e.g. G01T7/02, G01T7/08)} · CPC title

• G01N2001/028

  Sampling from a surface, swabbing, vaporising · CPC title