Temperature and bias control of edge ring
US-12580162-B2 · Mar 17, 2026 · US
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Cui Linying patents
Cui Linying is listed as an inventor on 56 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Cui Linying |
| Total patents | 56 |
| First publication | Jan 10, 2019 |
| Latest publication | Mar 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Plasma chamber and chamber component cleaning methods
US-12525441-B2 · Jan 13, 2026 · US
Method and apparatus to reduce feature charging in plasma processing chamber
US-12525433-B2 · Jan 13, 2026 · US
Plasma uniformity control in pulsed DC plasma chamber
US-12394596-B2 · Aug 19, 2025 · US
Circuits for edge ring control in shaped dc pulsed plasma process device
US-12334311-B2 · Jun 17, 2025 · US
Multi-shape voltage pulse trains for uniformity and etch profile tuning
US-12255051-B2 · Mar 18, 2025 · US
Plasma processing assembly using pulsed-voltage and radio-frequency power
US-12237148-B2 · Feb 25, 2025 · US
Apparatus and methods for controlling ion energy distribution
US-12183557-B2 · Dec 31, 2024 · US
Plasma uniformity control in pulsed DC plasma chamber
US-12148595-B2 · Nov 19, 2024 · US
Multi-electrode source assembly for plasma processing
US-2024355586-A1 · Oct 24, 2024 · US
Recent patents
Latest publications not already listed above.
Multi-electrode source assembly for plasma processing
US-2024355587-A1 · Oct 24, 2024 · US
Chamber impedance management in a processing chamber
US-2024194446-A1 · Jun 13, 2024 · US
Plasma chamber and chamber component cleaning methods
US-11984306-B2 · May 14, 2024 · US
Multi-shape voltage pulse trains for uniformity and etch profile tuning
US-2024153741-A1 · May 9, 2024 · US
Automatic electrostatic chuck bias compensation during plasma processing
US-11948780-B2 · Apr 2, 2024 · US
Apparatus and methods for manipulating power at an edge ring in plasma process device
US-11908661-B2 · Feb 20, 2024 · US
Apparatus and methods for controlling ion energy distribution
US-11901157-B2 · Feb 13, 2024 · US
Plasma processing assembly using pulsed-voltage and radio-frequency power
US-2024030002-A1 · Jan 25, 2024 · US
Apparatus and methods for controlling ion energy distribution
US-2023420229-A1 · Dec 28, 2023 · US
Temperature and bias control of edge ring
US-2023360892-A1 · Nov 9, 2023 · US
Temperature and bias control of edge ring
US-11810768-B2 · Nov 7, 2023 · US
Apparatus and methods for controlling ion energy distribution
US-11798790-B2 · Oct 24, 2023 · US
Automatic electrostatic chuck bias compensation during plasma processing
US-11791138-B2 · Oct 17, 2023 · US
Plasma processing assembly using pulsed-voltage and radio-frequency power
US-11776789-B2 · Oct 3, 2023 · US
Plasma processing assembly using pulsed-voltage and radio-frequency power
US-2023030927-A1 · Feb 2, 2023 · US
Plasma chamber and chamber component cleaning methods
US-2022399185-A1 · Dec 15, 2022 · US
Method and apparatus to reduce feature charging in plasma processing chamber
US-2022399186-A1 · Dec 15, 2022 · US
Plasma uniformity control in pulsed dc plasma chamber
US-2022399184-A1 · Dec 15, 2022 · US
Plasma uniformity control in pulsed dc plasma chamber
US-2022399193-A1 · Dec 15, 2022 · US
Plasma chamber and chamber component cleaning methods
US-2022399194-A1 · Dec 15, 2022 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 56 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H01J37/32715 | 43 |
| H01J37/32174 | 32 |
| H01J37/32642 | 30 |
| H10P50/242 | 23 |
| H01J37/32128 | 23 |