Low temperature chuck for plasma processing systems
US-12009228-B2 · Jun 11, 2024 · US
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Cho Tae Seung patents
Cho Tae Seung is listed as an inventor on 40 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Cho Tae Seung |
| Total patents | 40 |
| First publication | Mar 5, 2015 |
| Latest publication | Jun 11, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Apparatus for generating etchants for remote plasma processes
US-12002659-B2 · Jun 4, 2024 · US
Two piece electrode assembly with gap for plasma control
US-11915911-B2 · Feb 27, 2024 · US
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
US-11901161-B2 · Feb 13, 2024 · US
Apparatus for generating etchants for remote plasma processes
US-2023402262-A1 · Dec 14, 2023 · US
Low temperature chuck for plasma processing systems
US-2023223281-A1 · Jul 13, 2023 · US
Low temperature chuck for plasma processing systems
US-11594428-B2 · Feb 28, 2023 · US
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
US-2022293396-A1 · Sep 15, 2022 · US
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
US-11373845-B2 · Jun 28, 2022 · US
Methods and apparatus for processing a substrate
US-11361941-B2 · Jun 14, 2022 · US
Recent patents
Latest publications not already listed above.
Methods and apparatus for processing a substrate
US-2021398778-A1 · Dec 23, 2021 · US
Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes
US-2021384011-A1 · Dec 9, 2021 · US
Plasma health determination in semiconductor substrate processing reactors
US-10920320-B2 · Feb 16, 2021 · US
Two piece electrode assembly with gap for plasma control
US-2020328065-A1 · Oct 15, 2020 · US
Apparatus and method for depositing a coating on a substrate at atmospheric pressure
US-10752994-B2 · Aug 25, 2020 · US
Two piece electrode assembly with gap for plasma control
US-10699879-B2 · Jun 30, 2020 · US
Magnetic induction plasma source for semiconductor processes and equipment
US-10593560-B2 · Mar 17, 2020 · US
High temperature chuck for plasma processing systems
US-10468285-B2 · Nov 5, 2019 · US
Two piece electrode assembly with gap for plasma control
US-2019318911-A1 · Oct 17, 2019 · US
Magnetic induction plasma source for semiconductor processes and equipment
US-2019272999-A1 · Sep 5, 2019 · US
Optical emission spectroscopy (oes) for remote plasma monitoring
US-2019259580-A1 · Aug 22, 2019 · US
Optical emission spectroscopy (OES) for remote plasma monitoring
US-10319649-B2 · Jun 11, 2019 · US
Apparatus and method for depositing a coating on a substrate at atmospheric pressure
US-2019093229-A1 · Mar 28, 2019 · US
Apparatus and method for depositing a coating on a substrate at atmospheric pressure
US-10167556-B2 · Jan 1, 2019 · US
Plasma health determination in semiconductor substrate processing reactors
US-2018366378-A1 · Dec 20, 2018 · US
Optical emission spectroscopy (oes) for remote plasma monitoring
US-2018294198-A1 · Oct 11, 2018 · US
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
US-9874524-B2 · Jan 23, 2018 · US
High temperature chuck for plasma processing systems
US-2017309509-A1 · Oct 26, 2017 · US
Dual discharge modes operation for remote plasma
US-9773648-B2 · Sep 26, 2017 · US
In-situ spatially resolved plasma monitoring by using optical emission spectroscopy
US-2017254755-A1 · Sep 7, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 36 |
| Univ Illinois | 4 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P50/242 | 16 |
| H01J37/32357 | 14 |
| H01L21/3065 | 12 |
| H10P72/0421 | 12 |
| H01L21/67069 | 11 |