Methods and apparatus for symmetrical hollow cathode electrode and discharge mode for remote plasma processes

Patent metadata

Field	Value
Publication number	US-11373845-B2
Application number	US-202016894002-A
Country	US
Kind code	B2
Filing date	Jun 5, 2020
Priority date	Jun 5, 2020
Publication date	Jun 28, 2022
Grant date	Jun 28, 2022

Abstract

Methods and apparatus for reducing particle generation in a remote plasma source (RPS) include an RPS having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS provides radicals or ions into the processing volume, and a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode.

First claim

The invention claimed is:

1. An apparatus for processing a substrate, comprising:
a process chamber with a chamber body enclosing a processing volume;
a remote plasma source (RPS) having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the RPS is configured to provide radicals or ions into the processing volume; and
a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode; and
an isolator between the first electrode and the second electrode, wherein the isolator has a ring shape and has at least one groove on a radially inward side of the ring shape that is configured to be exposed to generated plasma from the first electrode and the second electrode.

2. The apparatus of claim 1 , wherein the symmetrical driving waveform is a sinusoidal waveform or a square wave waveform.

3. The apparatus of claim 1 , wherein the isolator is formed of a ceramic material.

4. The apparatus of claim 1 , wherein the first electrode and the second electrode have hollow cavities with a cone shape having a first end with a first diameter opening and a second end with a second diameter opening, wherein the second diameter opening is larger than the first diameter opening.

5. The apparatus of claim 4 , wherein the second diameter opening of the first electrode is configured to face the second diameter opening of the second electrode.

6. The apparatus of claim 1 , further comprising: a mixing reservoir located between the first plasma source and the processing volume.

7. The apparatus of claim 1 , further comprising: a second plasma source with a third electrode and a fourth electrode, wherein the third electrode and the fourth electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities.

8. The apparatus of claim 7 , wherein the first plasma source and the second plasma source provide radicals or ions into a mixing reservoir that is fluidly connected to the processing volume.

9. An apparatus for processing a substrate, comprising:
a remote plasma source (RPS) having a first plasma source with a first electrode and a second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities; and
a radio frequency (RF) power source configured to provide a symmetrical driving waveform on the first electrode and the second electrode to produce an anodic cycle and a cathodic cycle of the RPS, wherein the anodic cycle and the cathodic cycle operate in a hollow cathode effect mode; and
an isolator between the first electrode and the second electrode, wherein the isolator has a ring shape and has at least one groove on a radially inward side of the ring shape that is configured to be exposed to generated plasma from the first electrode and the second electrode.

10. The apparatus of claim 9 , wherein symmetrical driving waveform is a sinusoidal waveform or a square wave waveform.

11. The apparatus of claim 9 , further comprising: wherein the isolator is formed of a ceramic based material.

12. The apparatus of claim 9 , wherein the first electrode and the second electrode have hollow cavities with a cone shape having a first end with a first diameter opening and a second end with a second diameter opening, wherein the second diameter opening is larger than the first diameter opening.

13. The apparatus of claim 12 , wherein the second diameter opening of the first electrode is configured to face the second diameter opening of the second electrode.

14. The apparatus of claim 9 , further comprising: a second plasma source with a third electrode and a fourth electrode, wherein the third electrode and the fourth electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities, and wherein the first plasma source and the second plasma source provide radicals or ions into a mixing reservoir that is fluidly connected to a processing volume of a process chamber.

15. A method of generating remote plasma for a process chamber, comprising:
generating a symmetrical driving waveform with a radio frequency (RF) power source for a first plasma source; and
forming plasma in the first plasma source by applying the symmetrical driving waveform to a first electrode and to a second electrode of the first plasma source with an isolator between the first electrode and the second electrode, wherein the first electrode and the second electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities when driven by the symmetrical driving waveform and wherein the isolator has a ring shape and has at least one groove on a radially inward side of the ring shape that is configured to be exposed to generated plasma from the first electrode and the second electrode.

16. The method of claim 15 , further comprising: forming plasma in a second plasma source by applying the symmetrical driving waveform to a third electrode and to a fourth electrode of the second plasma source, wherein the third electrode and the fourth electrode are symmetrical with hollow cavities configured to induce a hollow cathode effect within the hollow cavities when driven by the symmetrical driving waveform.

17. The method of claim 16 , further comprising: mixing radicals or ions generated by the first plasma source and the second plasma source in a mixing reservoir that is fluidly coupled to a processing volume of a process chamber.

Assignees

• Applied Materials Inc

Inventors

• Cho Tae Seung
• Natarajan Saravana Kumar
• Schatz Kenneth D
• Lubomirsky Dmitry
• Subramanya Samartha

Classifications

• H01J37/32596 Primary

  Hollow cathodes · CPC title

• H01J37/32357 Primary

  Generation remote from the workpiece, e.g. down-stream · CPC title

• H01J37/32128 Primary

  using particular waveforms, e.g. polarised waves · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title