Two piece electrode assembly with gap for plasma control

Patent metadata

Field	Value
Publication number	US-10699879-B2
Application number	US-201815955588-A
Country	US
Kind code	B2
Filing date	Apr 17, 2018
Priority date	Apr 17, 2018
Publication date	Jun 30, 2020
Grant date	Jun 30, 2020

Abstract

An apparatus for distributing plasma products includes first and second electrodes that each include planar surfaces. The first electrode forms first apertures from a first planar surface to a second planar surface; the second electrode forms second apertures from the third planar surface to the fourth planar surface. The electrodes couple through one or more adjustable couplers such that the third planar surface is disposed adjacent to the second planar surface with a gap therebetween, the gap having a gap distance. Each of the adjustable couplers has a range of adjustment. The first and second apertures are arranged such that for at least one position within the ranges of adjustment, none of the first apertures aligns with any of the second apertures to form an open straight-line path extending through both the first and second electrodes, and the gap distance is between 0.005 inch and 0.050 inch.

First claim

We claim:

1. An apparatus for distributing plasma products, comprising:
a first electrode, comprising a first planar surface and a second planar surface separated by a first electrode thickness that is between 0.125 inch and 1.000 inch, wherein the first electrode forms a plurality of first apertures extending therethrough, from the first planar surface to the second planar surface; and
a second electrode, comprising a third planar surface and a fourth planar surface separated by a second electrode thickness that is between 0.125 inch and 1.000 inch, wherein the second electrode forms a plurality of second apertures extending therethrough, from the third planar surface to the fourth planar surface;
wherein:
the second electrode couples with the first electrode through one or more adjustable couplers such that the third planar surface is disposed adjacent to the second planar surface with a gap therebetween, the gap being characterized by a gap distance;
each of the one or more adjustable couplers has a range of adjustment; and
for at least a first position within the range of adjustment of each of the one or more adjustable couplers:
the first and second apertures are arranged within the first and second electrodes, such that none of the first apertures aligns with any of the second apertures to form an open straight-line path extending through both the first and second electrodes; and
the gap distance is between 0.005 inch and 0.050 inch.

2. The apparatus of claim 1 , wherein the one or more adjustable couplers are adjustable using a hand tool, but are not operably coupled with actuators.

3. The apparatus of claim 1 , wherein the one or more adjustable couplers are actuators that activate in response to electronic input.

4. The apparatus of claim 1 , wherein the first and second electrodes and the one or more adjustable couplers are connected with one or more RF grounding straps, so that the first and second electrodes and the one or more adjustable couplers are held at a common electrical potential.

5. The apparatus of claim 1 , wherein at least one of the one or more adjustable couplers is operable to adjust one or more of translation and rotation of the second planar surface with respect to the third planar surface, without substantially changing the gap distance, so that at a second position within the range of adjustment of the at least one of the one or more adjustable couplers, one or more of the first apertures is brought at least within a lateral distance of one or more of the second apertures, the lateral distance being less than three times the gap distance.

6. The apparatus of claim 5 , wherein at the second position, one or more of the first apertures aligns with one or more of the second apertures so as to form an open straight-line path extending through both the first and second electrodes.

7. The apparatus of claim 1 , wherein a first one of the one or more adjustable couplers is operable to adjust the gap distance.

8. The apparatus of claim 7 , wherein the first one of the one or more adjustable couplers is a single adjustable coupler that is operable to adjust the gap distance but does not substantially change parallelism of the second and third planar surfaces with respect to one another.

9. The apparatus of claim 8 , further comprising:
a housing; and
a suspension mechanism;
and wherein:
one of the first and second electrodes is fixedly coupled with the housing, and the other of the first and second electrodes is coupled with the suspension mechanism;
the suspension mechanism transfers at least a portion of a weight of the other of the first and second electrodes to the housing; and
the first one of the one or more adjustable couplers cooperates with the suspension mechanism to adjust the gap distance, while not substantially changing parallelism of the second and third planar surfaces with respect to one another.

10. The apparatus of claim 9 , wherein:
the first one of the one or more adjustable couplers comprises a stepper motor; and
the suspension mechanism comprises a bracket coupled with one or more springs.

11. The apparatus of claim 7 , wherein a second one of the one or more adjustable couplers is operable to adjust parallelism of the second and third planar surfaces with respect to one another.

12. The apparatus of claim 11 , wherein:
the first one of the one or more adjustable couplers adjusts the gap distance at a first attachment point about a periphery of the second electrode, and
second and third adjustable couplers of the one or more adjustable couplers adjust the gap distance at second and third attachment points about the periphery of the second electrode so that the first, second and third adjustable couplers can apply a tilt to the second electrode, relative to the first electrode, at any azimuthal angle.

13. A plasma processing apparatus, comprising:
a plasma generator;
a processing chamber operable to receive and position a workpiece for processing; and
the apparatus of claim 1 , disposed between and sealed with the plasma generator and the processing chamber, such that plasma products generated by the plasma generator must pass through the first apertures, the gap, and the second apertures, to enter the processing chamber.

14. An apparatus for distributing plasma products, comprising:
a first electrode, comprising a first planar surface and a second planar surface separated by a first electrode thickness that is between 0.100 inch and 1.000 inch, wherein the first electrode forms a plurality of first apertures extending therethrough, from the first planar surface to the second planar surface; and
a second electrode, comprising a third planar surface and a fourth planar surface separated by a second electrode thickness that is between 0.100 inch and 1.000 inch, wherein the second electrode forms a plurality of second apertures extending therethrough, from the third planar surface to the fourth planar surface;
wherein:
the second electrode is coupled fixedly with the first electrode such that the third planar surface is disposed adjacent to the second planar surface, with a gap distance of 0.005 inches to 0.050 inches therebetween; and
the first and second apertures are arranged within the first and second electrodes such that none of the first apertures aligns with any of the second apertures to form an open straight-line path extending through both the first and second electrodes.

15. The apparatus of claim 14 , wherein a lateral distance from any point within one of the first apertures, to any point within any of the second apertures, is greater than three times the gap distance.

16. The apparatus of claim 14 , wherein each of the first and second apertures is cylindrical and is of the same diameter, and the diameter is between 0.036 and 0.350 inches.

17. The apparatus of claim 14 , wherein at least 100 of the first apertures are arranged in a rectilinear grid across the first electrode and at least 100 of the second apertures are arranged in a rectilinear grid across the second electrode.

18. The apparatus of claim 14 , wherein the first and second electrodes are connected with one or more RF grounding straps, so that the first and second electrodes are held at a common electrical potential.

19. A plasma source, comprising:
a plasma generation region configured for introduction of one or more source gases therein;
an RF power supply that provides electromagnetic power to the one or more source gases to ignite a plasma within the plasma generation region;
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Assignees

• Applied Materials Inc

Inventors

• Tan Tien Fak
• Singh Saravjeet
• Lubomirsky Dmitry
• Kim Tae Wan
• Schatz Kenneth D
• Cho Tae Seung
• Loh Lok Kee

Classifications

• H01J37/04

  Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)} · CPC title

• H01J37/32568

  Relative arrangement or disposition of electrodes; moving means · CPC title

• H01J37/32091 Primary

  the radio frequency energy being capacitively coupled to the plasma · CPC title