Two piece electrode assembly with gap for plasma control

Patent metadata

Field	Value
Publication number	US-2020328065-A1
Application number	US-202016915028-A
Country	US
Kind code	A1
Filing date	Jun 29, 2020
Priority date	Apr 17, 2018
Publication date	Oct 15, 2020
Grant date	—

Abstract

An apparatus for distributing plasma products includes first and second electrodes that each include planar surfaces. The first electrode forms first apertures from a first planar surface to a second planar surface; the second electrode forms second apertures from the third planar surface to the fourth planar surface. The electrodes couple through one or more adjustable couplers such that the third planar surface is disposed adjacent to the second planar surface with a gap therebetween, the gap having a gap distance. Each of the adjustable couplers has a range of adjustment. The first and second apertures are arranged such that for at least one position within the ranges of adjustment, none of the first apertures aligns with any of the second apertures to form an open straight-line path extending through both the first and second electrodes.

First claim

We claim:

1 . An apparatus for distributing plasma products, comprising:
a first electrode characterized by a first surface and a second surface opposite the first surface, wherein the first electrode defines a plurality of first apertures extending therethrough; a second electrode characterized by a first surface facing the second surface of the first electrode and a second surface opposite the first surface of the second electrode, wherein the second electrode defines a plurality of second apertures extending therethrough, wherein a gap distance is formed between the first electrode and the second electrode; and one or more adjustable couplers operable to adjust one or more of translation or rotation of the first electrode with respect to the second electrode.

2 . The apparatus of claim 1 , wherein the one or more adjustable couplers are adjustable using a hand tool, but are not operably coupled with actuators.

3 . The apparatus of claim 1 , wherein the one or more adjustable couplers are actuators that activate in response to electronic input.

4 . The apparatus of claim 1 , further comprising one or more RF grounding straps that maintain a common electrical potential for each of the first electrode, the second electrode, and the one or more adjustable couplers.

5 . The apparatus of claim 1 , wherein the gap distance is substantially maintained during adjustment of translation or rotation of the first electrode.

6 . The apparatus of claim 5 , wherein the one or more adjustable couplers are operable to adjust the first electrode between a first position and a second position, where at the second position, one or more apertures of the plurality of first apertures is aligned with one or more apertures of the plurality of second apertures forming an open straight-line path extending through the first electrode and the second electrode.

7 . The apparatus of claim 1 , wherein a first one of the one or more adjustable couplers is operable to adjust the gap distance.

8 . The apparatus of claim 7 , wherein the first one of the one or more adjustable couplers is a single adjustable coupler operable to adjust the gap distance while substantially maintaining parallelism between the second surface of the first electrode and the first surface of the second electrode.

9 . The apparatus of claim 8 , further comprising:
a housing; and a suspension mechanism, wherein one of the first and second electrodes is fixedly coupled with the housing, and the other of the first and second electrodes is coupled with the suspension mechanism.

10 . The apparatus of claim 9 , wherein:
the first one of the one or more adjustable couplers comprises a stepper motor; and the suspension mechanism comprises a bracket coupled with one or more springs.

11 . The apparatus of claim 7 , wherein a second one of the one or more adjustable couplers is operable to adjust parallelism between the second surface of the first electrode and the first surface of the second electrode.

12 . The apparatus of claim 11 , wherein:
the first one of the one or more adjustable couplers adjusts the gap distance at a first attachment point about a periphery of the second electrode, and second and third adjustable couplers of the one or more adjustable couplers adjust the gap distance at second and third attachment points about the periphery of the second electrode.

13 . A plasma processing apparatus, comprising:
a plasma generator; a processing chamber operable to receive a workpiece within a processing region of the processing chamber, wherein the processing chamber comprises:
a first electrode characterized by a first surface and a second surface opposite the first surface, wherein the first electrode defines a plurality of first apertures extending therethrough;
a second electrode characterized by a first surface facing the second surface of the first electrode and a second surface opposite the first surface of the second electrode, wherein the second electrode defines a plurality of second apertures extending therethrough, wherein a gap distance is formed between the first electrode and the second electrode; and
one or more adjustable couplers operable to adjust one or more of translation or rotation of the first electrode with respect to the second electrode.

14 . The plasma processing apparatus of claim 13 , wherein the one or more adjustable couplers are adjustable using a hand tool, but are not operably coupled with actuators.

15 . The plasma processing apparatus of claim 13 , wherein the one or more adjustable couplers are actuators that activate in response to electronic input.

16 . The plasma processing apparatus of claim 13 , further comprising one or more RF grounding straps that maintain a common electrical potential for each of the first electrode, the second electrode, and the one or more adjustable couplers.

17 . The plasma processing apparatus of claim 13 , wherein the gap distance is substantially maintained during adjustment of translation or rotation of the first electrode.

18 . The plasma processing apparatus of claim 17 , wherein the one or more adjustable couplers are operable to adjust the first electrode between a first position and a second position, where at the second position, one or more apertures of the plurality of first apertures is aligned with one or more apertures of the plurality of second apertures forming an open straight-line path extending through the first electrode and the second electrode.

19 . A plasma source, comprising:
a plasma generation region; an RF power supply coupled with the plasma generation region; and a two piece electrode assembly that bounds the plasma generation region on one side, the two piece electrode assembly comprising:
a first electrode defining a plurality of first apertures,
a second electrode defining a plurality of second apertures, and
one or more adjustable couplers coupled with the first electrode.

20 . The plasma source of claim 19 , wherein the one or more adjustable couplers are operable to adjust at least one of:
a gap distance between the first electrode and the second electrode; and lateral alignment between the plurality of first apertures and the plurality of second apertures.

Assignees

• Applied Materials Inc

Inventors

• Tan Tien Fak
• Singh Saravjeet
• Lubomirsky Dmitry
• Kim Tae Wan
• Schatz Kenneth D
• Cho Tae Seung
• Loh Lok Kee

Classifications

• H01J37/04

  Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement {(H01J37/32009, H01J37/32623, H01J37/3266, H01J37/32697 take precedence; electron or ion-optical systems for localised treatment of objects H01J37/3007)} · CPC title

• H01J37/32091 Primary

  the radio frequency energy being capacitively coupled to the plasma · CPC title

• H01J37/32568

  Relative arrangement or disposition of electrodes; moving means · CPC title