Apparatus and method for depositing a coating on a substrate at atmospheric pressure

Patent metadata

Field	Value
Publication number	US-10167556-B2
Application number	US-201514657327-A
Country	US
Kind code	B2
Filing date	Mar 13, 2015
Priority date	Mar 14, 2014
Publication date	Jan 1, 2019
Grant date	Jan 1, 2019

Abstract

An apparatus for depositing a coating on a substrate at atmospheric pressure comprises (a) a plasma torch comprising a microwave source coupled to an antenna disposed within a chamber having an open end, the chamber comprising a gas inlet for flow of a gas over the antenna to generate a plasma jet; (b) a substrate positioned outside the open end of the chamber a predetermined distance away from a tip of the antenna; and (c) a target material to be coated on the substrate disposed at the tip of the antenna.

First claim

The invention claimed is:

1. A method of depositing a coating on a substrate at atmospheric pressure, the method comprising:
generating microwaves by a microwave source;
flowing a gas over an antenna coupled to the microwave source and disposed within a chamber having an open end to generate a microwave plasma jet at atmospheric pressure, wherein a discharge tube surrounds the antenna and defines a pathway for gas flow over the antenna;
immersing a target material within the microwave plasma jet, the immersing comprising providing a continuous feed of the target material through a hollow core of the antenna;
removing atoms from the target material, the atoms being transported from the target material to a substrate by the microwave plasma jet, the substrate being positioned outside the open end of the chamber; and
forming a coating on the substrate.

2. The method of claim 1 , wherein the gas is flowed over the antenna at a flow rate of from about 10 liters per minute to about 30 liters per minute.

3. The method of claim 2 , wherein the gas comprises helium and nitrogen.

4. The method of claim 1 , further comprising directing a flow of a nonreactive gas into a region surrounding the microwave plasma jet.

5. The method of claim 4 , wherein the nonreactive gas comprises argon.

6. The method of claim 1 , further comprising generating an arc discharge for additional heating of the target material.

7. The method of claim 1 , wherein removing the atoms from the target comprises one or both of evaporating and sputtering.

8. The method of claim 1 , wherein a microstructure of the coating does not include splats.

9. The method of claim 1 , wherein immersing the target material within the microwave plasma jet comprises disposing the target material at a tip of the antenna.

10. The method of claim 1 , wherein the target material takes the form of a wire, powders, series of pellets or a melt.

11. A method of depositing a coating on a substrate at atmospheric pressure, the method comprising:
generating microwaves by a microwave source;
flowing a gas over an antenna coupled to the microwave source and disposed within a chamber having an open end to generate a microwave plasma jet at atmospheric pressure, a target material being disposed at a tip of the antenna within the microwave plasma jet and a continuous feed of the target material being provided to the tip through a hollow core of the antenna;
removing atoms from the target material, the atoms being transported from the target material to a substrate by the microwave plasma jet, the substrate being positioned outside the open end of the chamber; and
forming a coating on the substrate.

12. The method of claim 11 , wherein the target material takes the form of a wire, powders, series of pellets or a melt.

13. The method of claim 11 , further comprising a discharge tube surrounding the antenna and providing a pathway for gas flow over the antenna.

14. The method of claim 11 , wherein removing the atoms from the target comprises one or both of evaporating and sputtering.

15. A method of depositing a coating on a substrate at atmospheric pressure, the method comprising:
generating microwaves by a microwave source;
flowing a gas over an antenna coupled to the microwave source and disposed within a chamber having an open end to generate a microwave plasma jet at atmospheric pressure, wherein a discharge tube surrounds the antenna and defines a pathway for gas flow over the antenna;
immersing a target material within the microwave plasma jet, the immersing comprising supporting the target material on the antenna;
removing atoms from the target material, the atoms being transported from the target material to a substrate by the microwave plasma jet, the substrate being positioned outside the open end of the chamber; and
forming a coating on the substrate.

Assignees

• Univ Illinois

Inventors

• Ruzic David N
• Wu Yuilun
• Shchelkanov Ivan
• Hong Jungmi
• Ouyang Zihao
• Cho Tae Seung

Classifications

• H01J37/32055

  Arc discharge · CPC title

• H05H1/46

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/26 takes precedence) · CPC title

• C23C14/228

  Gas flow assisted PVD deposition · CPC title

• C23C14/0021 Primary

  Reactive sputtering or evaporation · CPC title

• H05H1/30

  using applied electromagnetic fields, e.g. high frequency or microwave energy (H05H1/28 takes precedence) · CPC title