Three-dimensional mask model for photolithography simulation
US-11461532-B2 · Oct 4, 2022 · US
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Chen Luoqi patents
Chen Luoqi is listed as an inventor on 24 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Luoqi |
| Total patents | 24 |
| First publication | Jan 20, 2015 |
| Latest publication | Oct 4, 2022 |
Notable patents
Publications ranked by popularity score, then publication date.
Fast freeform source and mask co-optimization method
US-11042687-B2 · Jun 22, 2021 · US
Three-dimensional mask model for photolithography simulation
US-2021064811-A1 · Mar 4, 2021 · US
Three-dimensional mask model for photolithography simulation
US-10839131-B2 · Nov 17, 2020 · US
Fast freeform source and mask co-optimization method
US-2020218850-A1 · Jul 9, 2020 · US
Fast freeform source and mask co-optimization method
US-10592633-B2 · Mar 17, 2020 · US
Correction for flare effects in lithography system
US-10423745-B2 · Sep 24, 2019 · US
Optimization flows of source, mask and projection optics
US-10401732-B2 · Sep 3, 2019 · US
Three-dimensional mask model for photolithography simulation
US-2019163866-A1 · May 30, 2019 · US
Three-dimensional mask model for photolithography simulation
US-10198549-B2 · Feb 5, 2019 · US
Recent patents
Latest publications not already listed above.
Fast freeform source and mask co-optimization method
US-2018239861-A1 · Aug 23, 2018 · US
Fast freeform source and mask co-optimization method
US-9953127-B2 · Apr 24, 2018 · US
Optimization flows of source, mask and projection optics
US-2017176864-A1 · Jun 22, 2017 · US
Optimization flows of source, mask and projection optics
US-9588438-B2 · Mar 7, 2017 · US
Three-dimensional mask model for photolithography simulation
US-2016357900-A1 · Dec 8, 2016 · US
Three-dimensional mask model for photolithography simulation
US-9372957-B2 · Jun 21, 2016 · US
Integration of lithography apparatus and mask optimization process with multiple patterning process
US-9262579-B2 · Feb 16, 2016 · US
Fast freeform source and mask co-optimization method
US-2015356234-A1 · Dec 10, 2015 · US
Fast freeform source and mask co-optimization method
US-9111062-B2 · Aug 18, 2015 · US
Source polarization optimization
US-9110382-B2 · Aug 18, 2015 · US
Three-dimensional mask model for photolithography simulation
US-2015135146-A1 · May 14, 2015 · US
Correction for flare effects in lithography system
US-2015058815-A1 · Feb 26, 2015 · US
Harmonic resist model for use in a lithographic apparatus and a device manufacturing method
US-8942463-B2 · Jan 27, 2015 · US
Three-dimensional mask model for photolithography simulation
US-8938694-B2 · Jan 20, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 25 |
| Chen Luoqi | 2 |
| Hsu Duan-Fu | 1 |
| Feng Hanying | 1 |
| Howell Rafael C | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/705 | 24 |
| G03F7/70441 | 19 |
| G06F30/398 | 17 |
| G03F1/36 | 17 |
| G06F30/39 | 16 |