Positioning system using surface pattern recognition and interpolation
US-10884344-B2 · Jan 5, 2021 · US
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Binnard Michael patents
Binnard Michael is listed as an inventor on 19 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Binnard Michael |
| Total patents | 19 |
| First publication | Feb 26, 2015 |
| Latest publication | Jan 5, 2021 |
Notable patents
Publications ranked by popularity score, then publication date.
Microelectromechanical mirror assembly
US-10254654-B2 · Apr 9, 2019 · US
Power minimizing controller for a stage assembly
US-10084364-B2 · Sep 25, 2018 · US
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-2018231898-A1 · Aug 16, 2018 · US
Microelectromechanical mirror assembly
US-2018107121-A1 · Apr 19, 2018 · US
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-9946163-B2 · Apr 17, 2018 · US
Magnetic sensor calibration and servo for planar motor stage
US-9921495-B2 · Mar 20, 2018 · US
Microelectromechanical mirror assembly
US-9874817-B2 · Jan 23, 2018 · US
Positioning system using surface pattern recognition and interpolation
US-2017329236-A1 · Nov 16, 2017 · US
Positioning system using surface pattern recognition and interpolation
US-9726987-B2 · Aug 8, 2017 · US
Recent patents
Latest publications not already listed above.
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-9500960-B2 · Nov 22, 2016 · US
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-2016238948-A1 · Aug 18, 2016 · US
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-9329493-B2 · May 3, 2016 · US
Positioning system using surface pattern recognition and interpolation
US-2015301459-A1 · Oct 22, 2015 · US
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
US-2015268563-A1 · Sep 24, 2015 · US
Apparatus for maintaining immersion fluid in the gap under the projection lens during wafer exchange using a co-planar member in an immersion lithography machine
US-9081298-B2 · Jul 14, 2015 · US
Stage braking system for a motor
US-2015098074-A1 · Apr 9, 2015 · US
Power minimizing controller for a stage assembly
US-2015097498-A1 · Apr 9, 2015 · US
Microelectromechanical mirror assembly
US-2015055107-A1 · Feb 26, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Nikon Corp | 18 |
| Binnard Michael | 1 |
| Nippon Kogaku Kk | 1 |
| Nikon Res Corporation Of America | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70725 | 14 |
| G03F7/70341 | 11 |
| G03F7/70716 | 11 |
| G03B27/52 | 7 |
| G03F7/70733 | 7 |