Lithographic apparatus and a method of operating the apparatus
US-12072635-B2 · Aug 27, 2024 · US
Physics
Physics · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/70341 |
| Official title | — |
| Display label | Physics (mapped technology topic) |
| Total patents | 1,475 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is rapidly declining.
| Year | Patents |
|---|---|
| 2015 | 237 |
| 2016 | 230 |
| 2017 | 261 |
| 2018 | 215 |
| 2019 | 184 |
| 2020 | 94 |
| 2021 | 72 |
| 2022 | 63 |
| 2023 | 42 |
| 2024 | 43 |
| 2025 | 29 |
| 2026 | 5 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method
US-9223231-B2 · Dec 29, 2015 · US
Lithographic apparatus and device manufacturing method involving a seal between a table and a component
US-9195147-B2 · Nov 24, 2015 · US
Exposure apparatus, exposure method, and method for producing device
US-9182684-B2 · Nov 10, 2015 · US
Lithographic apparatus and device manufacturing method
US-9182679-B2 · Nov 10, 2015 · US
Lithographic apparatus and device manufacturing method
US-2015316858-A1 · Nov 5, 2015 · US
Fluid handling structure, a lithographic apparatus and a device manufacturing method
US-2015309421-A1 · Oct 29, 2015 · US
Projection lens system of a microlithographic projection exposure installation
US-9164396-B2 · Oct 20, 2015 · US
Optical arrangement for three-dimensionally patterning a material layer
US-9158205-B2 · Oct 13, 2015 · US
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
US-2015286152-A1 · Oct 8, 2015 · US
Exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US-2015286142-A1 · Oct 8, 2015 · US
Lithographic apparatus and device manufacturing method involving a member and a fluid opening
US-9152058-B2 · Oct 6, 2015 · US
Lithographic apparatus and device manufacturing method
US-9146478-B2 · Sep 29, 2015 · US
Illumination optical apparatus and projection exposure apparatus
US-9146476-B2 · Sep 29, 2015 · US
Illumination optical apparatus and projection exposure apparatus
US-2015248065-A1 · Sep 3, 2015 · US
Functional film, liquid immersion member, method of manufacturing liquid immersion member, exposure apparatus, and device manufacturing method
US-2015241784-A1 · Aug 27, 2015 · US
Lithographic apparatus and device manufacturing method
US-9116443-B2 · Aug 25, 2015 · US
Exposure apparatus and device manufacturing method
US-2015234293-A1 · Aug 20, 2015 · US
Mark formation method and device manufacturing method
US-2015234279-A1 · Aug 20, 2015 · US
Focus control apparatus for photolithography
US-9110386-B2 · Aug 18, 2015 · US
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Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/70341?
- CPC G03F7/70341 is the Cooperative Patent Classification code for “Physics.”
- How many patents are filed under CPC G03F7/70341 (Physics)?
- Our database includes 1,475 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/70341 growing?
- Publication counts under this code: 43 in 2024 vs 29 in 2025 (latest complete years).