Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

Patent metadata

Field	Value
Publication number	US-9329493-B2
Application number	US-201313944487-A
Country	US
Kind code	B2
Filing date	Jul 17, 2013
Priority date	Apr 11, 2003
Publication date	May 3, 2016
Grant date	May 3, 2016

Abstract

An immersion exposure apparatus and method exposes a substrate with a light beam via an optical element and immersion liquid. A first stage mounts the substrate and is movable relative to the optical element. A second stage is independently movable relative to the first stage and is positionable away from below the optical element. While the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.

First claim

What is claimed is:

1. An immersion exposure apparatus for exposing a substrate with a light beam via an optical element and immersion liquid, the apparatus comprising:
a first stage for mounting the substrate and that is movable relative to the optical element; and
a second stage that is independently movable relative to the first stage and that is positionable away from below the optical element,
wherein while the first stage is positioned below the optical element, the second stage is movable relative to the first stage so that the second stage is positioned adjacent to the first stage, and when the second stage is positioned adjacent to the first stage, the adjacent first and second stages are movable to locate the second stage opposed to the optical element in place of the first stage such that the immersion liquid is maintained below the optical element during the movement.

2. The immersion exposure apparatus according to claim 1 , wherein the adjacent first and second stages are movable for a transition from a first state to a second state, the first state being a state in which the immersion liquid is maintained in a space between the optical element and the first stage, the second state being a state in which the immersion liquid is maintained in a space between the optical element and the second stage, such that the immersion liquid is maintained below the optical element during the transition.

3. The immersion exposure apparatus according to claim 2 , wherein the first stage and the second stage are arranged to move in unison in the transition.

4. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that after the movement, the second stage remains below the optical element while an operation is performed on a substrate mounted on the first stage.

5. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that the first stage is movable away from below the optical element while the second stage is positioned below the optical element.

6. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that one of the first and second stages is arranged away from below the optical element while the other of the first and second stages is positioned below the optical element.

7. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that after the exposure of the substrate, the movement of the adjacent first and second stages relative to the optical element is performed to replace the first stage with the second stage.

8. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that the second stage is positionable away from below the optical element during exposure of the substrate mounted on the first stage.

9. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured to move the adjacent first and second stages relative to the optical element so that the immersion liquid is maintained below the optical element by one or both of the adjacent first and second stages.

10. The immersion exposure apparatus according to claim 1 , wherein the apparatus is configured such that the adjacent first and second stages are moved relative to the optical element until the second stage is below the optical element.

11. The immersion exposure apparatus according to claim 1 , wherein the first stage is a wafer stage and the second stage is a pad stage.

12. A device manufacturing method including a lithography process, wherein in the lithography process, a device pattern is transferred onto a substrate using the immersion exposure apparatus according to claim 1 .

13. An immersion exposure method for exposing a substrate with a light beam via an optical element and immersion liquid, the method comprising:
positioning a first stage, on which a substrate is mounted, below the optical element;
moving a second stage, which is independently movable relative to the first stage and positioned away from below the optical element, relative to the first stage so that the second stage is positioned adjacent to the first stage; and
moving the adjacent first and second stages relative to the optical element so that the second stage is located opposed to the optical element in place of the first stage, the immersion liquid being maintained below the optical element during the movement.

14. The immersion exposure method according to claim 13 , wherein the adjacent first and second stages are moved in a transition from a first state to a second state, the first state being a state in which the immersion liquid is maintained in a space between the optical element and the first stage, the second state being a state in which the immersion liquid is maintained in a space between the optical element and the second stage, the immersion liquid being maintained below the optical element during the transition.

15. The immersion exposure method according to claim 14 , wherein the first stage and the second stage move in unison in the transition.

16. The immersion exposure method according to claim 13 , wherein after the movement, the second stage remains below the optical element while an operation is performed on a substrate mounted on the first stage.

17. The immersion exposure method according to claim 13 , wherein the first stage is movable away from below the optical element while the second stage is positioned below the optical element.

18. The immersion exposure method according to claim 13 , wherein one of the first and second stages is arranged away from below the optical element while the other of the first and second stages is positioned below the optical element.

19. The immersion exposure method according to claim 13 , wherein after the exposure of the substrate, the movement of the adjacent first and second stages relative to the optical element is performed to replace the first stage with the second stage.

20. The immersion exposure method according to claim 13 , wherein the second stage is positionable away from below the optical element during exposure of the substrate mounted on the first stage.

21. The immersion exposure method according to claim 13 , wherein the adjacent first and second stages are moved relative to the optical element so that the immersion liquid is maintained below the optical element by one or both of the adjacent first and second stages.

22. The immersion exposure method according to claim 13 , wherein the adjacent first and second stages are moved relative to the optical element until the second stage is below the optical element.

23. The immersion exposure method according to claim 13 , wherein the first stage is a wafer stage and the second stage is a pad stage.

24. A device manufacturing method including a lithography process, wherein in the lithography process, a device pattern is transferred onto a substrate using the immersion exposure method according to claim 13 .

Assignees

• Nikon Corp

Inventors

• Binnard Michael

Classifications

• G03F7/70341 Primary

  Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply (chemical composition of immersion liquids G03F7/2041) · CPC title

• G03F7/70725 Primary

  control · CPC title

• G03B27/52

  Details · CPC title

• G03F7/70716

  Stages · CPC title

• G03F7/70733

  Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask · CPC title