Phased array antennas and methods for controlling uniformity in processing a substrate
US-12580325-B2 · Mar 17, 2026 · US
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Albarede Luc patents
Albarede Luc is listed as an inventor on 33 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Albarede Luc |
| Total patents | 33 |
| First publication | Apr 2, 2015 |
| Latest publication | Mar 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Phased array antennas and methods for controlling uniformity in processing a substrate
US-2025239784-A1 · Jul 24, 2025 · US
Reference Box for Direct-Drive Radiofrequency Power Supply
US-2024404804-A1 · Dec 5, 2024 · US
Synchronization of rf pulsing schemes and of sensor data collection
US-2023230805-A1 · Jul 20, 2023 · US
Method and apparatus for determining process rate
US-11056322-B2 · Jul 6, 2021 · US
Apparatus with optical cavity for determining process rate
US-2021142991-A1 · May 13, 2021 · US
Apparatus with optical cavity for determining process rate
US-10930478-B2 · Feb 23, 2021 · US
Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity
US-10903050-B2 · Jan 26, 2021 · US
Method and apparatus for determining etch process parameters
US-10784174-B2 · Sep 22, 2020 · US
Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity
US-2020185194-A1 · Jun 11, 2020 · US
Recent patents
Latest publications not already listed above.
Plasma etching systems and methods using empirical mode decomposition
US-10504704-B2 · Dec 10, 2019 · US
Apparatus with optical cavity for determining process rate
US-2019362950-A1 · Nov 28, 2019 · US
Gas exhaust by-product measurement system
US-10302553-B2 · May 28, 2019 · US
Method and apparatus for determining process parameters
US-2019115267-A1 · Apr 18, 2019 · US
Control of impedance of RF return path
US-10249476-B2 · Apr 2, 2019 · US
Gas exhaust by-product measurement system
US-2019064057-A1 · Feb 28, 2019 · US
Control of impedance of RF delivery path
US-10157730-B2 · Dec 18, 2018 · US
Method and apparatus for real-time monitoring of plasma chamber wall condition
US-10134569-B1 · Nov 20, 2018 · US
Method and apparatus for determining process rate
US-2017338160-A1 · Nov 23, 2017 · US
Method and apparatus for determining process rate
US-9735069-B2 · Aug 15, 2017 · US
Method and apparatus for determining process rate
US-2017084503-A1 · Mar 23, 2017 · US
Apparatus for determining process rate
US-2017084426-A1 · Mar 23, 2017 · US
Plasma etching systems and methods using empirical mode decomposition
US-2017084433-A1 · Mar 23, 2017 · US
Plasma etching systems and methods using empirical mode decomposition
US-9548189-B2 · Jan 17, 2017 · US
Plasma etching systems and methods using empirical mode decomposition
US-2016314943-A1 · Oct 27, 2016 · US
Control of impedance of rf delivery path
US-2016307738-A1 · Oct 20, 2016 · US
Control of Impedance of RF Return Path
US-2016233058-A1 · Aug 11, 2016 · US
Control of impedance of RF delivery path
US-9401264-B2 · Jul 26, 2016 · US
Control of impedance of RF return path
US-9337000-B2 · May 10, 2016 · US
Chamber matching for power control mode
US-9119283-B2 · Aug 25, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Lam Res Corp | 33 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0421 | 14 |
| H10P72/0604 | 14 |
| H10P50/283 | 13 |
| H10P50/242 | 13 |
| H01J37/32183 | 13 |