Method and apparatus for determining process rate

Patent metadata

Field	Value
Publication number	US-9735069-B2
Application number	US-201514862983-A
Country	US
Kind code	B2
Filing date	Sep 23, 2015
Priority date	Sep 23, 2015
Publication date	Aug 15, 2017
Grant date	Aug 15, 2017

Abstract

A method for dry processing a substrate in a processing chamber is provided. The substrate is placed in the processing chamber. The substrate is dry processed, wherein the dry processing creates at least one gas byproduct. A concentration of the at least one gas byproduct is measured. The concentration of the at least one gas byproduct is used to determine processing rate of the substrate.

First claim

What is claimed is:

1. A method for dry processing a substrate in a processing chamber, comprising:
creating a plurality of concentration models related to processing rate and processing uniformity;
placing the substrate in the processing chamber;
dry processing the substrate, wherein the dry processing creates at least one gas byproduct;
measuring a concentration of the at least one gas byproduct;
fitting the measured concentration of the at least one gas byproduct over time to at least one of the plurality of concentration models;
using the concentration of the at least one gas byproduct to determine processing rate of the substrate;
creating process parameters from the fitted at least one of the plurality of concentration models and the measured concentration of the at least one gas byproduct;
using the created process parameters to determine run-to-run and chamber-to-chamber performance; and
using the concentration of the at least one gas byproduct to determine processing uniformity.

2. The method, as recited in claim 1 , further comprising using the concentration of the at least one gas byproduct to determine process endpoint.

3. The method, as recited in claim 2 , wherein the process is plasma etching, and further comprising using the concentration of the at least one gas byproduct to determine aspect ratio dependent ER.

4. The method, as recited in claim 3 , wherein the process is plasma etching alternating layers, and further comprising using the concentration of the at least one gas byproduct to determine aspect ratio dependent selectivity.

5. The method, as recited in claim 1 , further comprising changing a chamber setting based on the measured concentration of the at least one gas byproduct.

6. The method, as recited in claim 1 , wherein the dry processing the substrate comprises plasma etching the substrate or a stack over the substrate.

7. The method, as recited in claim 1 , wherein the dry processing the substrate comprises etching a silicon containing layer.

8. The method, as recited in claim 1 , wherein the byproducts comprise at least one of SiF 4 , SiCl 4 , SiBr 4 , COF 2 , CO 2 , CO and CF 4 .

9. The method, as recited in claim 1 , wherein the using the concentration of the at least one gas byproduct to determine etch selectivity.

10. The method, as recited in claim 1 , wherein the measuring a concentration of the at least one gas byproduct comprises using IR absorption with a multi-pass gas cell to measure the concentration of at least one gas byproduct.

11. The method, as recited in claim 10 , wherein the IR absorption measures the concentration of at least one gas byproduct after the at least one gas byproduct is pumped through an exhaust pump.

12. The method, as recited in claim 1 , wherein the byproducts comprises SiF 4 .

13. A method for dry etching at least eight alternating layers over a substrate in a processing chamber, comprising
creating a plurality of concentration models related to processing rate and processing uniformity;
placing the substrate in the processing chamber;
dry etching the at least eight alternating layers, wherein the dry etching creates at least one gas byproduct;
measuring a concentration of the at least one gas byproduct;
fitting the measured concentration of the at least one gas byproduct over time to at least one of the plurality of concentration models;
using the concentration of the at least one gas byproduct to determine etching rate of the substrate, etch selectivity, and etch uniformity;
creating process parameters from the fitted at least one of the plurality of concentration models and the measured concentration of the at least one gas byproduct;
using the created process parameters to determine run-to-run and chamber-to-chamber performance; and
changing a chamber parameter based on the measured concentration.

Assignees

• Lam Res Corp

Inventors

• Kabouzi Yassine
• Albarede Luc
• Bailey Iii Andrew D
• Luque Jorge
• Lee Seonkyung
• Lill Thorsten

Classifications

• H10P95/066

  the removal being a selective chemical etching step, e.g. selective dry etching through a mask · CPC title

• H10P74/238

  comprising acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection or in-situ thickness measurement · CPC title

• H10P50/693

  characterised by their size, orientation, disposition, behaviour or shape, in horizontal or vertical plane · CPC title

• H10P50/692

  characterised by their composition, e.g. multilayer masks or materials · CPC title

• H10P50/283

  by chemical means · CPC title