Control of impedance of RF return path

US10249476B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10249476-B2
Application numberUS-201615133049-A
CountryUS
Kind codeB2
Filing dateApr 19, 2016
Priority dateOct 1, 2013
Publication dateApr 2, 2019
Grant dateApr 2, 2019

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF return path. The system also includes a switch circuit and a plasma reactor coupled to the switch circuit via a second portion of the RF return path. The plasma reactor is coupled to the match circuitry via a second portion of the RF supply path. The system includes a controller coupled to the switch circuit, the controller configured to control the switch circuit based on a tune recipe to change an impedance of the RF return path.

First claim

Opening claim text (preview).

The invention claimed is: 1. A matchbox comprising: a housing; a match circuitry located within the housing; a switch circuit located within the housing, the switch circuit including: a plurality of switches; and a plurality of parametric elements spaced apart from each other, wherein each of the parametric elements is connected to a corresponding one of the switches, wherein each of the switches is configured to be connected to a return path of a radio frequency (RF) transmission line to modify an impedance of the return path. 2. The matchbox of claim 1 , wherein the match circuitry includes a plurality of circuit elements to match an impedance of a load coupled to the match circuit with that of a source coupled to the match circuitry. 3. The matchbox of claim 1 , wherein one of the switches is connected to one of the parametric elements, and another one of the switches is connected to another one of the parametric elements, wherein each of the parametric elements is a metal strap. 4. The matchbox of claim 1 , wherein the return path includes an RF tunnel that surrounds an RF rod of the RF transmission line. 5. The matchbox of claim 1 , wherein the return path includes a portion of the housing and an RF sheath of an RF cable that couples the match circuitry to an RF generator. 6. The matchbox of claim 1 , wherein each of the parametric elements is a capacitor or an inductor. 7. The matchbox of claim 1 , wherein the match circuitry is coupled to an RF rod of the RF transmission line. 8. A system comprising: a housing; a match circuitry located within the housing; a switch circuit located outside the housing, the switch circuit including: a plurality of switches; and a plurality of parametric elements spaced apart from each other, wherein each of the parametric elements is connected to a corresponding one of the switches, wherein each of the switches is connected to a return path of a radio frequency (RF) transmission line to modify an impedance of the RF return path. 9. The system of claim 8 , wherein the match circuitry includes a plurality of circuit elements to match an impedance of a load coupled to the match circuitry with that of a source coupled to the match circuitry. 10. The system of claim 8 , wherein one of the switches is connected to one of the parametric elements, and another one of the switches is connected to another one of the parametric elements, wherein each of the parametric elements is a metal strap. 11. The system of claim 8 , wherein the return path includes an RF tunnel that surrounds an RF rod of the RF transmission line. 12. The system of claim 8 , wherein the return path includes a portion of the housing and an RF sheath of an RF cable that couples the match circuitry to an RF generator. 13. The system of claim 8 , wherein each of the parametric elements is a capacitor or an inductor. 14. The system of claim 1 , wherein the match circuitry is coupled to an RF rod of the RF transmission line. 15. A system comprising: a controller; a switch circuit coupled to the controller, the switch circuit including: a plurality of switches; and a plurality of parametric elements spaced apart from each other, wherein each of the parametric elements is connected to a corresponding one of the switches, wherein the switches are connected to a return path of a radio frequency (RF) transmission line, wherein the controller is configured to control the switches to modify an impedance of the return path. 16. The system of claim 15 , wherein the switch circuit is coupled to a housing of a match circuitry, wherein the match circuitry is configured to match an impedance of a load connected to the match circuitry with the source connected to the match circuitry. 17. The system of claim 15 , wherein one of the switches is connected to one of the parametric elements, and another one of the switches is connected to another one of the parametric elements, wherein each of the parametric elements is a metal strap. 18. The system of claim 15 , wherein the return path includes an RF tunnel that surrounds an RF rod of the RF transmission line. 19. The system of claim 15 , wherein the return path includes a portion of a housing of a match circuitry and an RF sheath of an RF cable that couples the match circuitry to an RF generator, wherein the match circuitry is coupled to an RF rod of the RF transmission line. 20. The system of claim 15 , wherein each of the parametric elements is a capacitor or an inductor.

Assignees

Inventors

Classifications

  • Matching circuits · CPC title

  • Impedance-matching networks · CPC title

  • Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title

  • H01J37/32Primary

    Gas-filled discharge tubes (heating by discharge H05B) · CPC title

  • Details · CPC title

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Frequently asked questions

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What does patent US10249476B2 cover?
A system for controlling an impedance of a radio frequency (RF) return path includes a matchbox further including a match circuitry. The system further includes an RF generator coupled to the matchbox to supply an RF supply signal to the matchbox via a first portion of an RF supply path. The RF generator is coupled to the matchbox to receive an RF return signal via a first portion of an RF retu…
Who is the assignee on this patent?
Lam Res Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/32183. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Apr 02 2019 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).