Plasma etching systems and methods using empirical mode decomposition

Patent metadata

Field	Value
Publication number	US-9548189-B2
Application number	US-201514694356-A
Country	US
Kind code	B2
Filing date	Apr 23, 2015
Priority date	Apr 23, 2015
Publication date	Jan 17, 2017
Grant date	Jan 17, 2017

Abstract

A substrate etching system includes an etching control module, a filtering module, and an endpoint module. The etching control module selectively begins plasma etching of a substrate within an etching chamber. The filtering module, during the plasma etching of the substrate: receives a signal including endpoint information; decomposes the signal using empirical mode decomposition (EMD); and generates a filtered signal based on results of the EMD. The endpoint module indicates when an endpoint of the plasma etching of the substrate has been reached based on the filtered signal. The etching control module ends the plasma etching of the substrate in response to the indication that the endpoint of the plasma etching of the substrate has been reached.

First claim

What is claimed is:

1. A substrate etching method comprising:
selectively beginning plasma etching of a substrate within an etching chamber of a substrate etching system;
during the plasma etching of the substrate:
receiving a signal including endpoint information;
decomposing the signal using empirical mode decomposition (EMD); and
generating a filtered signal based on results of the EMD; and

generating an indication when an endpoint of the plasma etching of the substrate has been reached based on the filtered signal; and
ending the plasma etching of the substrate in response to the indication that the endpoint of the plasma etching of the substrate has been reached.

2. The substrate etching method of claim 1 wherein the results of the EMD include one or more components including endpoint information, one or more components including noise information, and a final residual, the method further comprising;
generating the filtered signal based on:
the one or more components including endpoint information and the final residual;
and independent of the one or more components including noise information.

3. The substrate etching method of claim 1 further comprising:
receiving a second signal including endpoint information;
receiving a third signal not including endpoint information; and
normalizing the second signal relative to the third signal to produce the signal including endpoint information.

4. The substrate etching method of claim 3 further comprising selecting the third signal based on one or more operating parameters of the substrate etching system.

5. The substrate etching method of claim 3 further comprising selecting a confinement ring signal generated by a confinement ring sensor as the third signal when a confinement ring is moving within the etching chamber.

6. The substrate etching method of claim 3 further comprising selecting a power signal indicating a power of the etching chamber as the third signal when a power supply that supplies power to the etching chamber is being tuned.

7. The substrate etching method of claim 3 further comprising:
generating the second signal using a first optical emission spectroscopy (OES) sensor based on optical characteristics of plasma within the etching chamber; and
generating the third signal using a second OES sensor independently of the plasma within the etching chamber.

8. The substrate etching method of claim 1 further comprising:
normalizing a first portion of a second signal relative to a second portion of the second signal to produce the signal including endpoint information,
wherein the first portion of the second signal includes endpoint information, and
wherein the second portion of the second signal does not include endpoint information.

9. The substrate etching method of claim 8 further comprising selecting the second portion of the second signal based on one or more operating parameters of the substrate etching system.

10. The substrate etching method of claim 1 further comprising generating the indication that the endpoint of the plasma etching of the substrate has been reached when a change in the filtered signal is greater than a predetermined value.

11. The substrate etching method of claim 1 further comprising:
opening a gas source and actuating a power source to apply power to begin the plasma etching of the substrate; and
closing the gas source and actuating the power source to end the plasma etching of the substrate in response to the indication that the endpoint of the plasma etching of the substrate has been reached.

Assignees

• Lam Res Corp

Inventors

• Albarede Luc
• Kabouzi Yassine
• Luque Jorge
• Bailey Iii Andrew D

Classifications

• H01J37/32449

  Gas control, e.g. control of the gas flow · CPC title

• H01J37/3299

  Feedback systems · CPC title

• H01J37/321

  the radio frequency energy being inductively coupled to the plasma · CPC title

• H01J37/32963 Primary

  End-point detection · CPC title

• H01J37/32082

  Radio frequency generated discharge (H01J37/32357, H01J37/32366, H01J37/32394 and H01J37/32403 take precedence) · CPC title