Smart chamber and smart chamber components
US-10153143-B2 · Dec 11, 2018 · US
Targets
Targets · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01J37/3414 |
| Official title | {Targets} |
| Display label | Targets |
| Total patents | 175 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 18 |
| 2016 | 17 |
| 2017 | 22 |
| 2018 | 16 |
| 2019 | 17 |
| 2020 | 14 |
| 2021 | 19 |
| 2022 | 21 |
| 2023 | 7 |
| 2024 | 12 |
| 2025 | 10 |
| 2026 | 2 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Sputter trap having multimodal particle size distribution
US-2018171465-A1 · Jun 21, 2018 · US
POWER DELIVERY FOR HIGH POWER IMPULSE MAGNETRON SPUTTERING (HiPIMS)
US-2018108519-A1 · Apr 19, 2018 · US
Laterally adjustable return path magnet assembly and methods
US-2017369985-A1 · Dec 28, 2017 · US
Sputtering Target for PVD Chamber
US-2017350001-A1 · Dec 7, 2017 · US
Sputtering apparatus and sputtering method using the same
US-2017342547-A1 · Nov 30, 2017 · US
Sputter target and sputtering methods
US-9831072-B2 · Nov 28, 2017 · US
Sputter target and sputtering methods
US-2017338087-A1 · Nov 23, 2017 · US
Lithium sputter targets
US-2017327940-A1 · Nov 16, 2017 · US
Lithium sputter targets
US-9771646-B2 · Sep 26, 2017 · US
Indium sputtering target and method for manufacturing same
US-9758860-B2 · Sep 12, 2017 · US
Sputtering target for PVD chamber
US-9752228-B2 · Sep 5, 2017 · US
Target assembly
US-2017229296-A1 · Aug 10, 2017 · US
Evaporation source
US-9728382-B2 · Aug 8, 2017 · US
Sputtering target and manufacturing method therefor
US-9704695-B2 · Jul 11, 2017 · US
Insulator target
US-2017178875-A1 · Jun 22, 2017 · US
In-Cu Alloy Sputtering Target And Method For Producing The Same
US-2017169998-A1 · Jun 15, 2017 · US
Method for connecting magnetic substance target to backing plate, and magnetic substance target
US-9653270-B2 · May 16, 2017 · US
Target for PVD sputtering system
US-9633824-B2 · Apr 25, 2017 · US
Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target
US-9598764-B2 · Mar 21, 2017 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01J37/3414?
- CPC H01J37/3414 is the Cooperative Patent Classification code for “Targets.”
- How many patents are filed under CPC H01J37/3414 (Targets)?
- Our database includes 175 publications tagged with this CPC code.
- Is patent activity under CPC H01J37/3414 growing?
- Publication counts under this code: 12 in 2024 vs 10 in 2025 (latest complete years).