Multicathode deposition system and methods
US-12051576-B2 · Jul 30, 2024 · US
Sputtering target for PVD chamber
US9752228B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9752228-B2 |
| Application number | US-72319910-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 12, 2010 |
| Priority date | Apr 3, 2009 |
| Publication date | Sep 5, 2017 |
| Grant date | Sep 5, 2017 |
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Abstract
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Target assemblies and PVD chambers including target assemblies are disclosed. The target assembly includes a target that has a concave shaped target. When used in a PVD chamber, the concave target provides more radially uniform deposition on a substrate disposed in the sputtering chamber.
First claim
Opening claim text (preview).
What is claimed is: 1. A sputtering apparatus comprising: a chamber having a wall defining a process area including a substrate support; a reactive gas source connected to the chamber to provide a reactive gas during processing; a target spaced from the substrate support, the target having a front face defining sputterable target surface extending between peripheral edges of the target and the sputterable target surface defining an overall concave shape substantially between t…
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Electricity · mapped topic
Electricity · mapped topic
- C23C14/3407Primary
Chemistry & Metallurgy · mapped topic
- C23C14/34Primary
Chemistry & Metallurgy · mapped topic
Chemistry & Metallurgy · mapped topic
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Frequently asked questions
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- What does patent US9752228B2 cover?
- Target assemblies and PVD chambers including target assemblies are disclosed. The target assembly includes a target that has a concave shaped target. When used in a PVD chamber, the concave target provides more radially uniform deposition on a substrate disposed in the sputtering chamber.
- Who is the assignee on this patent?
- Liu Zhendong, Wang Rongjun, Tang Xianmin, and 4 more
- What technology area does this patent fall under?
- Primary CPC classification C23C14/3407. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue Sep 05 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).