Method of fabricating sputtering target, sputtering target using the method, and method of manufacturing organic light-emitting display apparatus using the sputtering target

Patent metadata

Field	Value
Publication number	US-9598764-B2
Application number	US-201414205624-A
Country	US
Kind code	B2
Filing date	Mar 12, 2014
Priority date	Jul 12, 2013
Publication date	Mar 21, 2017
Grant date	Mar 21, 2017

Abstract

A method of fabricating a sputtering target includes preparing a first powder material including at least one of a tin oxide and a mesh-forming oxide; mixing the first powder material and a second powder material comprising carbon or a tin oxide to prepare a mixture; simultaneously performing a primary compression and primary sintering on the mixture in a reduction atmosphere; and simultaneously performing a secondary compression and secondary sintering on the mixture in the reduction atmosphere to prepare the sputtering target.

First claim

What is claimed is:

1. A method of fabricating a sputtering target, the method comprising:
preparing a first powder material comprising at least one of a tin oxide and Sn 2 P 2 O 7 ;
mixing the first powder material and a second powder material to prepare a mixture, wherein the second powder material comprises carbon or a tin oxide;
simultaneously performing a primary compression and a primary heating on the mixture in a reduction atmosphere; and
simultaneously performing a secondary compression and a secondary heating on the mixture in the reduction atmosphere to prepare the sputtering target,
wherein the primary heating is performed at a temperature of about 100° C. to about 550° C. and the secondary heating is performed at a temperature of about 150° C. to about 450° C.

2. The method of claim 1 , wherein the preparing of the first powder material further comprises:
preparing a raw material mixture by mixing a first raw material and a second raw material in a moisture-free environment, wherein the first raw material comprises at least one of the tin oxide and the Sn 2 P 2 O, and the second raw material comprises at least one of a phosphorus oxide, a boron phosphate, a tin fluoride, a niobium oxide, a lead fluoride, a silicon oxide, a tungsten oxide, an indium oxide, a bismuth oxide, a zinc oxide, and a boron oxide;
melting the raw material mixture in a vacuum to prepare a melt;
solidifying and pulverizing the melt to prepare the first powder material.

3. The method of claim 1 , wherein the second powder material comprises carbon, and wherein the carbon comprises at least one of carbon nanotubes, conductive carbon black powder, conductive carbon fibers, graphite, and graphene.

4. The method of claim 1 , wherein the mixture comprises 50 wt % to 99.9 wt % of the first powder material and 0.1 wt % to 50 wt % of the second powder material.

5. The method of claim 1 , wherein the reduction atmosphere is formed by contacting a carbon sheet with the mixture, wherein contact between the carbon sheet and the mixture occurs in an upper part or a lower part of the mixture.

6. The method of claim 1 , wherein the reduction atmosphere is formed in a container comprising the mixture, and wherein the container further comprises carbon.

7. The method of claim 6 , wherein the primary heating and the secondary heating are performed as the container is heated using an induction heating technique.

8. The method of claim 6 , wherein the primary compression and the secondary compression are performed by pressing the mixture in the container using plates formed of a metal material.

9. The method of claim 1 , wherein the primary compression is performed at a pressure of about 150 kgf/cm 2 to about 350 kgf/cm 2 .

10. The method of claim 1 , wherein the secondary compression is performed at a pressure of about 150 kgf/cm 2 to about 350 kgf/cm 2 .

11. The method of claim 1 , wherein the sputtering target comprises a tin metal layer formed on a surface of the first powder material.

12. The method of claim 1 , wherein the first powder material comprises at least one of Sn 2 P 2 O 7 ; SnO and P 2 O 5 ; SnO and BPO 4 ; SnO, SnF 2 , and P 2 O 5 ; SnO, SnF 2 , P 2 O 5 , NbO, and Nb 2 O 5 ; SnO, SnF 2 , P 2 O 5 , and WO 3 ; SnO and Bi 2 O 3 ; SnO, P 2 O 5 , and B 2 O 3 ; SnO, P 2 O 5 , and In 2 O 3 ; SnO, P 2 O 5 , B 2 O 3 , and ZnO; and SnO, B 2 O 3 , ZnO, and SiO 2 .

Assignees

• Samsung Display Co Ltd

Inventors

• Shin Sang-Wook
• Jung Sun-Young
• Lee Il-Sang
• Park Jin-Woo
• Kim Dong-Jin

Classifications

• H10K71/00 Primary

  Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

• H10K59/873

  Encapsulations · CPC title

• H01L51/5253

  Electricity · mapped topic

• H01J37/3429

  Plural materials · CPC title

• C23C14/3414 Primary

  Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy · CPC title