Charged particle beam device and method for demagnetizing magnetic lens
US-2024274395-A1 · Aug 15, 2024 · US
Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H01J37/09 |
| Official title | Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields |
| Display label | Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields |
| Total patents | 627 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 33 |
| 2016 | 33 |
| 2017 | 47 |
| 2018 | 45 |
| 2019 | 64 |
| 2020 | 61 |
| 2021 | 58 |
| 2022 | 66 |
| 2023 | 71 |
| 2024 | 69 |
| 2025 | 65 |
| 2026 | 15 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Multi charged particle beam writing apparatus
US-2024242922-A1 · Jul 18, 2024 · US
Focusing a charged particle system
US-9530613-B2 · Dec 27, 2016 · US
Method of performing spectroscopy in a transmission charged-particle microscope
US-9524851-B2 · Dec 20, 2016 · US
Charged particle beam writing apparatus and charged particle beam writing method
US-2016336141-A1 · Nov 17, 2016 · US
Two-dimensional mass resolving slit mechanism for semiconductor processing systems
US-9496117-B2 · Nov 15, 2016 · US
Method for verifying characteristics of an electron beam
US-2016307731-A1 · Oct 20, 2016 · US
Inspection device
US-2016307726-A1 · Oct 20, 2016 · US
Method and device for characterizing an electron beam using an X-ray detector with a patterned aperture resolver and patterned aperture modulator
US-9406483-B1 · Aug 2, 2016 · US
Method and device for characterizing an electron beam
US-2016211116-A1 · Jul 21, 2016 · US
Method and device for characterizing an electron beam
US-2016211119-A1 · Jul 21, 2016 · US
Apparatus having a magnetic lens configured to diverge an electron beam
US-9390882-B2 · Jul 12, 2016 · US
Device manufacturing apparatus and manufacturing method of magnetic device
US-2016196951-A1 · Jul 7, 2016 · US
Electron beam writing apparatus and electron beam writing method
US-9373424-B2 · Jun 21, 2016 · US
Charged Particle Source
US-2016163500-A1 · Jun 9, 2016 · US
Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements
US-2016155603-A1 · Jun 2, 2016 · US
Method of producing aperture member
US-9343323-B2 · May 17, 2016 · US
Charged Particle Beam Device
US-2016133433-A1 · May 12, 2016 · US
Charged particle detection system and multi-beamlet inspection system
US-9336981-B2 · May 10, 2016 · US
Charged Particle Beam Device and Method for Adjusting Charged Particle Beam Device
US-2016118218-A1 · Apr 28, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H01J37/09?
- CPC H01J37/09 is the Cooperative Patent Classification code for “Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields.”
- How many patents are filed under CPC H01J37/09 (Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields)?
- Our database includes 627 publications tagged with this CPC code.
- Is patent activity under CPC H01J37/09 growing?
- Publication counts under this code: 69 in 2024 vs 65 in 2025 (latest complete years).