Charged Particle Beam Device

Patent metadata

Field	Value
Publication number	US-2016133433-A1
Application number	US-201414893669-A
Country	US
Kind code	A1
Filing date	Mar 19, 2014
Priority date	May 30, 2013
Publication date	May 12, 2016
Grant date	—

Abstract

An object of the present invention is to provide a charged particle beam device that suppresses the influence of an external electromagnetic wave, even when a shielding member, such as a vacuum valve, is in the open state. To achieve the above object, a charged particle beam device including a vacuum chamber ( 111 ) having an opening ( 104 ) that surrounds a sample delivery path is proposed. The charged particle beam device includes a conductive material ( 118 ) surrounding the opening ( 104 ) for conduction between the vacuum chamber ( 111 ) and a conductive member ( 106 ) disposed on the atmosphere side. According to an embodiment of the present invention, it is possible to restrict an electromagnetic wave ( 117 ) from reaching the sample chamber via the delivery path.

First claim

1 . A charged particle beam device including a vacuum chamber, the vacuum chamber having an opening that surrounds a sample delivery path, the vacuum chamber comprising:
a conductive material configured to surround the opening for conduction between the vacuum chamber and a conductive member disposed on the atmosphere side.

2 . The charged particle beam device according to claim 1 , wherein the vacuum chamber is a preliminary exhaust chamber.

3 . The charged particle beam device according to claim 2 , wherein the preliminary exhaust chamber includes a vacuum valve that shields a space between an internal space of the preliminary exhaust chamber and the atmosphere,
the charged particle beam device further comprising: a controller configured to open and/or close the vacuum valve while a sample is placed in a sample chamber of the charged particle beam device.

4 . The charged particle beam device according to claim 1 , wherein the conductive material comprises a plurality of belt-like conductive tapes, with each tape disposed for each of four sides forming the opening of the vacuum chamber on the atmosphere side.

5 . The charged particle beam device according to claim 4 , wherein a distance between the conductive tapes is set according to a frequency band of an electromagnetic wave to be shielded.

6 . The charged particle beam device according to claim 1 , wherein the conductive body is a sheet with a plurality of openings formed therein or a mesh.

7 . The charged particle beam device according to claim 6 , wherein the openings are set according to a frequency band of an electromagnetic wave to be shielded.

8 . The charged particle beam device according to claim 6 , wherein a circumferential length of an opening of the mesh is set according to the frequency band of the electromagnetic wave to be shielded.

9 . A charged particle beam device including a vacuum chamber, the vacuum chamber having an opening that surrounds a sample delivery path, the charged particle beam device comprising:
a conductive sheet with a plurality of openings formed therein, a conductive mesh, or a plurality of conductive tapes, wherein the conductive sheet, the conductive mesh, or the conductive tapes is used for connection between the vacuum chamber and the conductive member disposed on the atmosphere side.

10 . The charged particle beam device according to claim 9 , wherein the vacuum chamber is a preliminary exhaust chamber.

11 . The charged particle beam device according to claim 10 , wherein the preliminary exhaust chamber includes a vacuum valve that shields a space between an internal space of the preliminary exhaust chamber and the atmosphere,
the charged particle beam device further comprising: a controller configured to open and/or close the vacuum valve while a sample is placed in a sample chamber of the charged particle beam device.

Assignees

• Hitachi High Tech Corp

Inventors

• Fujita Masashi
• Tsunoda Masahiro
• Onuki Katsunori
• AIBARA Katsuya
• Shindo Seiichi
• Nishimori Takaaki

Classifications

• H10P72/0462

  characterised by the construction of the processing chambers, e.g. modular processing chambers · CPC title

• H10P72/0466 Primary

  characterised by the construction of the load-lock chamber · CPC title

• H01J2237/26

  Electron or ion microscopes · CPC title

• H01J37/165 Primary

  Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays · CPC title

• H01J37/09

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title