Charged Particle Beam Device and Method for Adjusting Charged Particle Beam Device

Patent metadata

Field	Value
Publication number	US-2016118218-A1
Application number	US-201414896753-A
Country	US
Kind code	A1
Filing date	Apr 4, 2014
Priority date	Jun 14, 2013
Publication date	Apr 28, 2016
Grant date	—

Abstract

The present invention relates to enabling a versatile charged particle beam device, which is used for a wide range of kinds of samples to be observed and has parameters of emission conditions of a primary charged particle beam that is difficult to be registered in advance, to be operated easily and accurately even by a less-experienced operator and to obtain high-resolution images. A charged particle beam device according to the present invention includes, for example: a charged particle source, a focusing lens for a primary charged particle beam emitted from the charged particle source, an objective lens for focusing the primary charged particle beam, a movable objective aperture having multiple objective apertures disposed on a side of the charged particle source with respect to the objective lens, a detector of a secondary signal from the sample resulting from emission of the primary charged particle beam, a display unit configured to process and display a detected secondary signal, and a storage unit configured to store multiple emission conditions of the primary particle beam. The operation controller makes one emission condition be selected, determines whether or not the objective aperture is suitable for the selected emission condition, displays that the objective aperture is unsuitable when the objective aperture is unsuitable, and preadjusts the primary charged particle beam according to the selected emission condition and stores the preadjustment result as parameters for the emission conditions when the objective aperture is suitable.

First claim

1 . A charged particle beam device comprising:
a charged particle source; a focusing lens for focusing a primary charged particle beam emitted from the charged particle source; an objective lens for focusing the primary charged particle beam on a sample; a movable objective aperture having multiple objective apertures disposed on a side of the charged particle source with respect to the objective lens; a detector configured to detect a secondary signal generated from the sample as a result of emission of the primary charged particle beam; an image display unit configured to perform image processing on the secondary signal detected by the detector and display the processed image; a storage unit configured to store multiple emission conditions of the primary charged particle beam; and an operation controller configured to make one of the emission conditions be selected, determine whether or not a disposed objective aperture is suitable for the selected emission condition, display that the objective aperture is unsuitable when the objective aperture is unsuitable, execute preadjustment of adjusting the primary charged particle beam to match the selected emission condition when the objective aperture is suitable for the selected emission condition, and store a result of preadjustment as parameters of emission conditions in the storage unit in advance.

2 . The charged particle beam device according to claim 1 , wherein
the operation controller is configured to display the emission conditions stored in the storage unit on the image display unit to make one emission condition be selected, determine whether or not a disposed objective aperture of the multiple objective apertures is suitable for the emission condition selected with use of the image display unit, display that the objective aperture is unsuitable on the image display unit when the objective aperture is unsuitable, when the objective aperture is suitable for the selected emission condition, adjust the primary charged particle beam to match a predetermined emission condition that is a basis for adjustment, display an image for central axis alignment of the primary charged particle beam on the image display unit, and when a central axis of the primary charged particle beam is adjusted as a result of adjusting the position of the objective aperture, adjust the primary charged particle beam to match the emission condition selected via the image display unit.

3 . The charged particle beam device according to claim 1 , wherein the preadjusted emission condition is obtained by using a dedicated sample.

4 . The charged particle beam device according to claim 1 , further comprising a sample stage for supporting and moving the sample, wherein
the emission conditions include a position of the sample on the sample stage, and multiple positions on the sample stage can be set.

5 . The charged particle beam device according to claim 1 , wherein the operation controller determines whether or not the preadjustment needs to be executed again, and displays the need for preadjustment on the display unit when the preadjustment needs to be executed again.

6 . The charged particle beam device according to claim 1 , wherein when the objective aperture is suitable for the selected emission condition, the operation controller determines whether or not the position of the objective aperture needs to be adjusted and whether or not the position of the objective aperture is adjusted to be within an allowable range.

7 . The charged particle beam device according to claim 2 , wherein when the objective aperture is suitable for the selected emission condition, the operation controller determines whether or not the position of the objective aperture needs to be adjusted and whether or not the position of the objective aperture is adjusted to be within an allowable range.

8 . The charged particle beam device according to claim 3 , further comprising a sample stage for supporting and moving the sample, wherein
the operation controller determines whether or not the dedicated sample is set on the sample stage.

9 . The charged particle beam device according to claim 1 , wherein the operation controller periodically conducts the preadjustment, determines whether or not maintenance of the charged particle beam device is required on a basis of an adjustment value resulting from the conducted preadjustment, and displays that maintenance is required when it is determined that the maintenance is required.

10 . A method for adjusting a charged particle beam device, the method comprising:
storing multiple emission conditions on emission of a primary charged particle beam in a storage unit; making one emission condition be selected from the emission conditions stored in the storage unit; determining whether or not a disposed objective aperture is suitable for the selected emission condition; displaying that the objective aperture is unsuitable on the image display unit when the objective aperture is unsuitable; and preadjusting the primary charged particle beam to match the selected emission condition and storing the preadjustment result as parameters for the emission conditions when the objective aperture is suitable for the selected emission condition.

11 . The method for adjusting a charged particle beam device according to claim 10 , further comprising:
displaying the emission conditions stored in the storage unit on the image display unit to make one emission condition be selected, determining whether or not a disposed objective aperture of the multiple objective apertures is suitable for the emission condition selected with use of the image display unit, displaying that the objective aperture is unsuitable on the image display unit when the objective aperture is unsuitable, when the objective aperture is suitable for the selected emission condition, adjusting the primary charged particle beam to match a predetermined emission condition that is a basis for adjustment, displaying an image for central axis alignment of the primary charged particle beam on the image display unit, and when a central axis of the primary charged particle beam is adjusted as a result of adjusting the position of the objective aperture, adjusting the primary charged particle beam to match the emission condition selected via the image display unit.

12 . The method for adjusting a charged particle beam device according to claim 10 , wherein the preadjusted emission condition is obtained by using a dedicated sample.

13 . The method for adjusting a charged particle beam device according to claim 10 , wherein the sample is supported and moved by a sample stage, the emission conditions also include a position of the sample on the sample stage, and multiple positions on the sample stage can be set.

14 . The method for adjusting a charged particle beam device according to claim 10 , further comprising:
determining whether or not the preadjustment needs to be executed again; and displaying the need for preadjustment on the display unit when the preadjustment needs to be executed again.

15 . The method for adjusting a charged particle beam device according to claim 10 , further comprising: when the objective aperture is suitable for the selected emission condition, determining whether or not the position of the objective aperture needs to be adjusted and whether or not the position of the objective aperture is adjusted to be within an allowable range.

16 . The method for adjusting a charged particle beam device according to claim 11 , further comprising: when the objective aperture is sui

Assignees

• Hitachi High Tech Corp

Inventors

• Shigeto Kunji
• Sato Mitsugu
• Saito Tsutomu
• HOSOYA Kohtaro
• Takahoko Yoshihiro
• Ando Tohru

Classifications

• H01J37/28

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J37/265 Primary

  Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination · CPC title

• H01J37/09

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J37/20

  Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support · CPC title