Two-dimensional mass resolving slit mechanism for semiconductor processing systems

Patent metadata

Field	Value
Publication number	US-9496117-B2
Application number	US-201414158972-A
Country	US
Kind code	B2
Filing date	Jan 20, 2014
Priority date	Jan 20, 2014
Publication date	Nov 15, 2016
Grant date	Nov 15, 2016

Abstract

An adjustable mass-resolving slit assembly includes an aperture portion and an actuation portion. The aperture portion includes first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations. The actuation portion is coupled to the aperture portion and selectively and independently adjusts the position of the first and second shield members along first and second non-parallel axes. Adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture. Adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam. Methods for using the adjustable mass-resolving slit assembly are also disclosed.

First claim

What is claimed is:

1. An adjustable mass-resolving slit assembly, comprising:
an aperture portion comprising first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations; and
an actuation portion coupled to the aperture portion, the actuation portion for selectively and independently adjusting a position of the first and second shield members along first and second non-parallel axes, the first and second axes defining a plane oriented substantially perpendicular to the ion beam;
wherein adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture; and
wherein adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam.

2. The adjustable mass-resolving slit assembly of claim 1 , further comprising:
first and second support shafts coupled to the first and second shield members, the first and second support shafts further coupled to associated first and second support shaft housings positioned on a base plate of the actuation portion;
wherein the first and second support shaft housings are fixed along the second axis with respect to the base plate; and
wherein the first support shaft housing is movable along the first axis with respect to the base plate, while the second support shaft housing is fixed along the first axis with respect to the base plate.

3. The adjustable mass-resolving slit assembly of claim 2 , wherein the first and second support shafts are movable along second axis within their respective first and second support shaft housings.

4. The adjustable mass-resolving slit assembly of claim 2 , wherein the first support shaft and the first support shaft housing are movable toward or away from the second support shaft and the second support shaft housing along the first axis.

5. The adjustable mass-resolving slit assembly of claim 2 , wherein the first and second support shaft housings are coupled to respective first and second housing frames, the first and second housing frames positioned adjacent to their respective first and second support shaft housings and each have a guide track for slidingly engaging a guide portion of the associated first or second support shaft housing; and wherein the first and second support shaft housings are slidable on the first and second housing frames along the second axis.

6. The adjustable mass-resolving slit assembly of claim 1 , the actuation portion further comprising first and second linear actuators, the first linear actuator coupled to the first support shaft to move the first support shaft along the first axis, the second linear actuator coupled to a housing frame to controllably move the second support shaft housing and the second support shaft along the second axis.

7. The adjustable mass-resolving slit assembly of claim 6 , wherein a first support shaft housing and a second support shaft housing are coupled together so that movement of the second support shaft housing along the second axis causes the first support shaft housing to move along the second axis by the same amount.

8. The adjustable mass-resolving slit assembly of claim 7 , the coupling between the first and second support shaft housings comprising a shaft fixed to a second flange portion of the second support shaft housing, wherein the shaft is received in a correspondingly sized recess formed in a first flange portion associated with the first support shaft housing, wherein the shaft and recess are oriented to align with the second axis so that the first and second support shaft housings can move with respect to each other along the first axis, while being coupled together for movement along the second axis.

9. The adjustable mass-resolving slit assembly of claim 2 , wherein the first and second support shaft housings comprise bellows elements configured to expand and contract to facilitate movement of the first and second support shafts along the second axis.

10. A method for adjusting a mass-resolving slit in ion implantation system, comprising:
adjusting a relative position of first and second shield members along a first axis to adjust the width of an aperture formed therebetween; and
adjusting a position of the first and second shield members along a second axis to select a region on the first and second shield members against which an ion beam impinges;
wherein the second axis is non-parallel to the first axis, and wherein the first and second axes define a plane oriented substantially perpendicular to the ion beam; and
wherein an actuation portion selectively and independently adjusts the position of the first and second shield members along the first and second non-parallel axes.

11. The method of claim 10 , wherein adjusting the relative position of first and second shield members along a first axis is performed as part of an ion beam tuning process.

12. The method of claim 10 , wherein adjusting the position of the first and second shield members along the second axis is performed after the region of the first and second shield members have been eroded by a predetermined amount by the ion beam.

13. The method of claim 10 , wherein adjusting the position of the first and second shield members along the second axis is performed after the first and second shield members have been subjected to a predetermined service time.

14. The method of claim 10 , wherein adjusting the relative position of first and second shield members along the first axis and adjusting a position of the first and second shield members along the second axis are performed using first and second linear actuators.

15. The method of claim 14 , wherein adjusting a position of the second shield member using the second linear actuator causes the first shield member to be moved by the same amount as the second shield member.

16. The method of claim 10 , wherein adjusting the position of the first and second shield members along the second axis is performed while maintaining the first and second shield members in a high vacuum environment.

17. An adjustable mass-resolving slit assembly, comprising:
an aperture portion comprising first and second shield members that define an aperture therebetween for receiving an ion beam during semiconductor processing operations; and
an actuation portion coupled to the aperture portion, the actuation portion comprising first and second support shafts coupled to the first and second shield members, the first and second support shafts further coupled to associated first and second support shaft housings positioned on a base plate of the actuation portion;
wherein the first support shaft housing is movable along a first axis with respect to the base plate, while the second support shaft housing is fixed along the first axis with respect to the base plate;
wherein the first and second support shaft housings are movable along a second axis that is non-parallel to the first axis, the first and second axes defining a plane oriented substantially perpendicular to the ion beam;
wherein adjusting the position of the first and second shield members along the first axis adjusts a width of the aperture; and
wherein adjusting the position of the first and second shield members along the second axis adjusts a region of the first and second shield members impinged by the ion beam.

18. The adjustable mass-resolving slit assembly of claim 17 , wherein the first and second support shaft housings comprise bellows

Assignees

• Varian Semiconductor Equipment Ass Inc

Inventors

• Schaller Jason M
• Vopat Robert B

Classifications

• H01J37/05 Primary

  Electron or ion-optical arrangements for separating electrons or ions according to their energy {or mass}(particle separator tubes H01J49/00) · CPC title

• H01J37/3171

  for ion implantation · CPC title

• H01J37/09

  Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields · CPC title

• H01J2237/1501

  Beam alignment means or procedures · CPC title

• H01J2237/0455

  with variable aperture · CPC title